Richard J. Himics

Person

Trumball, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of exposing and developing a homopolymer resist
- Patent number 4,286,050
- Issue date Aug 25, 1981
- RCA Corporation
- Richard J. Himics
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novel resists and recording media
- Patent number 4,252,886
- Issue date Feb 24, 1981
- RCA Corporation
- Richard J. Himics
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for purifying methyl alkyl siloxane lubricants
- Patent number 4,159,276
- Issue date Jun 26, 1979
- RCA Corporation
- Nitin V. Desai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist containing a thiodipropionate compound
- Patent number 4,059,449
- Issue date Nov 22, 1977
- RCA Corporation
- Thomas Francis Rosenkranz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive copolymer on silicon support
- Patent number 4,054,454
- Issue date Oct 18, 1977
- RCA Corporation
- Richard Joseph Himics
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of transferring a surface relief pattern from a poly(olefin...
- Patent number 4,045,318
- Issue date Aug 30, 1977
- RCA Corporation
- Richard Joseph Himics
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Olefin-SO.sub.2 copolymer film adhesion to a substrate
- Patent number 4,007,295
- Issue date Feb 8, 1977
- RCA Corporation
- Eugene Samuel Poliniak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of preparing a pattern on a silicon wafer
- Patent number 3,964,909
- Issue date Jun 22, 1976
- RCA Corporation
- Richard Joseph Himics
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Development of poly(1-methyl-1-cyclopentene-SO.sub.2) electron beam...
- Patent number 3,935,332
- Issue date Jan 27, 1976
- RCA Corporation
- Eugene Samuel Poliniak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Preparation of olefin SO.sub.2 copolymer electron beam resist films...
- Patent number 3,935,331
- Issue date Jan 27, 1976
- RCA Corporation
- Eugene Samuel Poliniak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Richard J. Himics

Person

Patents Grantslast 30 patents

Method of exposing and developing a homopolymer resist

Novel resists and recording media

Method for purifying methyl alkyl siloxane lubricants

Photoresist containing a thiodipropionate compound

Photosensitive copolymer on silicon support

Method of transferring a surface relief pattern from a poly(olefin...

Olefin-SO.sub.2 copolymer film adhesion to a substrate

Method of preparing a pattern on a silicon wafer

Development of poly(1-methyl-1-cyclopentene-SO.sub.2) electron beam...

Preparation of olefin SO.sub.2 copolymer electron beam resist films...