Reza GOLZARIAN

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical mechanical polishing composition
- Patent number 11,993,729
- Issue date May 28, 2024
- BASF SE
- Christian Daeschlein
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing of substrates containing copper and r...
- Patent number 11,725,117
- Issue date Aug 15, 2023
- BASF SE
- Haci Osman Guevenc
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 11,286,402
- Issue date Mar 29, 2022
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 11,264,250
- Issue date Mar 1, 2022
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,899,945
- Issue date Jan 26, 2021
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,738,219
- Issue date Aug 11, 2020
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing (CMP) composition
- Patent number 10,570,316
- Issue date Feb 25, 2020
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,385,236
- Issue date Aug 20, 2019
- BASF SE
- Robert Reichardt
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical-mechanical polishing composition comprising organic/inorga...
- Patent number 10,214,663
- Issue date Feb 26, 2019
- ST. LAWRENCE NANOTECHNOLOGY
- Yongqing Lan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20240002698
- Publication date Jan 4, 2024
- BASF SE
- Haci Osman GUEVENC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20230416570
- Publication date Dec 28, 2023
- BASF SE
- Haci Osman GUEVENC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20220064485
- Publication date Mar 3, 2022
- BASF SE
- Haci Osman GUEVENC
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20220056307
- Publication date Feb 24, 2022
- BASF SE
- Haci Osman GUEVENC
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...
- Publication number 20220049125
- Publication date Feb 17, 2022
- BASF SE
- Haci Osman GUEVENC
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20210102093
- Publication date Apr 8, 2021
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION
- Publication number 20200299547
- Publication date Sep 24, 2020
- BASF SE
- Christian DAESCHLEIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20200294813
- Publication date Sep 17, 2020
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20180230333
- Publication date Aug 16, 2018
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20180016468
- Publication date Jan 18, 2018
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20170369741
- Publication date Dec 28, 2017
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20170362464
- Publication date Dec 21, 2017
- BASF SE
- Robert REICHARDT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING ORGANIC/INORGA...
- Publication number 20170226381
- Publication date Aug 10, 2017
- BASF SE
- Yongqing LAN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION
- Publication number 20170158913
- Publication date Jun 8, 2017
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Reza GOLZARIAN

Person

Patents Grantslast 30 patents

Chemical mechanical polishing composition

Chemical mechanical polishing of substrates containing copper and r...

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Chemical mechanical polishing (CMP) composition

Use of a chemical mechanical polishing (CMP) composition for polish...

Chemical-mechanical polishing composition comprising organic/inorga...

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

CHEMICAL MECHANICAL POLISHING OF SUBSTRATES CONTAINING COPPER AND R...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL MECHANICAL POLISHING COMPOSITION

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING ORGANIC/INORGA...

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION