Rikimaru SAKAMOTO

Person

Toyama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 12,242,196
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition comprising epoxy adduct...
- Patent number 12,242,194
- Issue date Mar 4, 2025
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming coating film and method for manufacturing s...
- Patent number 12,087,576
- Issue date Sep 10, 2024
- NISSAN CHEMICAL CORPORATION
- Tokio Nishita
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 12,072,629
- Issue date Aug 27, 2024
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition comprising polymer havin...
- Patent number 12,025,915
- Issue date Jul 2, 2024
- NISSAN CHEMICAL CORPORATION
- Tokio Nishita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition containing amide solvent
- Patent number 11,798,810
- Issue date Oct 24, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing indolocarbazo...
- Patent number 11,720,024
- Issue date Aug 8, 2023
- Nissan Chemical Industries, Ltd.
- Hikaru Tokunaga
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 11,681,223
- Issue date Jun 20, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming resist overlayer film for EUV lithography
- Patent number 11,675,269
- Issue date Jun 13, 2023
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film-forming composition
- Patent number 11,675,270
- Issue date Jun 13, 2023
- NISSAN CHEMICAL CORPORATION
- Tokio Nishita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming underlayer film of self-assembled film incl...
- Patent number 11,674,053
- Issue date Jun 13, 2023
- Nissan Chemical Industries, Ltd.
- Takafumi Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition containing novolac resin...
- Patent number 11,650,505
- Issue date May 16, 2023
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition comprising carbonyl-cont...
- Patent number 11,592,747
- Issue date Feb 28, 2023
- Nissan Chemical Industries, Ltd.
- Yasunobu Someya
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing resist pattern coating composition with use of...
- Patent number 11,531,269
- Issue date Dec 20, 2022
- NISSAN CHEMICAL CORPORATION
- Shuhei Shigaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film forming composition using a fluorene compound
- Patent number 11,506,980
- Issue date Nov 22, 2022
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer film-forming composition for use in forming a microphase...
- Patent number 11,440,985
- Issue date Sep 13, 2022
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Multi-level substrate coating film-forming composition containing p...
- Patent number 11,385,546
- Issue date Jul 12, 2022
- NISSAN CHEMICAL CORPORATION
- Takafumi Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anti-reflective coating forming composition containing reaction pro...
- Patent number 11,372,330
- Issue date Jun 28, 2022
- Nissan Chemical Industries, Ltd.
- Takahiro Kishioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film forming composition containing triaryldiamin...
- Patent number 11,300,879
- Issue date Apr 12, 2022
- NISSAN CHEMICAL CORPORATION
- Daigo Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film-forming composition containing novolac polym...
- Patent number 11,199,777
- Issue date Dec 14, 2021
- Nissan Chemical Industries, Ltd.
- Hirokazu Nishimaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film-forming composition for lithography containi...
- Patent number 11,194,251
- Issue date Dec 7, 2021
- Nissan Chemical Industries, Ltd.
- Ryo Karasawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming resist underlayer film, resist underlayer f...
- Patent number 11,169,441
- Issue date Nov 9, 2021
- NISSAN CHEMICAL CORPORATION
- Daigo Saito
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photocrosslinkable group-containing composition for coating stepped...
- Patent number 11,155,684
- Issue date Oct 26, 2021
- Nissan Chemical Industries, Ltd.
- Rikimaru Sakamoto
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicon-containing resist underlayer film-forming composition havin...
- Patent number 11,022,884
- Issue date Jun 1, 2021
- Nissan Chemical Industries, Ltd.
- Wataru Shibayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aqueous solution for resist pattern coating and pattern forming met...
- Patent number 11,009,795
- Issue date May 18, 2021
- NISSAN CHEMICAL CORPORATION
- Tokio Nishita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-organized film-forming composition for use in forming a micro-...
- Patent number 10,995,172
- Issue date May 4, 2021
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for forming film protecting against aqueous hydrogen pe...
- Patent number 10,894,887
- Issue date Jan 19, 2021
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stepped substrate-coating composition containing polyether resin ha...
- Patent number 10,871,712
- Issue date Dec 22, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Upper-layer film forming composition and method for producing a pha...
- Patent number 10,865,262
- Issue date Dec 15, 2020
- NISSAN CHEMICAL CORPORATION
- Ryuta Mizuochi
- B32 - LAYERED PRODUCTS

