Rene Monshouwer

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a marker on a substrate, lithographic apparatu...
- Patent number 8,264,664
- Issue date Sep 11, 2012
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring the relative position of a first...
- Patent number 7,633,618
- Issue date Dec 15, 2009
- ASML Netherlands B.V.
- Rene Monshouwer
- G01 - MEASURING TESTING
Information Patent Grant
Method for producing a marker on a substrate, lithographic apparatu...
- Patent number 7,476,490
- Issue date Jan 13, 2009
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic alignment system and device manufacturing method
- Patent number 7,345,739
- Issue date Mar 18, 2008
- ASML Netherlands B.V.
- Robert Frans Maria Hendriks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,312,846
- Issue date Dec 25, 2007
- ASML Netherlands B.V.
- Jacobus Hermanus Maria Neijzen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring overlay
- Patent number 7,277,185
- Issue date Oct 2, 2007
- ASML Netherlands B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring alignment of a substrate with respect to a refe...
- Patent number 7,095,499
- Issue date Aug 22, 2006
- ASML Netherlands B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring overlay
- Patent number 6,937,344
- Issue date Aug 30, 2005
- ASML Netherlands B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of measuring alignment of a substrate with respect to a refe...
- Patent number 6,937,334
- Issue date Aug 30, 2005
- ASML Netherlands B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 6,803,993
- Issue date Oct 12, 2004
- ASML Netherlands B.V.
- Jacobus Hermanus Maria Neijzen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING A MARKER ON A SUBSTRATE, LITHOGRAPHIC APPARATU...
- Publication number 20090066921
- Publication date Mar 12, 2009
- ASML NETHERLANDS B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing a marker on a substrate, lithographic apparatu...
- Publication number 20060008714
- Publication date Jan 12, 2006
- ASML NETHERLANDS, B.V.
- Maurits Van Der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring alignment of a substrate with respect to a refe...
- Publication number 20050231698
- Publication date Oct 20, 2005
- ASML NETHERLANDS B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring overlay
- Publication number 20050231732
- Publication date Oct 20, 2005
- ASML NETHERLANDS B.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for measuring the relative position of a first...
- Publication number 20050123844
- Publication date Jun 9, 2005
- ASML NETHERLANDS B.V.
- Rene Monshouwer
- G01 - MEASURING TESTING
Information Patent Application
Lithographic alignment system and device manufacturing method
- Publication number 20050110965
- Publication date May 26, 2005
- ASML NETHERLANDS B.V.
- Robert Frans Maria Hendriks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20050012915
- Publication date Jan 20, 2005
- ASML NETHERLANDS B.V.
- Jacobus Hermanus Maria Neijzen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20030123035
- Publication date Jul 3, 2003
- Jacobus Hermanus Maria Neijzen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring alignment of a substrate with respect to a refe...
- Publication number 20020080365
- Publication date Jun 27, 2002
- Koninklijke Philips Electronics N.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of measuring overlay
- Publication number 20020080364
- Publication date Jun 27, 2002
- Koninklijke Philips Electronics N.V.
- Rene Monshouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Rene Monshouwer

Person

Patents Grantslast 30 patents

Method for producing a marker on a substrate, lithographic apparatu...

Method and apparatus for measuring the relative position of a first...

Method for producing a marker on a substrate, lithographic apparatu...

Lithographic alignment system and device manufacturing method

Lithographic apparatus and device manufacturing method

Method of measuring overlay

Method of measuring alignment of a substrate with respect to a refe...

Method of measuring overlay

Method of measuring alignment of a substrate with respect to a refe...

Lithographic apparatus and device manufacturing method

Patents Applicationslast 30 patents

METHOD FOR PRODUCING A MARKER ON A SUBSTRATE, LITHOGRAPHIC APPARATU...

Method for producing a marker on a substrate, lithographic apparatu...

Method of measuring alignment of a substrate with respect to a refe...

Method of measuring overlay

Method and apparatus for measuring the relative position of a first...

Lithographic alignment system and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Method of measuring alignment of a substrate with respect to a refe...

Method of measuring overlay