Reuel Liebert

Person

Peabody, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Technique for low-temperature ion implantation
- Patent number 8,319,196
- Issue date Nov 27, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for temperature controlled ion implantation
- Patent number 7,993,698
- Issue date Aug 9, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique for low-temperature ion implantation
- Patent number 7,935,942
- Issue date May 3, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for ion beam neutralization in magnets
- Patent number 6,762,423
- Issue date Jul 13, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dose monitor for plasma doping system
- Patent number 6,020,592
- Issue date Feb 1, 2000
- Varian Semiconductor Equipment Associates, Inc.
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for ion beam centroid location
- Patent number 4,724,324
- Issue date Feb 9, 1988
- Varian Associates, Inc.
- Reuel B. Liebert
- G01 - MEASURING TESTING
Information Patent Grant
Method for reducing phosphorous contamination in a vacuum processin...
- Patent number 4,512,812
- Issue date Apr 23, 1985
- Varian Associates, Inc.
- Reuel B. Liebert
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
TECHNIQUE FOR LOW-TEMPERATURE ION IMPLANTATION
- Publication number 20110207308
- Publication date Aug 25, 2011
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan G. ENGLAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Techniques for temperature controlled ion implantation
- Publication number 20080076194
- Publication date Mar 27, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Julian Blake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Technique for low-temperature ion implantation
- Publication number 20080044938
- Publication date Feb 21, 2008
- Varian Semiconductor Equipment Associates, Inc.
- Jonathan England
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter having enhanced low energy ion beam transport
- Publication number 20060043316
- Publication date Mar 2, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and methods for junction formation using optical illumina...
- Publication number 20040235281
- Publication date Nov 25, 2004
- Daniel F. Downey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR ION BEAM NEUTRALIZATION IN MAGNETS
- Publication number 20040084635
- Publication date May 6, 2004
- Varian Semiconductor Equipment Associates, Inc.
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dose monitor for plasma doping system
- Publication number 20020030167
- Publication date Mar 14, 2002
- Reuel B. Liebert
- H01 - BASIC ELECTRIC ELEMENTS

Reuel Liebert

Person

Patents Grantslast 30 patents

Technique for low-temperature ion implantation

Techniques for temperature controlled ion implantation

Technique for low-temperature ion implantation

Methods and apparatus for ion beam neutralization in magnets

Dose monitor for plasma doping system

Method and apparatus for ion beam centroid location

Method for reducing phosphorous contamination in a vacuum processin...

Patents Applicationslast 30 patents

TECHNIQUE FOR LOW-TEMPERATURE ION IMPLANTATION

Techniques for temperature controlled ion implantation

Technique for low-temperature ion implantation

Ion implanter having enhanced low energy ion beam transport

Apparatus and methods for junction formation using optical illumina...

METHODS AND APPARATUS FOR ION BEAM NEUTRALIZATION IN MAGNETS

Dose monitor for plasma doping system