Rina Maeda

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Madison, WI, US

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Patents Grantslast 30 patents

Information Patent Grant
Block copolymers and lithographic patterning using same
- Patent number 9,541,830
- Issue date Jan 10, 2017
- Cornell University
- Christopher K. Ober
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
BLOCK COPOLYMERS AND LITHOGRAPHIC PATTERNING USING SAME
- Publication number 20140370442
- Publication date Dec 18, 2014
- Cornell University
- Christopher K. Ober
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...