Richard Charles Fovell

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Monolithic modular microwave source with integrated process gas dis...
- Patent number 12,191,118
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- James Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic modular microwave source with integrated temperature con...
- Patent number 12,144,090
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- James Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Modular microwave source with multiple metal housings
- Patent number 12,033,835
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two channel cosine-theta coil assembly
- Patent number 11,915,850
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Richard C. Fovell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic modular microwave source with integrated process gas dis...
- Patent number 11,881,384
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- James Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,670,489
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monolithic modular microwave source with integrated temperature con...
- Patent number 11,564,292
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- James Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,049,694
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution plate assembly for high power plasma etch processes
- Patent number 11,043,360
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- James D. Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetrical plural-coil plasma source with side RF feeds and RF dis...
- Patent number 10,811,226
- Issue date Oct 20, 2020
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for controlling temperature uniformity of a showerhead
- Patent number 10,780,447
- Issue date Sep 22, 2020
- Applied Materials, Inc.
- Richard Fovell
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Distributed electro-static chuck cooling
- Patent number 10,537,013
- Issue date Jan 14, 2020
- Applied Materials, Inc.
- Fernando Silveira
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of real time in-situ chamber condition monitoring using sens...
- Patent number 10,395,904
- Issue date Aug 27, 2019
- Applied Materials, Inc.
- Lawrence Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetrical inductively coupled plasma source with coaxial RF feed...
- Patent number 10,249,470
- Issue date Apr 2, 2019
- Applied Materials, Inc.
- Jason A. Kenney
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multiple coil inductively coupled plasma source with offset frequen...
- Patent number 10,170,279
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Jason A. Kenney
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of real time in-situ chamber condition monitoring using sens...
- Patent number 10,141,166
- Issue date Nov 27, 2018
- Applied Materials, Inc.
- Lawrence Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma source with top coil over a ceiling and...
- Patent number 10,131,994
- Issue date Nov 20, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma source with symmetrical RF feed
- Patent number 9,928,987
- Issue date Mar 27, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma source with multiple dielectric windows...
- Patent number 9,896,769
- Issue date Feb 20, 2018
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetrical plural-coil plasma source with side RF feeds and RF dis...
- Patent number 9,870,897
- Issue date Jan 16, 2018
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetrical inductively coupled plasma source with symmetrical flow...
- Patent number 9,745,663
- Issue date Aug 29, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for rapidly responsive heat control in plasma...
- Patent number 9,155,134
- Issue date Oct 6, 2015
- Applied Materials, Inc.
- Chunlei Zhang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Symmetrical inductively coupled plasma source with side RF feeds an...
- Patent number 9,082,590
- Issue date Jul 14, 2015
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with a multiple zone thermal control feed forward co...
- Patent number 8,980,044
- Issue date Mar 17, 2015
- BE Aerospace, Inc.
- Paul Lukas Brillhart
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Methods and apparatus for rapidly responsive heat control in plasma...
- Patent number 8,895,889
- Issue date Nov 25, 2014
- Applied Materials, Inc.
- Chunlei Zhang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of cooling a wafer support at a uniform temperature in a cap...
- Patent number 8,801,893
- Issue date Aug 12, 2014
- BE Aerospace, Inc.
- Paul Lukas Brillhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with feed forward thermal control system using a the...
- Patent number 8,608,900
- Issue date Dec 17, 2013
- B/E Aerospace, Inc.
- Douglas A. Buchberger
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate support temperature control
- Patent number 8,596,336
- Issue date Dec 3, 2013
- Applied Materials, Inc.
- Richard Fovell
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Method of processing a workpiece in a plasma reactor using multiple...
- Patent number 8,546,267
- Issue date Oct 1, 2013
- B/E Aerospace, Inc.
- Paul Lukas Brillhart
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Capacitively coupled plasma reactor having very agile wafer tempera...
- Patent number 8,337,660
- Issue date Dec 25, 2012
- B/E Aerospace, Inc.
- Douglas A. Buchberger, Jr.
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...
- Publication number 20240186118
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- JAMES CARDUCCI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED TEMPERATURE CON...
- Publication number 20230135935
- Publication date May 4, 2023
- Applied Materials, Inc.
- James Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MODULAR MICROWAVE SOURCE WITH MULTIPLE METAL HOUSINGS
- Publication number 20210391149
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210351021
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Fernando SILVEIRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210313153
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...
- Publication number 20210098231
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- James Carducci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210098236
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED TEMPERATURE CON...
- Publication number 20210100076
- Publication date Apr 1, 2021
- Applied Materials, Inc.
- James Carducci
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TWO CHANNEL COSINE-THETA COIL ASSEMBLY
- Publication number 20190189330
- Publication date Jun 20, 2019
- RICHARD C. FOVELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Real Time In-Situ Chamber Condition Monitoring Using Sens...
- Publication number 20190096641
- Publication date Mar 28, 2019
- Applied Materials, Inc.
- Lawrence Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Reactor Having Radial Struts for Substrate Support
- Publication number 20190085467
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED AND REAC...
- Publication number 20180218873
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH SYMMETRICAL RF FEED
- Publication number 20180211811
- Publication date Jul 26, 2018
- Applied Materials, Inc.
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Dis...
- Publication number 20180138014
- Publication date May 17, 2018
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS DISTRIBUTION PLATE ASSEMBLY FOR HIGH POWER PLASMA ETCH PROCESSES
- Publication number 20170365443
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- James D. CARDUCCI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively Coupled Plasma Source with Multiple Dielectric Windows...
- Publication number 20170350018
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow...
- Publication number 20170350017
- Publication date Dec 7, 2017
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SHOWERHEAD
- Publication number 20170304849
- Publication date Oct 26, 2017
- Applied Materials, Inc.
- Richard Fovell
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF REAL TIME IN-SITU CHAMBER CONDITION MONITORING USING SENS...
- Publication number 20160048111
- Publication date Feb 18, 2016
- Applied Materials, Inc.
- Lawrence Wong
- G05 - CONTROLLING REGULATING
Information Patent Application
ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUM...
- Publication number 20160042961
- Publication date Feb 11, 2016
- Applied Materials, Inc.
- Leonid Dorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRICAL PLURAL-COIL PLASMA SOURCE WITH SIDE RF FEEDS AND RF DIS...
- Publication number 20140312766
- Publication date Oct 23, 2014
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH OFFSET FREQUEN...
- Publication number 20140265832
- Publication date Sep 18, 2014
- Applied Materials, Inc.
- Jason A. Kenney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH COAXIAL RF FEED...
- Publication number 20140020838
- Publication date Jan 23, 2014
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH MULTIPLE DIELECTRIC WINDOWS...
- Publication number 20140020837
- Publication date Jan 23, 2014
- ANDREW NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED
- Publication number 20140020839
- Publication date Jan 23, 2014
- Jason A. Kenney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL FLOW...
- Publication number 20140020835
- Publication date Jan 23, 2014
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INDUCTIVELY COUPLED PLASMA SOURCE WITH PLURAL TOP COILS OVER A CEIL...
- Publication number 20140020836
- Publication date Jan 23, 2014
- ANDREW NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AN...
- Publication number 20140021861
- Publication date Jan 23, 2014
- Applied Materials, Inc.
- James D. Carducci
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DISTRIBUTED ELECTRO-STATIC CHUCK COOLING
- Publication number 20130276981
- Publication date Oct 24, 2013
- Fernando Silveira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FAST RESPONSE FLUID TEMPERATURE CONTROL SYSTEM
- Publication number 20130240144
- Publication date Sep 19, 2013
- Applied Materials, Inc.
- Douglas A. Buchberger
- H01 - BASIC ELECTRIC ELEMENTS

