Richard C. Hawthorne

Person

late of Nampa, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming a dielectric
- Patent number 6,432,841
- Issue date Aug 13, 2002
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and etchants for etching oxides of silicon with low selecti...
- Patent number 6,399,504
- Issue date Jun 4, 2002
- Micron Technology, Inc.
- Whonchee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for wafer cleaning
- Patent number 6,235,145
- Issue date May 22, 2001
- Micron Technology, Inc.
- Li Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Methods and etchants for etching oxides of silicon with low selecti...
- Patent number 6,210,489
- Issue date Apr 3, 2001
- Micron Technology, Inc.
- Whonchee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a dielectric
- Patent number 6,207,587
- Issue date Mar 27, 2001
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for in situ removal of particulate residues resulting from c...
- Patent number 6,029,680
- Issue date Feb 29, 2000
- Micron Technology, Inc.
- Richard C. Hawthorne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for removing silicon nitride in the fabrication of semicondu...
- Patent number 6,010,949
- Issue date Jan 4, 2000
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etching of oxides
- Patent number 5,990,019
- Issue date Nov 23, 1999
- Micron Technology, Inc.
- Kevin James Torek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlled selective polysilicon etching
- Patent number 5,928,969
- Issue date Jul 27, 1999
- Micron Technology, Inc.
- Li Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist removal process using heated solvent vapor
- Patent number 5,785,875
- Issue date Jul 28, 1998
- Micron Technology, Inc.
- Richard C. Hawthorne
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of wafer cleaning, and system and cleaning solution regardin...
- Patent number 5,783,495
- Issue date Jul 21, 1998
- Micron Technology, Inc.
- Li Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for in situ removal of particulate residues resulting from h...
- Patent number 5,770,263
- Issue date Jun 23, 1998
- Micron Technology, Inc.
- Richard C. Hawthorne
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for dry cleaning wafer surfaces using a surface diffusion l...
- Patent number 5,749,975
- Issue date May 12, 1998
- Micron Technology, Inc.
- Li Li
- B08 - CLEANING
Information Patent Grant
Methods and etchants for etching oxides of silicon with low selecti...
- Patent number 5,716,535
- Issue date Feb 10, 1998
- Micron Technology, Inc.
- Whonchee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and etchants for etching oxides of silicon with low selecti...
- Patent number 5,685,951
- Issue date Nov 11, 1997
- Micron Technology, Inc.
- Kevin James Torek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for enhancing nitridation and oxidation growth by introducin...
- Patent number 5,264,396
- Issue date Nov 23, 1993
- Micron Semiconductor, Inc.
- Randhir P. S. Thakur
- H01 - BASIC ELECTRIC ELEMENTS

Richard C. Hawthorne

Person

Patents Grantslast 30 patents

Method for forming a dielectric

Methods and etchants for etching oxides of silicon with low selecti...

System for wafer cleaning

Methods and etchants for etching oxides of silicon with low selecti...

Method for forming a dielectric

Method for in situ removal of particulate residues resulting from c...

Method for removing silicon nitride in the fabrication of semicondu...

Selective etching of oxides

Method for controlled selective polysilicon etching

Photoresist removal process using heated solvent vapor

Method of wafer cleaning, and system and cleaning solution regardin...

Method for in situ removal of particulate residues resulting from h...

Process for dry cleaning wafer surfaces using a surface diffusion l...

Methods and etchants for etching oxides of silicon with low selecti...

Methods and etchants for etching oxides of silicon with low selecti...

Method for enhancing nitridation and oxidation growth by introducin...