Richard F. Reichelderfer deceased

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late of Pleasanton, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Plasma reactor and process with wafer temperature control
- Patent number 5,016,332
- Issue date May 21, 1991
- Branson International Plasma Corporation
- Richard F. Reichelderfer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process and gas mixture for etching aluminum
- Patent number 4,380,488
- Issue date Apr 19, 1983
- Branson International Plasma Corporation
- Richard F. Reichelderfer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process and gas mixture for etching silicon dioxide and silicon nit...
- Patent number 4,324,611
- Issue date Apr 13, 1982
- Branson International Plasma Corporation
- Diane C. Vogel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computer controlled system for processing semiconductor wafers
- Patent number 4,313,783
- Issue date Feb 2, 1982
- Branson International Plasma Corporation
- John T. Davies
- C30 - CRYSTAL GROWTH
Information Patent Grant
Gas plasma reactor and process
- Patent number 4,148,705
- Issue date Apr 10, 1979
- Dionex Corporation
- James F. Battey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for etching SiO.sub.2 utilizing HF vapor and an organic cat...
- Patent number 4,127,437
- Issue date Nov 28, 1978
- Dionex Corporation
- Richard L. Bersin
- H01 - BASIC ELECTRIC ELEMENTS