Richard Charles Fovell

Person

Patents Grantslast 30 patents

Monolithic modular microwave source with integrated process gas dis...

Monolithic modular microwave source with integrated temperature con...

Modular microwave source with multiple metal housings

Two channel cosine-theta coil assembly

Monolithic modular microwave source with integrated process gas dis...

Modular microwave source with embedded ground surface

Monolithic modular microwave source with integrated temperature con...

Modular microwave source with embedded ground surface

Gas distribution plate assembly for high power plasma etch processes

Symmetrical plural-coil plasma source with side RF feeds and RF dis...

Apparatus for controlling temperature uniformity of a showerhead

Distributed electro-static chuck cooling

Method of real time in-situ chamber condition monitoring using sens...

Symmetrical inductively coupled plasma source with coaxial RF feed...

Multiple coil inductively coupled plasma source with offset frequen...

Method of real time in-situ chamber condition monitoring using sens...

Inductively coupled plasma source with top coil over a ceiling and...

Inductively coupled plasma source with symmetrical RF feed

Inductively coupled plasma source with multiple dielectric windows...

Symmetrical plural-coil plasma source with side RF feeds and RF dis...

Symmetrical inductively coupled plasma source with symmetrical flow...

Methods and apparatus for rapidly responsive heat control in plasma...

Symmetrical inductively coupled plasma source with side RF feeds an...

Plasma reactor with a multiple zone thermal control feed forward co...

Methods and apparatus for rapidly responsive heat control in plasma...

Method of cooling a wafer support at a uniform temperature in a cap...

Plasma reactor with feed forward thermal control system using a the...

Substrate support temperature control

Method of processing a workpiece in a plasma reactor using multiple...

Capacitively coupled plasma reactor having very agile wafer tempera...

Patents Applicationslast 30 patents

MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...

MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED TEMPERATURE CON...

MODULAR MICROWAVE SOURCE WITH MULTIPLE METAL HOUSINGS

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED PROCESS GAS DIS...

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

MONOLITHIC MODULAR MICROWAVE SOURCE WITH INTEGRATED TEMPERATURE CON...

TWO CHANNEL COSINE-THETA COIL ASSEMBLY

Method of Real Time In-Situ Chamber Condition Monitoring Using Sens...

Plasma Reactor Having Radial Struts for Substrate Support

INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED AND REAC...

PLASMA SOURCE WITH SYMMETRICAL RF FEED

Symmetrical Plural-Coil Plasma Source with Side Rf Feeds and Rf Dis...

GAS DISTRIBUTION PLATE ASSEMBLY FOR HIGH POWER PLASMA ETCH PROCESSES

Inductively Coupled Plasma Source with Multiple Dielectric Windows...

Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow...

APPARATUS FOR CONTROLLING TEMPERATURE UNIFORMITY OF A SHOWERHEAD

METHOD OF REAL TIME IN-SITU CHAMBER CONDITION MONITORING USING SENS...

ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUM...

SYMMETRICAL PLURAL-COIL PLASMA SOURCE WITH SIDE RF FEEDS AND RF DIS...

MULTIPLE COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH OFFSET FREQUEN...

SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH COAXIAL RF FEED...

INDUCTIVELY COUPLED PLASMA SOURCE WITH MULTIPLE DIELECTRIC WINDOWS...

INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED

SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL FLOW...

INDUCTIVELY COUPLED PLASMA SOURCE WITH PLURAL TOP COILS OVER A CEIL...

SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AN...

DISTRIBUTED ELECTRO-STATIC CHUCK COOLING

FAST RESPONSE FLUID TEMPERATURE CONTROL SYSTEM