TREA

Rilpho Ludovicus DONKER

Follow

Person

  • Veldhoven, NL
People

Patents Grantslast 30 patents

  • Information Patent Grant

    Radiation system
    • Patent number 11,984,236
    • Issue date May 14, 2024
    • ASML Netherlands B.V.
    • Han-Kwang Nienhuys
    • G02 - OPTICS
  • Information Patent Grant

    Radiation source
    • Patent number 11,140,765
    • Issue date Oct 5, 2021
    • ASML Netherlands B.V.
    • Rilpho Ludovicus Donker
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Grant

    Beam delivery apparatus and method
    • Patent number 10,580,545
    • Issue date Mar 3, 2020
    • ASML Netherlands B.V.
    • Vadim Yevgenyevich Banine
    • G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
  • Information Patent Grant

    Radiation system
    • Patent number 10,580,546
    • Issue date Mar 3, 2020
    • ASML Netherlands B.V.
    • Han-Kwang Nienhuys
    • G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
  • Information Patent Grant

    Lithographic method
    • Patent number 9,823,572
    • Issue date Nov 21, 2017
    • ASML Netherlands B.V.
    • Andrey Alexandrovich Nikipelov
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    CALIBRATION SYSTEM FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
    • Publication number 20230018949
    • Publication date Jan 19, 2023
    • ASML NETHERLANDS B.V.
    • Daniel Jason Riggs
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    Radiation Source
    • Publication number 20200296817
    • Publication date Sep 17, 2020
    • ASML NETHERLANDS B.V.
    • Rilpho Ludovicus DONKER
    • H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
  • Information Patent Application

    RADIATION SYSTEM
    • Publication number 20200152345
    • Publication date May 14, 2020
    • ASML NETHERLANDS B.V.
    • Han-Kwang NIENHUYS
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    LITHOGRAPHIC METHOD
    • Publication number 20180081278
    • Publication date Mar 22, 2018
    • ASML NETHERLANDS B.V.
    • Andrey Alexandrovich NIKIPELOV
    • G01 - MEASURING TESTING
  • Information Patent Application

    RADIATION SYSTEM
    • Publication number 20180031982
    • Publication date Feb 1, 2018
    • ASML NETHERLANDS B.V.
    • Han-Kwang NIENHUYS
    • G02 - OPTICS
  • Information Patent Application

    BEAM DELIVERY APPARATUS AND METHOD
    • Publication number 20160225477
    • Publication date Aug 4, 2016
    • ASML NETHERLANDS B.V.
    • Vadim Yevgenyevich BANINE
    • G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
  • Information Patent Application

    LITHOGRAPHIC METHOD
    • Publication number 20160147161
    • Publication date May 26, 2016
    • ASML NETHERLANDS B.V.
    • Andrey Alexandrovich NIKIPELOV
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY