Richard D. Cooper

Person

Sullivan, IN, US

People

Patents Grantslast 30 patents

Information Patent Grant
Polishing pad for use in chemical-mechanical planarization of semic...
- Patent number 7,037,184
- Issue date May 2, 2006
- Raytech Innovation Solutions, LLC
- Angela Petroski
- B24 - GRINDING POLISHING
Information Patent Grant
Gradient polishing pad made from paper-making fibers for use in che...
- Patent number 7,025,668
- Issue date Apr 11, 2006
- Raytech Innovative Solutions, LLC
- Angela Petroski
- B24 - GRINDING POLISHING
Information Patent Grant
Retaining ring with wear pad for use in chemical mechanical planari...
- Patent number 6,979,256
- Issue date Dec 27, 2005
- Raytech Innovative Solutions,LLC
- Richard D. Cooper
- B24 - GRINDING POLISHING
Information Patent Grant
Method for securing a polishing pad to a platen for use in chemical...
- Patent number 6,964,601
- Issue date Nov 15, 2005
- Raytech Innovative Solutions, LLC
- Angela Petroski
- B24 - GRINDING POLISHING
Information Patent Grant
Retaining ring with wear pad for use in chemical mechanical planari...
- Patent number 6,899,610
- Issue date May 31, 2005
- Raytech Innovative Solutions, Inc.
- Richard D. Cooper
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for use in chemical-mechanical planarization of semic...
- Patent number 6,863,774
- Issue date Mar 8, 2005
- Raytech Innovative Solutions, Inc.
- Richard D. Cooper
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for use in chemical—mechanical planarization of semic...
- Patent number 6,852,020
- Issue date Feb 8, 2005
- Raytech Innovative Solutions, Inc.
- Angela Petroski
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
Polishing pad for use in chemical - mechanical palanarization of se...
- Publication number 20050085169
- Publication date Apr 21, 2005
- Richard D. Cooper
- B24 - GRINDING POLISHING
Information Patent Application
Retaining ring with wear pad for use in chemical mechanical planari...
- Publication number 20050026554
- Publication date Feb 3, 2005
- Richard D. Cooper
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad for use in chemical-mechanical planarization of semic...
- Publication number 20040142637
- Publication date Jul 22, 2004
- Angela Petroski
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad for use in chemical - mechanical planarization of sem...
- Publication number 20040142638
- Publication date Jul 22, 2004
- Angela Petroski
- B24 - GRINDING POLISHING
Information Patent Application
Gradient polishing pad made from paper-making fibers for use in che...
- Publication number 20040072522
- Publication date Apr 15, 2004
- Angela Petroski
- B24 - GRINDING POLISHING
Information Patent Application
Method for securing a polishing pad to a platen for use in chemical...
- Publication number 20040053562
- Publication date Mar 18, 2004
- Angela Petroski
- B24 - GRINDING POLISHING
Information Patent Application
Retaining ring with wear pad for use in chemical mechanical planari...
- Publication number 20020182994
- Publication date Dec 5, 2002
- Richard D. Cooper
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pad for use in chemical - mechanical palanarization of se...
- Publication number 20020127862
- Publication date Sep 12, 2002
- Richard D. Cooper
- B24 - GRINDING POLISHING

Richard D. Cooper

Person

Patents Grantslast 30 patents

Polishing pad for use in chemical-mechanical planarization of semic...

Gradient polishing pad made from paper-making fibers for use in che...

Retaining ring with wear pad for use in chemical mechanical planari...

Method for securing a polishing pad to a platen for use in chemical...

Retaining ring with wear pad for use in chemical mechanical planari...

Polishing pad for use in chemical-mechanical planarization of semic...

Polishing pad for use in chemical—mechanical planarization of semic...

Patents Applicationslast 30 patents

Polishing pad for use in chemical - mechanical palanarization of se...

Retaining ring with wear pad for use in chemical mechanical planari...

Polishing pad for use in chemical-mechanical planarization of semic...

Polishing pad for use in chemical - mechanical planarization of sem...

Gradient polishing pad made from paper-making fibers for use in che...

Method for securing a polishing pad to a platen for use in chemical...

Retaining ring with wear pad for use in chemical mechanical planari...

Polishing pad for use in chemical - mechanical palanarization of se...