Richard Lewington

Person

Hayward, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma reactor having an array of plural individually controlled ga...
- Patent number 10,170,280
- Issue date Jan 1, 2019
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask etch plasma reactor having an array of optical sensors viewing...
- Patent number 9,218,944
- Issue date Dec 22, 2015
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 8,568,553
- Issue date Oct 29, 2013
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma mask etch method of controlling a reactor tunable element in...
- Patent number 8,017,029
- Issue date Sep 13, 2011
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for etching a transparent workpiece including backside endp...
- Patent number 8,012,366
- Issue date Sep 6, 2011
- Applied Materials, Inc.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask etch plasma reactor with cathode providing a uniform distribut...
- Patent number 8,002,946
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask etch plasma reactor with variable process gas distribution
- Patent number 7,976,671
- Issue date Jul 12, 2011
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor for processing a workpiece and having a tunable cathode
- Patent number 7,967,930
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for photomask etching
- Patent number 7,964,818
- Issue date Jun 21, 2011
- Applied Materials, Inc.
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,943,005
- Issue date May 17, 2011
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,909,961
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cluster tool with integrated metrology chamber for transparent subs...
- Patent number 7,846,848
- Issue date Dec 7, 2010
- Applied Materials, Inc.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for integrating metrology with etch processing
- Patent number 7,601,272
- Issue date Oct 13, 2009
- Applied Materials, Inc.
- Khiem K. Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor with dynamic a...
- Patent number 7,520,999
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor employing a dy...
- Patent number 7,504,041
- Issue date Mar 17, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with a dynamically adjustable plasma source power ap...
- Patent number 7,431,797
- Issue date Oct 7, 2008
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with apparatus for dynamically adjusting the plasma...
- Patent number 7,419,551
- Issue date Sep 2, 2008
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GA...
- Publication number 20160042917
- Publication date Feb 11, 2016
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20110162797
- Publication date Jul 7, 2011
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
- Publication number 20100276391
- Publication date Nov 4, 2010
- Applied Materials, Inc.
- MICHAEL N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma mask etch method of controlling a reactor tunable element in...
- Publication number 20080099434
- Publication date May 1, 2008
- Madhavi R. Chandrachood
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask etch plasma reactor with variable process gas distribution
- Publication number 20080102202
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask etch plasma reactor with backside optical sensors and multiple...
- Publication number 20080099450
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask etch plasma reactor having an array of optical sensors viewing...
- Publication number 20080102001
- Publication date May 1, 2008
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099431
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for etching a transparent workpiece including backside endp...
- Publication number 20080099432
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma reactor for processing a transparent workpiece with backside...
- Publication number 20080099437
- Publication date May 1, 2008
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Workpiece rotation apparatus for a plasma reactor system
- Publication number 20080099451
- Publication date May 1, 2008
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099426
- Publication date May 1, 2008
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mask etch plasma reactor with cathode providing a uniform distribut...
- Publication number 20080100222
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor for processing a workpiece and having a tunable cathode
- Publication number 20080100223
- Publication date May 1, 2008
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK ETCHING
- Publication number 20080101978
- Publication date May 1, 2008
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Plasma reactor with a dynamically adjustable plasma source power ap...
- Publication number 20070256787
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with apparatus for dynamically adjusting the plasma...
- Publication number 20070256784
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing a workpiece in a plasma reactor with dynamic a...
- Publication number 20070257008
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing a workpiece in a plasma reactor employing a dy...
- Publication number 20070257009
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR INTEGRATING METROLOGY WITH ETCH PROCESSING
- Publication number 20070097383
- Publication date May 3, 2007
- KHIEM K. NGUYEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLUSTER TOOL WITH INTEGRATED METROLOGY CHAMBER FOR TRANSPARENT SUBS...
- Publication number 20070012660
- Publication date Jan 18, 2007
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated metrology chamber for transparent substrates
- Publication number 20060154388
- Publication date Jul 13, 2006
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Richard Lewington

Person

Patents Grantslast 30 patents

Plasma reactor having an array of plural individually controlled ga...

Mask etch plasma reactor having an array of optical sensors viewing...

Method and apparatus for photomask plasma etching

Plasma mask etch method of controlling a reactor tunable element in...

Process for etching a transparent workpiece including backside endp...

Mask etch plasma reactor with cathode providing a uniform distribut...

Mask etch plasma reactor with variable process gas distribution

Plasma reactor for processing a workpiece and having a tunable cathode

Method and apparatus for photomask etching

Method and apparatus for photomask plasma etching

Method and apparatus for photomask plasma etching

Cluster tool with integrated metrology chamber for transparent subs...

Method and apparatus for integrating metrology with etch processing

Method of processing a workpiece in a plasma reactor with dynamic a...

Method of processing a workpiece in a plasma reactor employing a dy...

Plasma reactor with a dynamically adjustable plasma source power ap...

Plasma reactor with apparatus for dynamically adjusting the plasma...

Patents Applicationslast 30 patents

PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GA...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...

Plasma mask etch method of controlling a reactor tunable element in...

Mask etch plasma reactor with variable process gas distribution

Mask etch plasma reactor with backside optical sensors and multiple...

Mask etch plasma reactor having an array of optical sensors viewing...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Process for etching a transparent workpiece including backside endp...

Plasma reactor for processing a transparent workpiece with backside...

Workpiece rotation apparatus for a plasma reactor system

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Mask etch plasma reactor with cathode providing a uniform distribut...

Plasma reactor for processing a workpiece and having a tunable cathode

METHOD AND APPARATUS FOR PHOTOMASK ETCHING

Plasma reactor with a dynamically adjustable plasma source power ap...

Plasma reactor with apparatus for dynamically adjusting the plasma...

Method of processing a workpiece in a plasma reactor with dynamic a...

Method of processing a workpiece in a plasma reactor employing a dy...

METHOD AND APPARATUS FOR INTEGRATING METROLOGY WITH ETCH PROCESSING

CLUSTER TOOL WITH INTEGRATED METROLOGY CHAMBER FOR TRANSPARENT SUBS...

Integrated metrology chamber for transparent substrates