Remi Daniel Marie Edart

Person

Veldhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method to determine the usefulness of alignment marks to correct ov...
- Patent number 9,454,084
- Issue date Sep 27, 2016
- ASML Netherlands B.V.
- Irina Lyulina
- G01 - MEASURING TESTING
Information Patent Grant
Method of applying a pattern to a substrate, device manufacturing m...
- Patent number 9,291,916
- Issue date Mar 22, 2016
- ASML Netherlands B.V.
- Stefan Cornelis Theodorus Van Der Sanden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark deformation estimating method, substrate position pr...
- Patent number 8,982,347
- Issue date Mar 17, 2015
- ASML Netherlands B.V.
- Xiuhong Wei
- G01 - MEASURING TESTING
Information Patent Grant
Method of applying a pattern to a substrate, device manufacturing m...
- Patent number 8,976,355
- Issue date Mar 10, 2015
- ASML Netherlands B.V.
- Stefan Cornelis Theodorus Van Der Sanden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 8,576,374
- Issue date Nov 5, 2013
- ASML Netherlands B.V.
- Keith Frank Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method of Applying a Pattern to a Substrate, Device Manufacturing M...
- Publication number 20150153656
- Publication date Jun 4, 2015
- ASML NETHERLANDS B.V.
- Stefan Cornelis Theodorus VAN DER SANDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OV...
- Publication number 20150146188
- Publication date May 28, 2015
- ASML NETHERLANDS B.V.
- Irina Lyulina
- G01 - MEASURING TESTING
Information Patent Application
Method of Applying a Pattern to a Substrate, Device Manufacturing M...
- Publication number 20130230797
- Publication date Sep 5, 2013
- ASML NETHERLANDS B.V.
- Stefan Cornelis Theodorus VAN DER SANDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Mark Deformation Estimating Method, Substrate Position Pr...
- Publication number 20130141723
- Publication date Jun 6, 2013
- ASML Netherlands N.V.
- Xiuhong WEI
- G01 - MEASURING TESTING
Information Patent Application
Method and system for automated process correction using model para...
- Publication number 20060139596
- Publication date Jun 29, 2006
- ASML NETHERLANDS B.V.
- Remi Daniel Marie Edart
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment system and method and device manufactured thereby
- Publication number 20050254030
- Publication date Nov 17, 2005
- ASML NETHERLANDS B.V.
- Hoite Pieter Theodoor Tolsma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Remi Daniel Marie Edart

Person

Patents Grantslast 30 patents

Method to determine the usefulness of alignment marks to correct ov...

Method of applying a pattern to a substrate, device manufacturing m...

Alignment mark deformation estimating method, substrate position pr...

Method of applying a pattern to a substrate, device manufacturing m...

Lithographic apparatus and method

Patents Applicationslast 30 patents

Method of Applying a Pattern to a Substrate, Device Manufacturing M...

METHOD TO DETERMINE THE USEFULNESS OF ALIGNMENT MARKS TO CORRECT OV...

Method of Applying a Pattern to a Substrate, Device Manufacturing M...

Alignment Mark Deformation Estimating Method, Substrate Position Pr...

Method and system for automated process correction using model para...

Alignment system and method and device manufactured thereby