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Rin ODASHIMA
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Method of producing block copolymer capable of creating specific st...
Patent number
11,560,444
Issue date
Jan 24, 2023
Tokyo Ohka Kogyo Co., Ltd.
Teruaki Hayakawa
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Block copolymer and method of producing the same, and method of pro...
Patent number
11,261,299
Issue date
Mar 1, 2022
Tokyo Ohka Kogyo Co., Ltd.
Akiyoshi Yamazaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Block copolymer, and method of producing structure containing phase...
Patent number
10,941,253
Issue date
Mar 9, 2021
Tokyo Ohka Kogyo Co., Ltd.
Teruaki Hayakawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
METHOD FOR PRODUCING ACID GENERATOR
Publication number
20240425440
Publication date
Dec 26, 2024
Tokyo Ohka Kogyo Co., Ltd.
Rin Odashima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AN...
Publication number
20240402604
Publication date
Dec 5, 2024
Tokyo Ohka Kogyo Co., Ltd.
Rin Odashima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20240302741
Publication date
Sep 12, 2024
Tokyo Ohka Kogyo Co., Ltd.
Shuichi Ishii
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220179314
Publication date
Jun 9, 2022
Tokyo Ohka Kogyo Co., Ltd.
Rin ODASHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220179306
Publication date
Jun 9, 2022
Tokyo Ohka Kogyo Co., Ltd.
Rin ODASHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220179313
Publication date
Jun 9, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masahito YAHAGI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210157234
Publication date
May 27, 2021
Tokyo Ohka Kogyo Co., Ltd.
Rin Odashima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210063878
Publication date
Mar 4, 2021
Tokyo Ohka Kogyo Co., Ltd.
Takashi Nagamine
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
METHOD OF PRODUCING BLOCK COPOLYMER CAPABLE OF CREATING SPECIFIC ST...
Publication number
20200262960
Publication date
Aug 20, 2020
Tokyo Ohka Kogyo Co., Ltd.
Teruaki HAYAKAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
BLOCK COPOLYMER AND METHOD OF PRODUCING THE SAME, AND METHOD OF PRO...
Publication number
20190270852
Publication date
Sep 5, 2019
Tokyo Ohka Kogyo Co., Ltd.
Akiyoshi YAMAZAKI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
BLOCK COPOLYMER, AND METHOD OF PRODUCING STRUCTURE CONTAINING PHASE...
Publication number
20180244856
Publication date
Aug 30, 2018
Tokyo Ohka Kogyo Co., Ltd.
Teruaki HAYAKAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...