Richard D. Kaplan

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Wappingers Falls, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Forming edge etch protection using dual layer of positive-negative...
- Patent number 10,095,115
- Issue date Oct 9, 2018
- GLOBALFOUNDRIES Inc.
- Christopher B. Shing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of selective reactive ion etching of substrates
- Patent number 4,826,564
- Issue date May 2, 1989
- International Business Machines Corporation
- Brian H. Desilets
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dry-developed, negative working electron resist system
- Patent number 4,497,891
- Issue date Feb 5, 1985
- International Business Machines Corporation
- Leon H. Kaplan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resolution in optical lithography
- Patent number 4,414,314
- Issue date Nov 8, 1983
- International Business Machines Corporation
- Leon H. Kaplan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FORMING EDGE ETCH PROTECTION USING DUAL LAYER OF POSITIVE-NEGATIVE...
- Publication number 20180067396
- Publication date Mar 8, 2018
- GLOBALFOUNDRIES INC.
- CHRISTOPHER B. SHING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY