Richard S. Wise

Person

Los Altos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch and selective deposition process for extreme ultr...
- Patent number 12,062,538
- Issue date Aug 13, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 12,051,589
- Issue date Jul 30, 2024
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamfer-less via integration scheme
- Patent number 11,987,876
- Issue date May 21, 2024
- Lam Research Corporation
- Sivananda Krishnan Kanakasabapathy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,784,047
- Issue date Oct 10, 2023
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide mandrels in patterning
- Patent number 11,355,353
- Issue date Jun 7, 2022
- Lam Research Corporation
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 11,322,351
- Issue date May 3, 2022
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Eliminating yield impact of stochastics in lithography
- Patent number 11,257,674
- Issue date Feb 22, 2022
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,183,383
- Issue date Nov 23, 2021
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling a patterning process, lithographic apparatus,...
- Patent number 11,048,174
- Issue date Jun 29, 2021
- ASML Netherlands B.V.
- Michael Kubis
- G01 - MEASURING TESTING
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 11,031,245
- Issue date Jun 8, 2021
- Lan Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for determining dimensional range of repairable d...
- Patent number 10,885,253
- Issue date Jan 5, 2021
- Coventor, Inc.
- Daniel Sobieski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Eliminating yield impact of stochastics in lithography
- Patent number 10,796,912
- Issue date Oct 6, 2020
- Lam Research Corporation
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching substrates using ALE and selective deposition
- Patent number 10,685,836
- Issue date Jun 16, 2020
- Lam Research Corporation
- Samantha Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 10,651,286
- Issue date May 12, 2020
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist design layout pattern proximity correction through fast...
- Patent number 10,585,347
- Issue date Mar 10, 2020
- Lam Research Corporation
- Saravanapriyan Sriraman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of charge controlled patterning during reactive ion etching
- Patent number 10,573,526
- Issue date Feb 25, 2020
- International Business Machines Corporation
- Sunit S. Mahajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 10,546,748
- Issue date Jan 28, 2020
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced interconnect with air gap
- Patent number 10,546,743
- Issue date Jan 28, 2020
- STMicroelectronics, Inc.
- John H. Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Layout pattern proximity correction through edge placement error pr...
- Patent number 10,534,257
- Issue date Jan 14, 2020
- Lam Research Corporation
- Mehmet Derya Tetiker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low roughness EUV lithography
- Patent number 10,438,807
- Issue date Oct 8, 2019
- Lam Research Corporation
- Richard Wise
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 10,325,998
- Issue date Jun 18, 2019
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ale smoothness: in and outside semiconductor industry
- Patent number 10,304,659
- Issue date May 28, 2019
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching substrates using ale and selective deposition
- Patent number 10,269,566
- Issue date Apr 23, 2019
- Lam Research Corporation
- Samantha Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High selectivity nitride removal process based on selective polymer...
- Patent number 10,269,924
- Issue date Apr 23, 2019
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist design layout pattern proximity correction through fast...
- Patent number 10,197,908
- Issue date Feb 5, 2019
- Lam Research Corporation
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
ALE smoothness: in and outside semiconductor industry
- Patent number 9,984,858
- Issue date May 29, 2018
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low roughness EUV lithography
- Patent number 9,922,839
- Issue date Mar 20, 2018
- Lam Research Corporation
- Richard Wise
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tin oxide thin film spacers in semiconductor device manufacturing
- Patent number 9,824,893
- Issue date Nov 21, 2017
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench structure for high performance interconnection lines of diff...
- Patent number 9,786,551
- Issue date Oct 10, 2017
- STMicroelectronics, Inc.
- John Hongguang Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CHAMFER-LESS VIA INTEGRATION SCHEME
- Publication number 20240263301
- Publication date Aug 8, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20240145272
- Publication date May 2, 2024
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20240030031
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING PHOTO-SENSITIVE HYBRID FILMS
- Publication number 20230314946
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Eric Calvin Hansen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20230290657
- Publication date Sep 14, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...
- Publication number 20230045336
- Publication date Feb 9, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20220270877
- Publication date Aug 25, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...
- Publication number 20220216050
- Publication date Jul 7, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY USING AN INTERVENING LAYER OR...
- Publication number 20220197147
- Publication date Jun 23, 2022
- LAM RESEARCH CORPORATION
- Andrew LIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20220165571
- Publication date May 26, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY
- Publication number 20220122846
- Publication date Apr 21, 2022
- LAM RESEARCH CORPORATION
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20220005694
- Publication date Jan 6, 2022
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20210265163
- Publication date Aug 26, 2021
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE MANDRELS IN PATTERNING
- Publication number 20210265173
- Publication date Aug 26, 2021
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20210242019
- Publication date Aug 5, 2021
- LAM RESEARCH CORPORATION
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHAMFER-LESS VIA INTEGRATION SCHEME
- Publication number 20210017643
- Publication date Jan 21, 2021
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY
- Publication number 20200402801
- Publication date Dec 24, 2020
- LAM RESEARCH CORPORATION
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING A PATTERNING PROCESS, LITHOGRAPHIC APPARATUS,...
- Publication number 20200233311
- Publication date Jul 23, 2020
- Michael KUBIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20200219725
- Publication date Jul 9, 2020
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING DIMENSIONAL RANGE OF REPAIRABLE D...
- Publication number 20200134117
- Publication date Apr 30, 2020
- Coventor, Inc.
- Daniel Sobieski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20200083044
- Publication date Mar 12, 2020
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...
- Publication number 20190305109
- Publication date Oct 3, 2019
- International Business Machines Corporation
- Ravi K. Dasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...
- Publication number 20190250501
- Publication date Aug 15, 2019
- LAM RESEARCH CORPORATION
- Saravanapriyan Sriraman
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ETCHING SUBSTRATES USING ALE AND SELECTIVE DEPOSITION
- Publication number 20190244805
- Publication date Aug 8, 2019
- LAM RESEARCH CORPORATION
- Samantha Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN OXIDE MANDRELS IN PATTERNING
- Publication number 20190237341
- Publication date Aug 1, 2019
- LAM RESEARCH CORPORATION
- Jengyi Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METAL OXIDE SUBSTRATES USING ALE AND SELECTIVE DEPOSITION
- Publication number 20190131130
- Publication date May 2, 2019
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY
- Publication number 20180337046
- Publication date Nov 22, 2018
- LAM RESEARCH CORPORATION
- Nader Shamma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH EDGE PLACEMENT E...
- Publication number 20180314148
- Publication date Nov 1, 2018
- LAM RESEARCH CORPORATION
- Mehmet Derya Tetiker
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING
- Publication number 20180240667
- Publication date Aug 23, 2018
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALE SMOOTHNESS: IN AND OUTSIDE SEMICONDUCTOR INDUSTRY
- Publication number 20180233325
- Publication date Aug 16, 2018
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Richard S. Wise

