RENEE KOCH

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Brentwood, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Multi-step photomask etching with chlorine for uniformity control
- Patent number 7,786,019
- Issue date Aug 31, 2010
- Applied Materials, Inc.
- Renee Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MULTI-STEP PHOTOMASK ETCHING WITH CHLORINE FOR UNIFORMITY CONTROL
- Publication number 20080142476
- Publication date Jun 19, 2008
- Applied Materials, Inc.
- RENEE KOCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY