Rieko Nishimura

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-charged-particle-beam writing apparatus and multi-charged-par...
- Patent number 11,901,156
- Issue date Feb 13, 2024
- NuFlare Technology, Inc.
- Ryosuke Ueba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi charged particle beam evaluation method and multi charged par...
- Patent number 11,211,227
- Issue date Dec 28, 2021
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 10,755,893
- Issue date Aug 25, 2020
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,622,186
- Issue date Apr 14, 2020
- NuFlare Technology, Inc.
- Takuya Uemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of obtaining beam deflection shape and method of obtaining a...
- Patent number 10,586,682
- Issue date Mar 10, 2020
- NuFlare Technology, Inc.
- Shunsuke Isaji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation method, correction method, recording medium and electron...
- Patent number 10,483,082
- Issue date Nov 19, 2019
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,468,232
- Issue date Nov 5, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position correction method of stage mechanism and charged particle...
- Patent number 10,345,724
- Issue date Jul 9, 2019
- NUFLARE TECHNOLOGY, INC.
- Rieko Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus, and charged particle beam...
- Patent number 10,283,314
- Issue date May 7, 2019
- NUFLARE TECHNOLOGY, INC.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Evaluation method, correction method, recording medium and electron...
- Patent number 9,997,329
- Issue date Jun 12, 2018
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustment method for charged particle beam drawing apparatus and c...
- Patent number 9,659,746
- Issue date May 23, 2017
- NuFlare Technology, Inc.
- Takashi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for acquiring settling time
- Patent number 9,147,553
- Issue date Sep 29, 2015
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Settling time acquisition method
- Patent number 8,872,139
- Issue date Oct 28, 2014
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for acquiring settling time
- Patent number 8,803,108
- Issue date Aug 12, 2014
- Nuflare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Acquisition method of charged particle beam deflection shape error...
- Patent number 8,779,379
- Issue date Jul 15, 2014
- Nuflare Technology, Inc.
- Rieko Nishimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam drawing method and charged particle beam draw...
- Patent number 8,748,064
- Issue date Jun 10, 2014
- Nuflare Technology, Inc.
- Rieko Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Correcting substrate for charged particle beam lithography apparatus
- Patent number 8,183,544
- Issue date May 22, 2012
- Nuflare Technology, Inc.
- Kaoru Tsuruta
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam writing apparatus and charged-particle beam w...
- Patent number 7,893,411
- Issue date Feb 22, 2011
- Nuflare Technology, Inc.
- Rieko Nishimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam lithography system and method for evaluating...
- Patent number 7,834,333
- Issue date Nov 16, 2010
- Nuflare Technology, Inc.
- Rieko Nishimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam lithography system
- Patent number 7,777,205
- Issue date Aug 17, 2010
- Nuflare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam writing method
- Patent number 7,705,322
- Issue date Apr 27, 2010
- Nuflare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of calculating deflection aberration correcting voltage and...
- Patent number 7,679,068
- Issue date Mar 16, 2010
- Nuflare Technology, Inc.
- Takashi Kamikubo
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...
- Publication number 20230081240
- Publication date Mar 16, 2023
- NuFlare Technology, Inc.
- Ryosuke UEBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM EVALUATION METHOD AND MULTI CHARGED PAR...
- Publication number 20210074510
- Publication date Mar 11, 2021
- NuFlare Technology, Inc.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OBTAINING DOSE CORRECTION AMOUNT, CHARGED PARTICLE BEAM W...
- Publication number 20200013584
- Publication date Jan 9, 2020
- NuFlare Technology, Inc.
- Satoru HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20190237297
- Publication date Aug 1, 2019
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190189389
- Publication date Jun 20, 2019
- NuFlare Technology, Inc.
- Takuya UEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...
- Publication number 20190172678
- Publication date Jun 6, 2019
- NuFlare Technology, Inc.
- Shunsuke ISAJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Writing Apparatus and Charged Particle Beam W...
- Publication number 20190027340
- Publication date Jan 24, 2019
- NUFLARE TECHNOLOGY, INC.
- Satoru Hirose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...
- Publication number 20180269028
- Publication date Sep 20, 2018
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Position Correction Method of Stage Mechanism and Charged Particle...
- Publication number 20180210353
- Publication date Jul 26, 2018
- NUFLARE TECHNOLOGY, INC.
- Rieko Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged Particle Beam Writing Apparatus, and Charged Particle Beam...
- Publication number 20180122616
- Publication date May 3, 2018
- NUFLARE TECHNOLOGY, INC.
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...
- Publication number 20170154755
- Publication date Jun 1, 2017
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTMENT METHOD FOR CHARGED PARTICLE BEAM DRAWING APPARATUS AND C...
- Publication number 20170011884
- Publication date Jan 12, 2017
- NuFlare Technology, Inc.
- Takashi NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACQUIRING SETTLING TIME
- Publication number 20150228453
- Publication date Aug 13, 2015
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SETTLING TIME ACQUISITION METHOD
- Publication number 20140284500
- Publication date Sep 25, 2014
- NuFlure Technology, Inc.
- Rieko NISHIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACQUIRING SETTLING TIME
- Publication number 20140054469
- Publication date Feb 27, 2014
- Rieko Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACQUISITION METHOD OF CHARGED PARTICLE BEAM DEFLECTION SHAPE ERROR...
- Publication number 20130264499
- Publication date Oct 10, 2013
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM DRAWING METHOD AND CHARGED PARTICLE BEAM DRAW...
- Publication number 20130065184
- Publication date Mar 14, 2013
- NuFlare Technology, Inc.
- Rieko Nishimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF DETERMINING MAIN DEFLECTION SETTLING TIME FOR CHARGED PAR...
- Publication number 20100288939
- Publication date Nov 18, 2010
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lithography method of electron beam
- Publication number 20100178611
- Publication date Jul 15, 2010
- NuFlare Technology, Inc.
- Hirohito Anze
- B82 - NANO-TECHNOLOGY
Information Patent Application
CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS
- Publication number 20090242807
- Publication date Oct 1, 2009
- NuFlare Technology, Inc.
- Kaoru TSURUTA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...
- Publication number 20090084990
- Publication date Apr 2, 2009
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED-PARTICLE BEAM WRITING METHOD
- Publication number 20090014663
- Publication date Jan 15, 2009
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
ELECTRON BEAM LITHOGRAPHY SYSTEM
- Publication number 20080237493
- Publication date Oct 2, 2008
- NuFlare Technology, Inc.
- Rieko NISHIMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND METHOD FOR EVALUATING...
- Publication number 20080067338
- Publication date Mar 20, 2008
- NuFlare Technology, Inc.
- Rieko Nishimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...
- Publication number 20070243487
- Publication date Oct 18, 2007
- NuFlare Technology, Inc.
- Hirohito Anze
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CALCULATING DEFLECTION ABERRATION CORRECTING VOLTAGE AND...
- Publication number 20070158576
- Publication date Jul 12, 2007
- NuFlare Technology, Inc.
- Takashi Kamikubo
- G01 - MEASURING TESTING

Rieko Nishimura

Person

Patents Grantslast 30 patents

Multi-charged-particle-beam writing apparatus and multi-charged-par...

Multi charged particle beam evaluation method and multi charged par...

Charged particle beam writing method and charged particle beam writ...

Charged particle beam writing apparatus and charged particle beam w...

Method of obtaining beam deflection shape and method of obtaining a...

Evaluation method, correction method, recording medium and electron...

Charged particle beam writing apparatus and charged particle beam w...

Position correction method of stage mechanism and charged particle...

Charged particle beam writing apparatus, and charged particle beam...

Evaluation method, correction method, recording medium and electron...

Adjustment method for charged particle beam drawing apparatus and c...

Method for acquiring settling time

Settling time acquisition method

Method for acquiring settling time

Acquisition method of charged particle beam deflection shape error...

Charged particle beam drawing method and charged particle beam draw...

Correcting substrate for charged particle beam lithography apparatus

Charged-particle beam writing apparatus and charged-particle beam w...

Charged particle beam lithography system and method for evaluating...

Electron beam lithography system

Charged-particle beam writing method

Method of calculating deflection aberration correcting voltage and...

Patents Applicationslast 30 patents

MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND MULTI-CHARGED-PAR...

MULTI CHARGED PARTICLE BEAM EVALUATION METHOD AND MULTI CHARGED PAR...

METHOD OF OBTAINING DOSE CORRECTION AMOUNT, CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

METHOD OF OBTAINING BEAM DEFLECTION SHAPE AND METHOD OF OBTAINING A...

Charged Particle Beam Writing Apparatus and Charged Particle Beam W...

EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...

Position Correction Method of Stage Mechanism and Charged Particle...

Charged Particle Beam Writing Apparatus, and Charged Particle Beam...

EVALUATION METHOD, CORRECTION METHOD, RECORDING MEDIUM AND ELECTRON...

ADJUSTMENT METHOD FOR CHARGED PARTICLE BEAM DRAWING APPARATUS AND C...

METHOD FOR ACQUIRING SETTLING TIME

SETTLING TIME ACQUISITION METHOD

METHOD FOR ACQUIRING SETTLING TIME

ACQUISITION METHOD OF CHARGED PARTICLE BEAM DEFLECTION SHAPE ERROR...

CHARGED PARTICLE BEAM DRAWING METHOD AND CHARGED PARTICLE BEAM DRAW...

METHOD OF DETERMINING MAIN DEFLECTION SETTLING TIME FOR CHARGED PAR...

Lithography method of electron beam

CORRECTING SUBSTRATE FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

CHARGED-PARTICLE BEAM WRITING APPARATUS AND CHARGED-PARTICLE BEAM W...

CHARGED-PARTICLE BEAM WRITING METHOD

ELECTRON BEAM LITHOGRAPHY SYSTEM

CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND METHOD FOR EVALUATING...

FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PART...

METHOD OF CALCULATING DEFLECTION ABERRATION CORRECTING VOLTAGE AND...