Richard Zimmerman

Person

Brookfield, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Beam splitting prism systems
- Patent number 11,126,007
- Issue date Sep 21, 2021
- ASML Holding N.V.
- Douglas C. Cappelli
- G01 - MEASURING TESTING
Information Patent Grant
Inspection apparatus having non-linear optics
- Patent number 10,809,193
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Marinus Johannes Maria Van Dam
- G01 - MEASURING TESTING
Information Patent Grant
Beam splitting prism systems
- Patent number 10,747,010
- Issue date Aug 18, 2020
- ASML Holding N.V.
- Douglas C. Cappelli
- G01 - MEASURING TESTING
Information Patent Grant
Double EUV illumination uniformity correction system and method
- Patent number 9,134,620
- Issue date Sep 15, 2015
- ASML Holding N.V.
- Richard Carl Zimmerman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam positioning and pointing
- Patent number 9,075,324
- Issue date Jul 7, 2015
- ASML Holding N.V.
- Richard Carl Zimmerman
- G02 - OPTICS
Information Patent Grant
Lithographic apparatus and method for illumination uniformity corre...
- Patent number 8,629,973
- Issue date Jan 14, 2014
- ASML Holding N.V.
- Richard Carl Zimmerman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimal rasterization for maskless lithography
- Patent number 8,009,269
- Issue date Aug 30, 2011
- ASML Holding N.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for uniformity correction
- Patent number 7,525,641
- Issue date Apr 28, 2009
- ASML Holding N.V.
- Richard C. Zimmerman
- G02 - OPTICS
Information Patent Grant
De-focus uniformity correction
- Patent number 7,333,176
- Issue date Feb 19, 2008
- ASML Holding N.V.
- Roberto B. Wiener
- G02 - OPTICS
Information Patent Grant
Method for calculating an intensity integral for use in lithography...
- Patent number 7,173,688
- Issue date Feb 6, 2007
- ASML Holding N.V.
- Roberto B. Wiener
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT FOR USE IN METROLOGY SYSTEMS
- Publication number 20240302164
- Publication date Sep 12, 2024
- ASML NETHERLANDS B.V.
- Tzu-Yi YANG
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY TOOL WITH POSITION CONTROL OF PROJECTION SYSTEM
- Publication number 20230359127
- Publication date Nov 9, 2023
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam Splitting Prism Systems
- Publication number 20200326556
- Publication date Oct 15, 2020
- ASML Holding N.V.
- Douglas C. CAPPELLI
- G01 - MEASURING TESTING
Information Patent Application
Inspection Apparatus Having Non-Linear Optics
- Publication number 20190310190
- Publication date Oct 10, 2019
- ASML NETHERLANDS B.V.
- Marinus Johannes Maria VAN DAM
- G01 - MEASURING TESTING
Information Patent Application
Beam Splitting Prism Systems
- Publication number 20190179162
- Publication date Jun 13, 2019
- ASML Holding N.V.
- Douglas C. CAPPELLI
- G02 - OPTICS
Information Patent Application
Double EUV Illumination Uniformity Correction System and Method
- Publication number 20120262685
- Publication date Oct 18, 2012
- ASML Holding N.V.
- Richard Carl ZIMMERMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Method for Illumination Uniformity Corre...
- Publication number 20100302525
- Publication date Dec 2, 2010
- ASML Holding N.V.
- Richard Carl ZIMMERMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam Positioning and Pointing
- Publication number 20090046338
- Publication date Feb 19, 2009
- ASML Holding N.V.
- Richard Zimmerman
- G02 - OPTICS
Information Patent Application
Optimal Rasterization for Maskless Lithography
- Publication number 20080224251
- Publication date Sep 18, 2008
- ASML Holding N.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
De-focus uniformity correction
- Publication number 20070109518
- Publication date May 17, 2007
- ASML Holding N.V.
- Roberto B. Wiener
- G02 - OPTICS
Information Patent Application
System and method for uniformity correction
- Publication number 20070103665
- Publication date May 10, 2007
- ASML Holding N.V.
- Richard C. Zimmerman
- G02 - OPTICS
Information Patent Application
De-focus uniformity correction
- Publication number 20060139608
- Publication date Jun 29, 2006
- ASML Holding N.V.
- Roberto B. Wiener
- G02 - OPTICS

Richard Zimmerman

Person

Patents Grantslast 30 patents

Beam splitting prism systems

Inspection apparatus having non-linear optics

Beam splitting prism systems

Double EUV illumination uniformity correction system and method

Beam positioning and pointing

Lithographic apparatus and method for illumination uniformity corre...

Optimal rasterization for maskless lithography

System and method for uniformity correction

De-focus uniformity correction

Method for calculating an intensity integral for use in lithography...

Patents Applicationslast 30 patents

OPTICAL ELEMENT FOR USE IN METROLOGY SYSTEMS

METROLOGY TOOL WITH POSITION CONTROL OF PROJECTION SYSTEM

Beam Splitting Prism Systems

Inspection Apparatus Having Non-Linear Optics

Beam Splitting Prism Systems

Double EUV Illumination Uniformity Correction System and Method

Lithographic Apparatus and Method for Illumination Uniformity Corre...

Beam Positioning and Pointing

Optimal Rasterization for Maskless Lithography

De-focus uniformity correction

System and method for uniformity correction

De-focus uniformity correction