Ricardo Alves Donaton

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Heverlee, BE

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Patents Grantslast 30 patents

Information Patent Grant
Etching process of CoSi2 layers
- Patent number 6,255,227
- Issue date Jul 3, 2001
- Interuniversitair Microelektronica Centrum
- Ricardo Alves Donaton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching process of CoSi.sub.2 layers
- Patent number 6,153,484
- Issue date Nov 28, 2000
- IMEC vzw
- Ricardo Alves Donaton
- H01 - BASIC ELECTRIC ELEMENTS