Person

Patents Grantslast 30 patents

Tin oxide films in semiconductor device manufacturing

Atomic layer etch and selective deposition process for extreme ultr...

Tin oxide thin film spacers in semiconductor device manufacturing

Chamfer-less via integration scheme

Tin oxide thin film spacers in semiconductor device manufacturing

Tin oxide mandrels in patterning

Tin oxide films in semiconductor device manufacturing

Eliminating yield impact of stochastics in lithography

Tin oxide thin film spacers in semiconductor device manufacturing

Method of controlling a patterning process, lithographic apparatus,...

Tin oxide thin film spacers in semiconductor device manufacturing

System and method for determining dimensional range of repairable d...

Eliminating yield impact of stochastics in lithography

Etching substrates using ALE and selective deposition

High selectivity nitride removal process based on selective polymer...

Photoresist design layout pattern proximity correction through fast...

Method of charge controlled patterning during reactive ion etching

Tin oxide films in semiconductor device manufacturing

Advanced interconnect with air gap

Layout pattern proximity correction through edge placement error pr...

Low roughness EUV lithography

High selectivity nitride removal process based on selective polymer...

Ale smoothness: in and outside semiconductor industry

Etching substrates using ale and selective deposition

High selectivity nitride removal process based on selective polymer...

Photoresist design layout pattern proximity correction through fast...

ALE smoothness: in and outside semiconductor industry

Low roughness EUV lithography

Tin oxide thin film spacers in semiconductor device manufacturing

Trench structure for high performance interconnection lines of diff...

Patents Applicationslast 30 patents

CHAMFER-LESS VIA INTEGRATION SCHEME

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

METHOD OF FORMING PHOTO-SENSITIVE HYBRID FILMS

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

INTEGRATED DRY PROCESSES FOR PATTERNING RADIATION PHOTORESIST PATTE...

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY USING AN INTERVENING LAYER OR...

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

TIN OXIDE MANDRELS IN PATTERNING

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

CHAMFER-LESS VIA INTEGRATION SCHEME

ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY

METHOD OF CONTROLLING A PATTERNING PROCESS, LITHOGRAPHIC APPARATUS,...

TIN OXIDE THIN FILM SPACERS IN SEMICONDUCTOR DEVICE MANUFACTURING

SYSTEM AND METHOD FOR DETERMINING DIMENSIONAL RANGE OF REPAIRABLE D...

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER...

PHOTORESIST DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH FAST...

ETCHING SUBSTRATES USING ALE AND SELECTIVE DEPOSITION

TIN OXIDE MANDRELS IN PATTERNING

ETCHING METAL OXIDE SUBSTRATES USING ALE AND SELECTIVE DEPOSITION

ELIMINATING YIELD IMPACT OF STOCHASTICS IN LITHOGRAPHY

DESIGN LAYOUT PATTERN PROXIMITY CORRECTION THROUGH EDGE PLACEMENT E...

TIN OXIDE FILMS IN SEMICONDUCTOR DEVICE MANUFACTURING

ALE SMOOTHNESS: IN AND OUTSIDE SEMICONDUCTOR INDUSTRY