Richard QUINTANILHA

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Optical detector
- Patent number 10,976,265
- Issue date Apr 13, 2021
- ASML Netherlands B.V.
- Sander Bas Roobol
- G01 - MEASURING TESTING
Information Patent Grant
Determining edge roughness parameters
- Patent number 10,634,490
- Issue date Apr 28, 2020
- ASML Netherlands B.V.
- Martin Jacobus Johan Jak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology methods, radiation source, metrology apparatus and device...
- Patent number 10,555,407
- Issue date Feb 4, 2020
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Metrology methods, radiation source, metrology apparatus and device...
- Patent number 10,342,108
- Issue date Jul 2, 2019
- ASML Netherlands B.V.
- Alexey Olegovich Polyakov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology methods, metrology apparatus and device manufacturing method
- Patent number 10,254,644
- Issue date Apr 9, 2019
- ASML Netherlands B.V.
- Richard Quintanilha
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method, metrology apparatus and device manufacturing method
- Patent number 10,222,709
- Issue date Mar 5, 2019
- ASML Netherlands B.V.
- Richard Quintanilha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for simulating interaction of radiation with...
- Patent number 10,146,140
- Issue date Dec 4, 2018
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology methods, metrology apparatus and device manufacturing method
- Patent number 10,101,671
- Issue date Oct 16, 2018
- ASML Netherlands B.V.
- Richard Quintanilha
- G01 - MEASURING TESTING
Information Patent Grant
Metrology methods, metrology apparatus and device manufacturing method
- Patent number 10,067,074
- Issue date Sep 4, 2018
- ASML Netherlands B.V.
- Richard Quintanilha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and methods, lithographic system and device ma...
- Patent number 10,036,962
- Issue date Jul 31, 2018
- ASML Netherlands B.V.
- Richard Quintanilha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate and patterning device for use in metrology, metrology met...
- Patent number 9,915,879
- Issue date Mar 13, 2018
- ASML Netherlands B.V.
- Richard Quintanilha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus and method, lithographic apparatus, lithograph...
- Patent number 9,904,181
- Issue date Feb 27, 2018
- ASML Netherlands B.V.
- Richard Quintanilha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection apparatus, inspection method and manufacturing method
- Patent number 9,823,586
- Issue date Nov 21, 2017
- ASML Netherlands B.V.
- Richard Quintanilha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination source for use in inspection methods and/or lithograph...
- Patent number 9,632,424
- Issue date Apr 25, 2017
- ASML Netherlands B.V.
- Richard Quintanilha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, substrate and device manufacturing method
- Patent number 9,563,131
- Issue date Feb 7, 2017
- ASML Netherlands B.V.
- Richard Quintanilha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, substrate and device manufacturing method
- Patent number 9,261,772
- Issue date Feb 16, 2016
- ASML Netherlands B.V.
- Richard Quintanilha
- G01 - MEASURING TESTING
Information Patent Grant
Illumination source for use in inspection methods and/or lithograph...
- Patent number 8,876,346
- Issue date Nov 4, 2014
- ASML Netherlands B.V.
- Richard Quintanilha
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Metrology Methods, Radiation Source, Metrology Apparatus and Device...
- Publication number 20190246480
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Alexey Olegovich POLYAKOV
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Optical Detector
- Publication number 20190049393
- Publication date Feb 14, 2019
- ASML NETHERLANDS B.V.
- Sander Bas ROOBOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Determining Edge Roughness Parameters
- Publication number 20180364036
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan JAK
- G01 - MEASURING TESTING
Information Patent Application
Metrology Methods, Radiation Source, Metrology Apparatus and Device...
- Publication number 20180220518
- Publication date Aug 2, 2018
- ASML NETHERLANDS B.V.
- Alexey Olegovich POLYAKOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metrology Methods, Metrology Apparatus and Device Manufacturing Method
- Publication number 20170357155
- Publication date Dec 14, 2017
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G01 - MEASURING TESTING
Information Patent Application
Metrology Methods, Metrology Apparatus and Device Manufacturing Method
- Publication number 20170184981
- Publication date Jun 29, 2017
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G01 - MEASURING TESTING
Information Patent Application
Methods and Apparatus for Simulating Interaction of Radiation with...
- Publication number 20170102623
- Publication date Apr 13, 2017
- ASML NETHERLANDS B.V.
- Maxim PISARENCO
- G01 - MEASURING TESTING
Information Patent Application
Inspection Apparatus, Inspection Method and Manufacturing Method
- Publication number 20170045823
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G01 - MEASURING TESTING
Information Patent Application
Inspection Apparatus and Method, Lithographic Apparatus, Lithograph...
- Publication number 20160377990
- Publication date Dec 29, 2016
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G01 - MEASURING TESTING
Information Patent Application
Inspection Apparatus and Methods, Lithographic System and Device Ma...
- Publication number 20160320711
- Publication date Nov 3, 2016
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G01 - MEASURING TESTING
Information Patent Application
Metrology Methods, Metrology Apparatus and Device Manufacturing Method
- Publication number 20160282282
- Publication date Sep 29, 2016
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20160223476
- Publication date Aug 4, 2016
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS, SUBSTRATE AND DEVICE MANUFACTURING METHOD
- Publication number 20160062247
- Publication date Mar 3, 2016
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate and Patterning Device for Use in Metrology, Metrology Met...
- Publication number 20150331336
- Publication date Nov 19, 2015
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination Source for use in Inspection Methods and/or Lithograph...
- Publication number 20150042999
- Publication date Feb 12, 2015
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G02 - OPTICS
Information Patent Application
Lithographic Apparatus, Substrate and Device Manufacturing Method
- Publication number 20130271740
- Publication date Oct 17, 2013
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G01 - MEASURING TESTING
Information Patent Application
Illumination Source for use in Inspection Methods and/or Lithograph...
- Publication number 20130141730
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Richard QUINTANILHA
- G02 - OPTICS