Patents Applicationslast 30 patents

Information Patent Application
WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...
- Publication number 20250014901
- Publication date Jan 9, 2025
- NISSAN CHEMICAL CORPORATION
- Hayato HATTORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE
- Publication number 20240162086
- Publication date May 16, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT
- Publication number 20240006183
- Publication date Jan 4, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...
- Publication number 20230324802
- Publication date Oct 12, 2023
- Nissan Chemical Industries, Ltd.
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER
- Publication number 20230287165
- Publication date Sep 14, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20230244141
- Publication date Aug 3, 2023
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPP...
- Publication number 20230213857
- Publication date Jul 6, 2023
- NISSAN CHEMICAL CORPORATION
- Satoshi KAMIBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER
- Publication number 20230174702
- Publication date Jun 8, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...
- Publication number 20220404707
- Publication date Dec 22, 2022
- Nissan Chemical Industries, Ltd.
- Hikaru TOKUNAGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING COATING FILM AND METHOD FOR MANUFACTURING S...
- Publication number 20210151318
- Publication date May 20, 2021
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION USING A FLUORENE COMPOUND
- Publication number 20200379350
- Publication date Dec 3, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...
- Publication number 20200379352
- Publication date Dec 3, 2020
- Nissan Chemical Industries, Ltd.
- Keisuke HASHIMOTO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
STEPPED SUBSTRATE-COATING COMPOSITION CONTAINING POLYETHER RESIN HA...
- Publication number 20200301278
- Publication date Sep 24, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER F...
- Publication number 20200142310
- Publication date May 7, 2020
- NISSAN CHEMICAL CORPORATION
- Daigo SAITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING FILM PROTECTING AGAINST AQUEOUS HYDROGEN PE...
- Publication number 20200131376
- Publication date Apr 30, 2020
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SELF-ORGANIZED FILM-FORMING COMPOSITION FOR USE IN FORMING A MICRO-...
- Publication number 20200123298
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING POLYMER HAVIN...
- Publication number 20200124965
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MULTI-LEVEL SUBSTRATE COATING FILM-FORMING COMPOSITION CONTAINING P...
- Publication number 20200124966
- Publication date Apr 23, 2020
- NISSAN CHEMICAL CORPORATION
- Takafumi ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNDERLAYER FILM-FORMING COMPOSITION FOR USE IN FORMING A MICROPHASE...
- Publication number 20190359749
- Publication date Nov 28, 2019
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT
- Publication number 20190354018
- Publication date Nov 21, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION AND RESIST...
- Publication number 20190317405
- Publication date Oct 17, 2019
- Nissan Chemical Industries, Ltd.
- Tokio NISHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION
- Publication number 20190294046
- Publication date Sep 26, 2019
- NISSAN CHEMICAL CORPORATION
- Hirokazu NISHIMAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTA...
- Publication number 20190265593
- Publication date Aug 29, 2019
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING RESIST PATTERN COATING COMPOSITION WITH USE OF...
- Publication number 20190250512
- Publication date Aug 15, 2019
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AQUEOUS SOLUTION FOR RESIST PATTERN COATING AND PATTERN FORMING MET...
- Publication number 20190243251
- Publication date Aug 8, 2019
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS SOLUTION FOR RESIST PATTERN COATING AND PATTERN FORMING MET...
- Publication number 20190243249
- Publication date Aug 8, 2019
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UPPER-LAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING A PHA...
- Publication number 20190233559
- Publication date Aug 1, 2019
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20190227438
- Publication date Jul 25, 2019
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING TRIARYLDIAMIN...
- Publication number 20190212649
- Publication date Jul 11, 2019
- NISSAN CHEMICAL CORPORATION
- Daigo SAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
- Publication number 20190171101
- Publication date Jun 6, 2019
- NISSAN CHEMICAL CORPORATION
- Hikaru TOKUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Rikimaru SAKAMOTO

Person

Patents Grantslast 30 patents

Resist underlayer film-forming composition containing indolocarbazo...

