Richard A. Scholl

Person

Fort Collins, CO, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dual anode AC supply for continuous deposition of a cathode material
- Patent number 7,211,179
- Issue date May 1, 2007
- Advanced Energy Industries, Inc.
- Eric Seymour
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for substrate biasing in multiple electrode sp...
- Patent number 6,818,103
- Issue date Nov 16, 2004
- Advanced Energy Industries, Inc.
- Richard A. Scholl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for plasma ignition by fast voltage rise
- Patent number 6,633,017
- Issue date Oct 14, 2003
- Advanced Energy Industries, Inc.
- Geoffrey N. Drummond
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Periodically clearing thin film plasma processing system
- Patent number 6,521,099
- Issue date Feb 18, 2003
- Advanced Energy Industries, Inc.
- Geoffrey Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable energy quantum thin film plasma processing system
- Patent number 6,368,477
- Issue date Apr 9, 2002
- Advanced Energy Industries, Inc.
- Richard A. Scholl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma generator pulsed direct current supply in a bridge configura...
- Patent number 6,222,321
- Issue date Apr 24, 2001
- Advanced Energy Industries, Inc.
- Richard A. Scholl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Periodically clearing thin film plasma processing system
- Patent number 6,217,717
- Issue date Apr 17, 2001
- Advanced Energy Industries, Inc.
- Geoffrey N. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
AC powered system for continuous deposition of a cathode material
- Patent number 6,183,605
- Issue date Feb 6, 2001
- Advanced Energy Industries, Inc.
- Douglas S. Schatz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced reactive DC sputtering system
- Patent number 6,024,844
- Issue date Feb 15, 2000
- Advanced Energy Industries, Inc.
- Geoffrey N. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable energy quantum thin film plasma processing system
- Patent number 6,007,879
- Issue date Dec 28, 1999
- Advanced Energy Industries, Inc.
- Richard A. Scholl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced reactive DC sputtering system
- Patent number 6,001,224
- Issue date Dec 14, 1999
- Advanced Energy Industries, Inc.
- Geoffrey N. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed direct current power supply configurations for generating pl...
- Patent number 5,917,286
- Issue date Jun 29, 1999
- Advanced Energy Industries, Inc.
- Richard A. Scholl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Continuous deposition of insulating material using multiple anodes...
- Patent number 5,897,753
- Issue date Apr 27, 1999
- Advanced Energy Industries, Inc.
- Douglas S. Schatz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Periodically clearing thin film plasma processing system
- Patent number 5,863,392
- Issue date Jan 26, 1999
- Advanced Energy Industries, Inc.
- Geoffrey N. Drummond
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced reactive DC sputtering system
- Patent number 5,718,813
- Issue date Feb 17, 1998
- Advanced Energy Industries, Inc.
- Geoffrey N. Drummond
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Dual anode AC supply for continuous deposition of a cathode material
- Publication number 20060131170
- Publication date Jun 22, 2006
- Eric Seymour
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively coupled plasma source using induced eddy currents
- Publication number 20050194099
- Publication date Sep 8, 2005
- Russell F. Jewett
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Richard A. Scholl

Person

Patents Grantslast 30 patents

Dual anode AC supply for continuous deposition of a cathode material

Method and apparatus for substrate biasing in multiple electrode sp...

System for plasma ignition by fast voltage rise

Periodically clearing thin film plasma processing system

Adjustable energy quantum thin film plasma processing system

Plasma generator pulsed direct current supply in a bridge configura...

Periodically clearing thin film plasma processing system

AC powered system for continuous deposition of a cathode material

Enhanced reactive DC sputtering system

Adjustable energy quantum thin film plasma processing system

Enhanced reactive DC sputtering system

Pulsed direct current power supply configurations for generating pl...

Continuous deposition of insulating material using multiple anodes...

Periodically clearing thin film plasma processing system

Enhanced reactive DC sputtering system

Patents Applicationslast 30 patents

Dual anode AC supply for continuous deposition of a cathode material

Inductively coupled plasma source using induced eddy currents