Risako MATSUDA

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for measuring gas flow
- Patent number 11,899,476
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Risako Matsuda
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 11,742,228
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Risako Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas inspection method, substrate processing method, and substrate p...
- Patent number 11,644,121
- Issue date May 9, 2023
- Tokyo Electron Limited
- Risako Matsuda
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Method for calibrating plurality of chamber pressure sensors and su...
- Patent number 11,585,717
- Issue date Feb 21, 2023
- Tokyo Electron Limited
- Risako Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of calibrating multiple chamber pressure sensors
- Patent number 11,555,755
- Issue date Jan 17, 2023
- Tokyo Electron Limited
- Risako Matsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow rate measurement apparatus and method for more accurately meas...
- Patent number 11,326,914
- Issue date May 10, 2022
- Tokyo Electron Limited
- Norihiko Amikura
- G01 - MEASURING TESTING
Information Patent Grant
Method for cleaning gas supply line and processing system
- Patent number 11,292,035
- Issue date Apr 5, 2022
- Tokyo Electron Limited
- Risako Matsuda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND METHOD OF PROCESSING SUBSTRATE
- Publication number 20230034399
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Risako MATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS INSPECTION METHOD, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE P...
- Publication number 20210301942
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Risako MATSUDA
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
METHOD OF CALIBRATING MULTIPLE CHAMBER PRESSURE SENSORS
- Publication number 20210302257
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Risako MATSUDA
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20210287922
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Risako MATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MEASURING GAS FLOW
- Publication number 20210263540
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Risako Matsuda
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE PROCESSING METHOD, GAS FLOW EVALUATION SUBSTRATE AND SUBS...
- Publication number 20210257197
- Publication date Aug 19, 2021
- TOKYO ELECTRON LIMITED
- Risako MATSUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CALIBRATING PLURALITY OF CHAMBER PRESSURE SENSORS AND SU...
- Publication number 20200292403
- Publication date Sep 17, 2020
- TOKYO ELECTRON LIMITED
- Risako MATSUDA
- G01 - MEASURING TESTING
Information Patent Application
FLOW RATE MEASUREMENT METHOD AND FLOW RATE MEASUREMENT APPARATUS
- Publication number 20200278225
- Publication date Sep 3, 2020
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR CLEANING GAS SUPPLY LINE AND PROCESSING SYSTEM
- Publication number 20190333742
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Risako MATSUDA
- H01 - BASIC ELECTRIC ELEMENTS

Risako MATSUDA

Person

Patents Grantslast 30 patents

Method and apparatus for measuring gas flow

Substrate processing method and substrate processing system

Gas inspection method, substrate processing method, and substrate p...

Method for calibrating plurality of chamber pressure sensors and su...

Method of calibrating multiple chamber pressure sensors

Flow rate measurement apparatus and method for more accurately meas...

Method for cleaning gas supply line and processing system

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM AND METHOD OF PROCESSING SUBSTRATE

GAS INSPECTION METHOD, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE P...

METHOD OF CALIBRATING MULTIPLE CHAMBER PRESSURE SENSORS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

METHOD AND APPARATUS FOR MEASURING GAS FLOW

SUBSTRATE PROCESSING METHOD, GAS FLOW EVALUATION SUBSTRATE AND SUBS...

METHOD FOR CALIBRATING PLURALITY OF CHAMBER PRESSURE SENSORS AND SU...

FLOW RATE MEASUREMENT METHOD AND FLOW RATE MEASUREMENT APPARATUS

METHOD FOR CLEANING GAS SUPPLY LINE AND PROCESSING SYSTEM