Ricarda Schneider

Person

Zusmarshausen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective optical element
- Patent number 9,470,872
- Issue date Oct 18, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G01 - MEASURING TESTING
Information Patent Grant
Illumination and displacement device for a projection exposure appa...
- Patent number 9,134,613
- Issue date Sep 15, 2015
- Carl Zeiss SMT GmbH
- Sonja Schneider
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20170261730
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...
- Publication number 20160161852
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Karl-Heinz SCHUSTER
- G02 - OPTICS
Information Patent Application
OPTICAL ASSEMBLY
- Publication number 20160091798
- Publication date Mar 31, 2016
- Carl Zeiss SMT GMBH
- Walter Pauls
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC APPARATUS
- Publication number 20160011521
- Publication date Jan 14, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...
- Publication number 20150168674
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
SYSTEM CORRECTION FROM LONG TIMESCALES
- Publication number 20150160562
- Publication date Jun 11, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective Optical Element
- Publication number 20150116703
- Publication date Apr 30, 2015
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20140347721
- Publication date Nov 27, 2014
- Boris Bittner
- B82 - NANO-TECHNOLOGY
Information Patent Application
ILLUMINATION AND DISPLACEMENT DEVICE FOR A PROJECTION EXPOSURE APPA...
- Publication number 20140239192
- Publication date Aug 28, 2014
- Sonja Schneider
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20140185024
- Publication date Jul 3, 2014
- Johannes Zellner
- H01 - BASIC ELECTRIC ELEMENTS

Ricarda Schneider

Person

Patents Grantslast 30 patents

Reflective optical element

Illumination and displacement device for a projection exposure appa...

Patents Applicationslast 30 patents

Projection Lens for EUV Microlithography, Film Element and Method f...

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...

OPTICAL ASSEMBLY

MICROLITHOGRAPHIC APPARATUS

MIRROR ARRANGEMENT FOR AN EUV PROJECTION EXPOSURE APPARATUS, METHOD...

SYSTEM CORRECTION FROM LONG TIMESCALES

Reflective Optical Element

Projection Lens for EUV Microlithography, Film Element and Method f...

ILLUMINATION AND DISPLACEMENT DEVICE FOR A PROJECTION EXPOSURE APPA...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...