Richard QUINTANILHA

Person

Patents Grantslast 30 patents

Optical detector

Determining edge roughness parameters

Metrology methods, radiation source, metrology apparatus and device...

Metrology methods, radiation source, metrology apparatus and device...

Metrology methods, metrology apparatus and device manufacturing method

Metrology method, metrology apparatus and device manufacturing method

Methods and apparatus for simulating interaction of radiation with...

Metrology methods, metrology apparatus and device manufacturing method

Metrology methods, metrology apparatus and device manufacturing method

Inspection apparatus and methods, lithographic system and device ma...

Substrate and patterning device for use in metrology, metrology met...

Inspection apparatus and method, lithographic apparatus, lithograph...

Inspection apparatus, inspection method and manufacturing method

Illumination source for use in inspection methods and/or lithograph...

Lithographic apparatus, substrate and device manufacturing method

Lithographic apparatus, substrate and device manufacturing method

Illumination source for use in inspection methods and/or lithograph...

Patents Applicationslast 30 patents

Metrology Methods, Radiation Source, Metrology Apparatus and Device...

Optical Detector

Determining Edge Roughness Parameters

Metrology Methods, Radiation Source, Metrology Apparatus and Device...

Metrology Methods, Metrology Apparatus and Device Manufacturing Method

Metrology Methods, Metrology Apparatus and Device Manufacturing Method

Methods and Apparatus for Simulating Interaction of Radiation with...

Inspection Apparatus, Inspection Method and Manufacturing Method

Inspection Apparatus and Method, Lithographic Apparatus, Lithograph...

Inspection Apparatus and Methods, Lithographic System and Device Ma...

Metrology Methods, Metrology Apparatus and Device Manufacturing Method

METROLOGY METHOD, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS, SUBSTRATE AND DEVICE MANUFACTURING METHOD

Substrate and Patterning Device for Use in Metrology, Metrology Met...

Illumination Source for use in Inspection Methods and/or Lithograph...

Lithographic Apparatus, Substrate and Device Manufacturing Method

Illumination Source for use in Inspection Methods and/or Lithograph...