Reza Sadjadi

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process chamber having tunable showerhead and tunable liner
- Patent number 10,811,233
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- Andrew Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pixelated capacitance controlled ESC
- Patent number 9,805,965
- Issue date Oct 31, 2017
- Applied Materials, Inc.
- Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable magnetic field to improve uniformity
- Patent number 9,646,843
- Issue date May 9, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pixelated capacitance controlled ESC
- Patent number 9,536,769
- Issue date Jan 3, 2017
- Applied Materials, Inc.
- Reza Sadjadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pixelated capacitance controlled ESC
- Patent number 9,472,410
- Issue date Oct 18, 2016
- Applied Materials, Inc.
- Reza Sadjadi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for controlling plasma potential
- Patent number 9,111,724
- Issue date Aug 18, 2015
- Lam Research Corporation
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution system having fast gas switching capabilities
- Patent number 8,673,785
- Issue date Mar 18, 2014
- Lam Research Corporation
- Zhisong Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic enhancement for mechanical confinement of plasma
- Patent number 7,838,086
- Issue date Nov 23, 2010
- Lam Research Corporation
- Douglas L. Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution system having fast gas switching capabilities
- Patent number 7,708,859
- Issue date May 4, 2010
- Lam Research Corporation
- Zhisong Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrically enhancing the confinement of plasma
- Patent number 7,632,375
- Issue date Dec 15, 2009
- Lam Research Corporation
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic enhancement for mechanical confinement of plasma
- Patent number 7,455,748
- Issue date Nov 25, 2008
- Lam Research Corporation
- Douglas L. Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for resist strip in presence of low K dielectric material an...
- Patent number 7,452,660
- Issue date Nov 18, 2008
- Lam Research Corporation
- Zhisong Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for plasma stripping using periodic modulation of gas chemis...
- Patent number 7,294,580
- Issue date Nov 13, 2007
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for resist strip in presence of regular low k and/or porous...
- Patent number 7,288,488
- Issue date Oct 30, 2007
- Lam Research Corporation
- Helen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plug fill
- Patent number 7,192,531
- Issue date Mar 20, 2007
- Lam Research Corporation
- Sean S. Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a dual damascene structure
- Patent number 7,169,695
- Issue date Jan 30, 2007
- Lam Research Corporation
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for inspecting contact openings in a plasma p...
- Patent number 6,979,579
- Issue date Dec 27, 2005
- Lam Research Corporation
- Jisoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post-development treatment of patterned photoresist to promote cros...
- Patent number 6,780,569
- Issue date Aug 24, 2004
- Lam Research Corporation
- Eric Hudson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Combined resist strip and barrier etch process for dual damascene s...
- Patent number 6,518,174
- Issue date Feb 11, 2003
- Lam Research Corporation
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS CHAMBER HAVING TUNABLE SHOWERHEAD AND TUNABLE LINER
- Publication number 20180047544
- Publication date Feb 15, 2018
- ANDREW NGUYEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIXELATED CAPACITANCE CONTROLLED ESC
- Publication number 20170004988
- Publication date Jan 5, 2017
- Applied Materials, Inc.
- Reza SADJADI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE MAGNETIC FIELD TO IMPROVE UNIFORMITY
- Publication number 20160163511
- Publication date Jun 9, 2016
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PIXELATED CAPACITANCE CONTROLLED ESC
- Publication number 20150311105
- Publication date Oct 29, 2015
- Applied Materials
- Reza SADJADI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and Method for Controlling Plasma Potential
- Publication number 20110024046
- Publication date Feb 3, 2011
- LAM RESEARCH CORPORATION
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Controlling Plasma Potential
- Publication number 20110024045
- Publication date Feb 3, 2011
- LAM RESEARCH CORPORATION
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION SYSTEM HAVING FAST GAS SWITCHING CAPABILITIES
- Publication number 20100159707
- Publication date Jun 24, 2010
- LAM RESEARCH CORPORATION
- Zhisong Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTRICALLY ENHANCING THE CONFINEMENT OF PLASMA
- Publication number 20090165954
- Publication date Jul 2, 2009
- LAM RESEARCH CORPORATION
- Andras Kuthi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC ENHANCEMENT FOR MECHANICAL CONFINEMENT OF PLASMA
- Publication number 20090041951
- Publication date Feb 12, 2009
- LAM RESEARCH CORPORATION
- Douglas L. Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Resist Strip in Presence of Low K Dielectric Material an...
- Publication number 20090032192
- Publication date Feb 5, 2009
- LAM RESEARCH CORPORATION
- Zhisong Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and Method for Controlling Plasma Potential
- Publication number 20080006205
- Publication date Jan 10, 2008
- Douglas Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for resist strip in presence of regular low k and/or porous...
- Publication number 20060258148
- Publication date Nov 16, 2006
- LAM RESEARCH CORPORATION
- Helen Zhu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gas distribution system having fast gas switching capabilities
- Publication number 20050241763
- Publication date Nov 3, 2005
- Zhisong Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic enhancement for mechanical confinement of plasma
- Publication number 20050006028
- Publication date Jan 13, 2005
- Lam Research Corporation
- Douglas L. Keil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for plasma stripping using periodic modulation of gas chemis...
- Publication number 20040224520
- Publication date Nov 11, 2004
- Lam Research Corporation
- Seokmin Yun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching with NH3 and fluorine chemistries
- Publication number 20040211517
- Publication date Oct 28, 2004
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for forming a dual damascene structure
- Publication number 20040072430
- Publication date Apr 15, 2004
- Zhisong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of etching with NH3 and fluorine chemistries
- Publication number 20020121500
- Publication date Sep 5, 2002
- Rao Annapragada
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Combined resist strip and barrier etch process for dual damascene s...
- Publication number 20020119664
- Publication date Aug 29, 2002
- Lam Research Corporation
- Rao Annapragada
- H01 - BASIC ELECTRIC ELEMENTS

Reza Sadjadi

Person

Patents Grantslast 30 patents

Process chamber having tunable showerhead and tunable liner

Pixelated capacitance controlled ESC

Tunable magnetic field to improve uniformity

Pixelated capacitance controlled ESC

Pixelated capacitance controlled ESC

Apparatus and method for controlling plasma potential

Gas distribution system having fast gas switching capabilities

Magnetic enhancement for mechanical confinement of plasma

Gas distribution system having fast gas switching capabilities

Electrically enhancing the confinement of plasma

Magnetic enhancement for mechanical confinement of plasma

Method for resist strip in presence of low K dielectric material an...

Method for plasma stripping using periodic modulation of gas chemis...

Method for resist strip in presence of regular low k and/or porous...

In-situ plug fill

Method for forming a dual damascene structure

Methods and apparatus for inspecting contact openings in a plasma p...

Post-development treatment of patterned photoresist to promote cros...

Combined resist strip and barrier etch process for dual damascene s...

Patents Applicationslast 30 patents

PROCESS CHAMBER HAVING TUNABLE SHOWERHEAD AND TUNABLE LINER

PIXELATED CAPACITANCE CONTROLLED ESC

TUNABLE MAGNETIC FIELD TO IMPROVE UNIFORMITY

PIXELATED CAPACITANCE CONTROLLED ESC

Apparatus and Method for Controlling Plasma Potential

Apparatus and Method for Controlling Plasma Potential

GAS DISTRIBUTION SYSTEM HAVING FAST GAS SWITCHING CAPABILITIES

ELECTRICALLY ENHANCING THE CONFINEMENT OF PLASMA

MAGNETIC ENHANCEMENT FOR MECHANICAL CONFINEMENT OF PLASMA

Method for Resist Strip in Presence of Low K Dielectric Material an...

Apparatus and Method for Controlling Plasma Potential

Method for resist strip in presence of regular low k and/or porous...

Gas distribution system having fast gas switching capabilities

Magnetic enhancement for mechanical confinement of plasma

Method for plasma stripping using periodic modulation of gas chemis...

Method of etching with NH3 and fluorine chemistries

Method for forming a dual damascene structure

Method of etching with NH3 and fluorine chemistries

Combined resist strip and barrier etch process for dual damascene s...