Ricky Marsh

Person

San Ramon, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 12,193,138
- Issue date Jan 7, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 11,887,819
- Issue date Jan 30, 2024
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 11,716,805
- Issue date Aug 1, 2023
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone cooling of plasma heated window
- Patent number 11,538,666
- Issue date Dec 27, 2022
- Lam Research Corporation
- Yiting Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 11,495,441
- Issue date Nov 8, 2022
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 11,224,116
- Issue date Jan 11, 2022
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Internal plasma grid for semiconductor fabrication
- Patent number 11,171,021
- Issue date Nov 9, 2021
- Lam Research Corporation
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 10,825,661
- Issue date Nov 3, 2020
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 10,638,593
- Issue date Apr 28, 2020
- Lam Research Corporation
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Powered grid for plasma chamber
- Patent number 10,431,434
- Issue date Oct 1, 2019
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Matchless plasma source for semiconductor wafer fabrication
- Patent number 10,264,663
- Issue date Apr 16, 2019
- Lam Research Corporation
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
TCCT match circuit for plasma etch chambers
- Patent number 10,056,231
- Issue date Aug 21, 2018
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for cooling RF heated chamber components
- Patent number 9,978,565
- Issue date May 22, 2018
- Lam Research Corporation
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Powered grid for plasma chamber
- Patent number 9,966,236
- Issue date May 8, 2018
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faraday shield having plasma density decoupling structure between T...
- Patent number 9,293,353
- Issue date Mar 22, 2016
- Lam Research Corporation
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
TCCT match circuit for plasma etch chambers
- Patent number 9,059,678
- Issue date Jun 16, 2015
- Lam Research Corporation
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma probe and method for making same
- Patent number 6,553,853
- Issue date Apr 29, 2003
- Lam Research Corporation
- Ricky Marsh
- G01 - MEASURING TESTING
Information Patent Grant
Plasma probe and method for making same
- Patent number 6,357,308
- Issue date Mar 19, 2002
- Lam Research Corporation
- Ricky Marsh
- G01 - MEASURING TESTING
Information Patent Grant
Method and an apparatus for offsetting plasma bias voltage in bi-po...
- Patent number 5,933,314
- Issue date Aug 3, 1999
- LAM Research Corp.
- Albert M. Lambson
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Patents Applicationslast 30 patents

Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20230354502
- Publication date Nov 2, 2023
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE COOLING OF PLASMA HEATED WINDOW
- Publication number 20230121097
- Publication date Apr 20, 2023
- LAM RESEARCH CORPORATION
- Yiting ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS
- Publication number 20230039721
- Publication date Feb 9, 2023
- LAM RESEARCH CORPORATION
- Jon MCCHESNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20220117074
- Publication date Apr 14, 2022
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS
- Publication number 20210050188
- Publication date Feb 18, 2021
- LAM RESEARCH CORPORATION
- Jon MCCHESNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20200253034
- Publication date Aug 6, 2020
- LAM RESEARCH CORPORATION
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION
- Publication number 20190215942
- Publication date Jul 11, 2019
- LAM RESEARCH CORPORATION
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Multi-Zone Cooling Of Plasma Heated Window
- Publication number 20190148118
- Publication date May 16, 2019
- LAM RESEARCH CORPORATION
- Yiting ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Matchless Plasma Source for Semiconductor Wafer Fabrication
- Publication number 20190116656
- Publication date Apr 18, 2019
- LAM RESEARCH CORPORATION
- Maolin Long
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS
- Publication number 20180247796
- Publication date Aug 30, 2018
- LAM RESEARCH CORPORATION
- Jon MCCHESNEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Powered Grid for Plasma Chamber
- Publication number 20180226233
- Publication date Aug 9, 2018
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Faraday Shield Having Plasma Density Decoupling Structure Between T...
- Publication number 20160163569
- Publication date Jun 9, 2016
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20160141188
- Publication date May 19, 2016
- LAM RESEARCH CORPORATION
- Harmeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TCCT MATCH CIRCUIT FOR PLASMA ETCH CHAMBERS
- Publication number 20150235810
- Publication date Aug 20, 2015
- LAM RESEARCH CORPORATION
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
- Publication number 20140302681
- Publication date Oct 9, 2014
- LAM RESEARCH CORPORATION
- Alex Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Faraday Shield Having Plasma Density Decoupling Structure Between T...
- Publication number 20130186568
- Publication date Jul 25, 2013
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TCCT MATCH CIRCUIT FOR PLASMA ETCH CHAMBERS
- Publication number 20130135058
- Publication date May 30, 2013
- Maolin Long
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Systems For Cooling RF Heated Chamber Components
- Publication number 20130087283
- Publication date Apr 11, 2013
- LAM RESEARCH CORPORATION
- Jon McChesney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWERED GRID FOR PLASMA CHAMBER
- Publication number 20120322270
- Publication date Dec 20, 2012
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma probe and method for making same
- Publication number 20020066323
- Publication date Jun 6, 2002
- Lam Research Corporation
- Ricky Marsh
- G01 - MEASURING TESTING

Ricky Marsh

Person

Patents Grantslast 30 patents

Matchless plasma source for semiconductor wafer fabrication

Systems for cooling RF heated chamber components

Matchless plasma source for semiconductor wafer fabrication

Multi-zone cooling of plasma heated window

Systems for cooling RF heated chamber components

Matchless plasma source for semiconductor wafer fabrication

Internal plasma grid for semiconductor fabrication

Systems for cooling RF heated chamber components

Matchless plasma source for semiconductor wafer fabrication

Powered grid for plasma chamber

Matchless plasma source for semiconductor wafer fabrication

TCCT match circuit for plasma etch chambers

Systems for cooling RF heated chamber components

Powered grid for plasma chamber

Faraday shield having plasma density decoupling structure between T...

TCCT match circuit for plasma etch chambers

Plasma probe and method for making same

Plasma probe and method for making same

Method and an apparatus for offsetting plasma bias voltage in bi-po...

Patents Applicationslast 30 patents

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

MULTI-ZONE COOLING OF PLASMA HEATED WINDOW

SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

MATCHLESS PLASMA SOURCE FOR SEMICONDUCTOR WAFER FABRICATION

Multi-Zone Cooling Of Plasma Heated Window

Matchless Plasma Source for Semiconductor Wafer Fabrication

SYSTEMS FOR COOLING RF HEATED CHAMBER COMPONENTS

Powered Grid for Plasma Chamber

Faraday Shield Having Plasma Density Decoupling Structure Between T...

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

TCCT MATCH CIRCUIT FOR PLASMA ETCH CHAMBERS

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

Faraday Shield Having Plasma Density Decoupling Structure Between T...

TCCT MATCH CIRCUIT FOR PLASMA ETCH CHAMBERS

Systems For Cooling RF Heated Chamber Components

POWERED GRID FOR PLASMA CHAMBER

Plasma probe and method for making same