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Rik Jonckheere

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  • Muizen, BE
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Patents Grantslast 30 patents

Patents Applicationslast 30 patents

  • Information Patent Application

    Lithographic Reticle System
    • Publication number 20180329290
    • Publication date Nov 15, 2018
    • IMEC vzw
    • Rik Jonckheere
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Lithographic Mask for EUV Lithography
    • Publication number 20180059529
    • Publication date Mar 1, 2018
    • IMEC vzw
    • Rik Jonckheere
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DETECTION OF CONTAMINATION IN EUV SYSTEMS
    • Publication number 20120099092
    • Publication date Apr 26, 2012
    • IMEC
    • Rik Jonckheere
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    DETECTION OF CONTAMINATION IN EUV SYSTEMS
    • Publication number 20090103069
    • Publication date Apr 23, 2009
    • Interuniversitair Microelektronica Centrum vzw (IMEC)
    • Rik Jonckheere
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    METHOD AND SYSTEM FOR MEASURING CONTAMINATION OF A LITHOGRAPHICAL E...
    • Publication number 20080315125
    • Publication date Dec 25, 2008
    • Interuniversitair Microelektronica Centrum (IMEC) VZW
    • Gian Francesco Lorusso
    • G01 - MEASURING TESTING
  • Information Patent Application

    SYSTEMS AND METHODS FOR UV LITHOGRAPHY
    • Publication number 20080229273
    • Publication date Sep 18, 2008
    • Interuniversitair Microelektronica Centrum (IMEC) VZW
    • Gian Francesco Lorusso
    • B82 - NANO-TECHNOLOGY