Richard Johannes Franciscus VAN HAREN

Person

Waalre, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method for adjusting a target feature in a model of a patterning pr...
- Patent number 12,189,308
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 11,940,740
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for adjusting a target feature in a model of a patterning pr...
- Patent number 11,619,884
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,493,851
- Issue date Nov 8, 2022
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,428,521
- Issue date Aug 30, 2022
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 11,385,550
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining an optimal operational parameter setting of a metrology...
- Patent number 11,320,750
- Issue date May 3, 2022
- ASML Netherlands B.V.
- Leon Paul Van Dijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to change an etch parameter
- Patent number 11,300,887
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining stress in a substrate, control system for co...
- Patent number 11,300,888
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus
- Patent number 11,300,889
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Leon Paul Van Dijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark positioning in a lithographic process
- Patent number 11,294,294
- Issue date Apr 5, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for use in a device manufacturing method
- Patent number 11,226,567
- Issue date Jan 18, 2022
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 11,204,239
- Issue date Dec 21, 2021
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology using a plurality of metrology target measurement recipes
- Patent number 11,187,995
- Issue date Nov 30, 2021
- ASML Netherlands B.V.
- Victor Emanuel Calado
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic method and lithographic apparatus
- Patent number 11,156,923
- Issue date Oct 26, 2021
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus and overlay improvement by modifying a patterning device
- Patent number 11,126,093
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Generating predicted data for control or monitoring of a production...
- Patent number 11,099,486
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling an industrial process using pr...
- Patent number 11,054,813
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to reduce effects of nonlinear behavior
- Patent number 11,036,146
- Issue date Jun 15, 2021
- ASML Netherlands B.V.
- Richard Johannes Franciscus Van Haren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device cooling system and method of thermally conditioni...
- Patent number 11,036,148
- Issue date Jun 15, 2021
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,915,689
- Issue date Feb 9, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining an optimal operational parameter setting of a metrology...
- Patent number 10,788,761
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Leon Paul Van Dijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,718,604
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,719,011
- Issue date Jul 21, 2020
- ASML Netherlands B.V.
- Peter Ten Berge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,691,863
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 10,642,162
- Issue date May 5, 2020
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic apparatus, device manufacturing method and associated...
- Patent number 10,545,410
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Hakki Ergun Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device cooling system and method of thermally conditioni...
- Patent number 10,495,986
- Issue date Dec 3, 2019
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 10,474,045
- Issue date Nov 12, 2019
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology method, target and substrate
- Patent number 10,386,176
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Kaustuve Bhattacharyya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...
- Publication number 20240369943
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Kedir Mohammed ADAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...
- Publication number 20240019788
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...
- Publication number 20230244151
- Publication date Aug 3, 2023
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20230016664
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...
- Publication number 20220326623
- Publication date Oct 13, 2022
- ASML NETHERLANDS B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
APPARATUS AND METHOD FOR PROPERTY JOINT INTERPOLATION AND PREDICTION
- Publication number 20220083834
- Publication date Mar 17, 2022
- ASML NETHERLANDS B.V.
- Faegheh HASIBI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20220057192
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...
- Publication number 20220050387
- Publication date Feb 17, 2022
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS
- Publication number 20220011681
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY USING A PLURALITY OF METROLOGY TARGET MEASUREMENT RECIPES
- Publication number 20210208512
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Victor Emanuel CALADO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY APPARATUS
- Publication number 20210165335
- Publication date Jun 3, 2021
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT MARK POSITIONING IN A LITHOGRAPHIC PROCESS
- Publication number 20210048758
- Publication date Feb 18, 2021
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...
- Publication number 20210018852
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20200348125
- Publication date Nov 5, 2020
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G01 - MEASURING TESTING
Information Patent Application
FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE
- Publication number 20200310242
- Publication date Oct 1, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS & APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING T...
- Publication number 20200264520
- Publication date Aug 20, 2020
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODS AND APPARATUS FOR USE IN A DEVICE MANUFACTURING METHOD
- Publication number 20200218169
- Publication date Jul 9, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A DEVICE MANUFACTURING METHOD AND A COMPUTER PROGRAM PRODUCT
- Publication number 20200159128
- Publication date May 21, 2020
- ASML NETHERLANDS B.V.
- Victor Emanuel CALADO
- G01 - MEASURING TESTING
Information Patent Application
PATTERNING DEVICE COOLING SYSTEM AND METHOD OF THERMALLY CONDITIONI...
- Publication number 20200103767
- Publication date Apr 2, 2020
- ASML NETHERLANDS B.V.
- Hakki Ergün CEKLI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING STRESS IN A SUBSTRATE, CONTROL SYSTEM FOR CO...
- Publication number 20200050117
- Publication date Feb 13, 2020
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING PREDICTED DATA FOR CONTROL OR MONITORING OF A PRODUCTION...
- Publication number 20190369503
- Publication date Dec 5, 2019
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G05 - CONTROLLING REGULATING
Information Patent Application
METROLOGY METHOD, TARGET AND SUBSTRATE
- Publication number 20190346256
- Publication date Nov 14, 2019
- ASML NETHERLANDS B.V.
- Kaustuve BHATTACHARYYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING PELLICLE COMPENSATION CORRECTIONS FOR A LITHO...
- Publication number 20190294059
- Publication date Sep 26, 2019
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD TO CHANGE AN ETCH PARAMETER
- Publication number 20190285992
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...
- Publication number 20190278188
- Publication date Sep 12, 2019
- ASML NETHERLANDS B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...
- Publication number 20190250523
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...
- Publication number 20190041758
- Publication date Feb 7, 2019
- ASML NETHERLANDS B.V.
- Leon Paul VAN DIJK
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180322237
- Publication date Nov 8, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS TO REDUCE EFFECTS OF NONLINEAR BEHAVIOR
- Publication number 20180314168
- Publication date Nov 1, 2018
- ASML NETHERLANDS B.V.
- Richard Johannes Franciscus VAN HAREN
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR
- Publication number 20180307135
- Publication date Oct 25, 2018
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Richard Johannes Franciscus VAN HAREN

