Rika NOGITA

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Hitachi-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Photosensitive resin composition and circuit formation substrate us...
- Patent number 8,614,051
- Issue date Dec 24, 2013
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive resin composition and circuit formation substrate us...
- Patent number 8,304,160
- Issue date Nov 6, 2012
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photosensitive resin composition, process for producing patterned h...
- Patent number 8,298,747
- Issue date Oct 30, 2012
- Hitachi Chemical DuPont Microsystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...
- Publication number 20120328856
- Publication date Dec 27, 2012
- HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.
- Tomonori MINEGISHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE US...
- Publication number 20100260983
- Publication date Oct 14, 2010
- HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.
- Tomonori MINEGISHI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED H...
- Publication number 20100092879
- Publication date Apr 15, 2010
- Hitachi Chemical DuPont MicroSystems, Ltd.
- Tomonori Minegishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...