Rekha PADMANABHAN

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Lower dose rate ion implantation using a wider ion beam
- Patent number 9,748,072
- Issue date Aug 29, 2017
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for ion implantation
- Patent number 9,431,247
- Issue date Aug 30, 2016
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
LOWER DOSE RATE ION IMPLANTATION USING A WIDER ION BEAM
- Publication number 20150371857
- Publication date Dec 24, 2015
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Zhimin WAN
- H01 - BASIC ELECTRIC ELEMENTS