Person

Patents Grantslast 30 patents

Method for adjusting a target feature in a model of a patterning pr...

Methods and apparatus for obtaining diagnostic information relating...

Method for adjusting a target feature in a model of a patterning pr...

Lithographic method and lithographic apparatus

Metrology method, target and substrate

Methods and apparatus for obtaining diagnostic information relating...

Determining an optimal operational parameter setting of a metrology...

Method to change an etch parameter

Methods of determining stress in a substrate, control system for co...

Metrology apparatus

Alignment mark positioning in a lithographic process

Methods and apparatus for use in a device manufacturing method

Metrology method, target and substrate

Metrology using a plurality of metrology target measurement recipes

Lithographic method and lithographic apparatus

Focus and overlay improvement by modifying a patterning device

Generating predicted data for control or monitoring of a production...

Method and apparatus for controlling an industrial process using pr...

Method and apparatus to reduce effects of nonlinear behavior

Patterning device cooling system and method of thermally conditioni...

Method and apparatus to correct for patterning process error

Determining an optimal operational parameter setting of a metrology...

Metrology method, target and substrate

Method and apparatus to correct for patterning process error

Method and apparatus to correct for patterning process error

Methods and apparatus for obtaining diagnostic information relating...

Lithographic apparatus, device manufacturing method and associated...

Patterning device cooling system and method of thermally conditioni...

Lithographic apparatus and device manufacturing method

Metrology method, target and substrate

Patents Applicationslast 30 patents

METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...

METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...

METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...

METROLOGY METHOD, TARGET AND SUBSTRATE

METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...

APPARATUS AND METHOD FOR PROPERTY JOINT INTERPOLATION AND PREDICTION

METROLOGY METHOD, TARGET AND SUBSTRATE

METHOD FOR ADJUSTING A TARGET FEATURE IN A MODEL OF A PATTERNING PR...

LITHOGRAPHIC METHOD AND LITHOGRAPHIC APPARATUS

METROLOGY USING A PLURALITY OF METROLOGY TARGET MEASUREMENT RECIPES

METROLOGY APPARATUS

ALIGNMENT MARK POSITIONING IN A LITHOGRAPHIC PROCESS

DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...

METROLOGY METHOD, TARGET AND SUBSTRATE

FOCUS AND OVERLAY IMPROVEMENT BY MODIFYING A PATTERNING DEVICE

METHODS & APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING T...

METHODS AND APPARATUS FOR USE IN A DEVICE MANUFACTURING METHOD

A DEVICE MANUFACTURING METHOD AND A COMPUTER PROGRAM PRODUCT

PATTERNING DEVICE COOLING SYSTEM AND METHOD OF THERMALLY CONDITIONI...

METHODS OF DETERMINING STRESS IN A SUBSTRATE, CONTROL SYSTEM FOR CO...

GENERATING PREDICTED DATA FOR CONTROL OR MONITORING OF A PRODUCTION...

METROLOGY METHOD, TARGET AND SUBSTRATE

METHOD OF DETERMINING PELLICLE COMPENSATION CORRECTIONS FOR A LITHO...

A METHOD TO CHANGE AN ETCH PARAMETER

METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...

DETERMINING AN OPTIMAL OPERATIONAL PARAMETER SETTING OF A METROLOGY...

METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR

METHOD AND APPARATUS TO REDUCE EFFECTS OF NONLINEAR BEHAVIOR

METHOD AND APPARATUS TO CORRECT FOR PATTERNING PROCESS ERROR