Resist underlayer film-forming composition comprising epoxy adduct...

Photocurable composition and method for producing semiconductor device

Composition for forming coating film and method for manufacturing s...

Resist underlayer film-forming composition containing novolac resin...

Resist underlayer film-forming composition comprising polymer havin...

Resist underlayer film-forming composition containing amide solvent

Resist underlayer film-forming composition containing indolocarbazo...

Photocurable composition and method for producing semiconductor device

Composition for forming resist overlayer film for EUV lithography

Resist underlayer film-forming composition

Composition for forming underlayer film of self-assembled film incl...

Resist underlayer film-forming composition containing novolac resin...

Resist underlayer film-forming composition comprising carbonyl-cont...

Method for producing resist pattern coating composition with use of...

Resist underlayer film forming composition using a fluorene compound

Underlayer film-forming composition for use in forming a microphase...

Multi-level substrate coating film-forming composition containing p...

Anti-reflective coating forming composition containing reaction pro...

Resist underlayer film forming composition containing triaryldiamin...

Resist underlayer film-forming composition containing novolac polym...

Resist underlayer film-forming composition for lithography containi...

Composition for forming resist underlayer film, resist underlayer f...

Photocrosslinkable group-containing composition for coating stepped...

Silicon-containing resist underlayer film-forming composition havin...

Aqueous solution for resist pattern coating and pattern forming met...

Self-organized film-forming composition for use in forming a micro-...

Composition for forming film protecting against aqueous hydrogen pe...

Stepped substrate-coating composition containing polyether resin ha...

Upper-layer film forming composition and method for producing a pha...

Patents Applicationslast 30 patents

WAFER EDGE PROTECTIVE FILM-FORMING COMPOSITION FOR SEMICONDUCTOR MA...

SUBSTRATE WITH THIN FILM, AND SEMICONDUCTOR SUBSTRATE

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...

VERTICALLY PHASE-SEPARATED BLOCK COPOLYMER LAYER

PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING RADICAL TRAPP...

VERTICALLY PHASE-SEPARATED LAYER OF A BLOCK COPOLYMER

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING INDOLOCARBAZO...

COMPOSITION FOR FORMING COATING FILM AND METHOD FOR MANUFACTURING S...

RESIST UNDERLAYER FILM FORMING COMPOSITION USING A FLUORENE COMPOUND

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING SUBSTITUTED C...

STEPPED SUBSTRATE-COATING COMPOSITION CONTAINING POLYETHER RESIN HA...

COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER F...

COMPOSITION FOR FORMING FILM PROTECTING AGAINST AQUEOUS HYDROGEN PE...

SELF-ORGANIZED FILM-FORMING COMPOSITION FOR USE IN FORMING A MICRO-...

RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING POLYMER HAVIN...

MULTI-LEVEL SUBSTRATE COATING FILM-FORMING COMPOSITION CONTAINING P...

UNDERLAYER FILM-FORMING COMPOSITION FOR USE IN FORMING A MICROPHASE...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING AMIDE SOLVENT

ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION AND RESIST...

RESIST UNDERLAYER FILM FORMING COMPOSITION

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTA...

METHOD FOR PRODUCING RESIST PATTERN COATING COMPOSITION WITH USE OF...

AQUEOUS SOLUTION FOR RESIST PATTERN COATING AND PATTERN FORMING MET...

AQUEOUS SOLUTION FOR RESIST PATTERN COATING AND PATTERN FORMING MET...

UPPER-LAYER FILM FORMING COMPOSITION AND METHOD FOR PRODUCING A PHA...

RESIST UNDERLAYER FILM-FORMING COMPOSITION

RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING TRIARYLDIAMIN...

PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE