Renhe JIA

Person

Naperville, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing composition containing ceria particles and method of use
- Patent number 10,414,947
- Issue date Sep 17, 2019
- Cabot Microelectronics Corporation
- Brian Reiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMP compositions and methods for selective removal of silicon nitride
- Patent number 9,850,402
- Issue date Dec 26, 2017
- Cabot Microelectronics Corporation
- Dmitry Dinega
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing composition containing ceria abrasive
- Patent number 9,828,528
- Issue date Nov 28, 2017
- Cabot Microelectronics Corporation
- Brian Reiss
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition containing cationic polymer additive
- Patent number 9,758,697
- Issue date Sep 12, 2017
- Cabot Microelectronics Corporation
- Brian Reiss
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Polishing composition containing ceria abrasive
- Patent number 9,505,952
- Issue date Nov 29, 2016
- Cabot Microelectronics Corporation
- Brian Reiss
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical planarization of polymer films
- Patent number 9,434,859
- Issue date Sep 6, 2016
- Cabot Microelectronics Corporation
- Sudeep Pallikkara Kuttiatoor
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP compositions exhibiting reduced dishing in STI wafer polishing
- Patent number 9,422,455
- Issue date Aug 23, 2016
- Cabot Microelectronics Corporation
- Sudeep Pallikkara Kuttiatoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mixed abrasive polishing compositions
- Patent number 9,340,706
- Issue date May 17, 2016
- Cabot Microelectronics Corporation
- Brian Reiss
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP compositions selective for oxide over polysilicon and nitride w...
- Patent number 9,165,489
- Issue date Oct 20, 2015
- Cabot Microelectronics Corporation
- Tina Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP compositions selective for oxide and nitride with high removal...
- Patent number 8,906,252
- Issue date Dec 9, 2014
- Cabot Microelelctronics Corporation
- Kevin P. Dockery
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF POLISHING A LOW-K SUBSTRATE
- Publication number 20170194160
- Publication date Jul 6, 2017
- Cabot Microelectronics Corporation
- Sudeep PALLIKKARA KUTTIATOOR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION CONTAINING CERIA ABRASIVE
- Publication number 20170044403
- Publication date Feb 16, 2017
- Cabot Microelectronics Corporation
- Brian REISS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION CONTAINING CERIA PARTICLES AND METHOD OF USE
- Publication number 20160257855
- Publication date Sep 8, 2016
- Cabot Microelectronics Corporation
- Brian REISS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION CONTAINING CATIONIC POLYMER ADDITIVE
- Publication number 20160257853
- Publication date Sep 8, 2016
- Cabot Microelectronics Corporation
- Brian REISS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLISHING COMPOSITION CONTAINING CERIA ABRASIVE
- Publication number 20160257856
- Publication date Sep 8, 2016
- Cabot Microelectronics Corporation
- Brian REISS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITIONS EXHIBITING REDUCED DISHING IN STI WAFER POLISHING
- Publication number 20160168421
- Publication date Jun 16, 2016
- Cabot Microelectronics Corporation
- Sudeep PALLIKKARA KUTTIATOOR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITIONS AND METHODS FOR SELECTIVE REMOVAL OF SILICON NITRIDE
- Publication number 20150159046
- Publication date Jun 11, 2015
- Cabot Microelectronics Corporation
- Dmitry DINEGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MIXED ABRASIVE POLISHING COMPOSITIONS
- Publication number 20150102012
- Publication date Apr 16, 2015
- Cabot Microelectronics Corporation
- Brian REISS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL PLANARIZATION OF POLYMER FILMS
- Publication number 20150083689
- Publication date Mar 26, 2015
- Cabot Microelectronics Corporation
- Sudeep PALLIKKARA KUTTIATOOR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITIONS SELECTIVE FOR OXIDE AND NITRIDE WITH HIGH REMOVAL...
- Publication number 20140346140
- Publication date Nov 27, 2014
- Kevin P. Dockery
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITIONS SELECTIVE FOR OXIDE OVER POLYSILICON AND NITRIDE W...
- Publication number 20140349483
- Publication date Nov 27, 2014
- Tina LI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Polishing composition containing ceria particles and method of use

CMP compositions and methods for selective removal of silicon nitride

Polishing composition containing ceria abrasive

Polishing composition containing cationic polymer additive

Polishing composition containing ceria abrasive

Chemical-mechanical planarization of polymer films

CMP compositions exhibiting reduced dishing in STI wafer polishing

Mixed abrasive polishing compositions

CMP compositions selective for oxide over polysilicon and nitride w...

CMP compositions selective for oxide and nitride with high removal...

Patents Applicationslast 30 patents

METHOD OF POLISHING A LOW-K SUBSTRATE

POLISHING COMPOSITION CONTAINING CERIA ABRASIVE

POLISHING COMPOSITION CONTAINING CERIA PARTICLES AND METHOD OF USE

POLISHING COMPOSITION CONTAINING CATIONIC POLYMER ADDITIVE

POLISHING COMPOSITION CONTAINING CERIA ABRASIVE

CMP COMPOSITIONS EXHIBITING REDUCED DISHING IN STI WAFER POLISHING

CMP COMPOSITIONS AND METHODS FOR SELECTIVE REMOVAL OF SILICON NITRIDE

MIXED ABRASIVE POLISHING COMPOSITIONS

CHEMICAL-MECHANICAL PLANARIZATION OF POLYMER FILMS

CMP COMPOSITIONS SELECTIVE FOR OXIDE AND NITRIDE WITH HIGH REMOVAL...

CMP COMPOSITIONS SELECTIVE FOR OXIDE OVER POLYSILICON AND NITRIDE W...