Risako MIYOSHI

Person

Miyagi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of obtaining output flow rate of flow rate controller and me...
- Patent number 11,231,313
- Issue date Jan 25, 2022
- Tokyo Electron Limited
- Norihiko Amikura
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of determining flow rate of a gas in a substrate processing...
- Patent number 10,876,870
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Risako Miyoshi
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing system and method of determining flow rate of gas
- Patent number 10,871,786
- Issue date Dec 22, 2020
- Tokyo Electron Limited
- Risako Miyoshi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of inspecting flow rate measuring system
- Patent number 10,859,426
- Issue date Dec 8, 2020
- Tokyo Electron Limited
- Jun Hirose
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of arranging treatment process
- Patent number 10,845,119
- Issue date Nov 24, 2020
- Tokyo Electron Limited
- Jun Hirose
- F26 - DRYING
Information Patent Grant
Method of inspecting gas supply system, method of calibrating flow...
- Patent number 10,788,356
- Issue date Sep 29, 2020
- Tokyo Electron Limited
- Norihiko Amikura
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting gas supply system
- Patent number 10,692,743
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Risako Miyoshi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of inspecting gas supply system
- Patent number 10,692,744
- Issue date Jun 23, 2020
- Tokyo Electron Limited
- Risako Miyoshi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for inspecting shower plate of plasma processing apparatus
- Patent number 10,424,466
- Issue date Sep 24, 2019
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of inspecting gas supply system
- Patent number 10,274,972
- Issue date Apr 30, 2019
- Tokyo Electron Limited
- Norihiko Amikura
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Grant
Method for preventing explosion of exhaust gas in decompression pro...
- Patent number 10,168,049
- Issue date Jan 1, 2019
- Tokyo Electron Limited
- Norihiko Amikura
- G01 - MEASURING TESTING
Information Patent Grant
Method of calculating output flow rate of flow rate controller
- Patent number 10,031,007
- Issue date Jul 24, 2018
- Tokyo Electron Limited
- Norihiko Amikura
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus
- Patent number 9,240,307
- Issue date Jan 19, 2016
- Tokyo Electron Limited
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and gas supply method therefor
- Patent number 9,236,230
- Issue date Jan 12, 2016
- Tokyo Electron Limited
- Yoshiyuki Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exhausting method and gas processing apparatus
- Patent number 8,597,401
- Issue date Dec 3, 2013
- Tokyo Electron Limited
- Norihiko Amikura
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND METHOD OF DETERMINING FLOW RATE OF GAS
- Publication number 20190301912
- Publication date Oct 3, 2019
- TOKYO ELECTRON LIMITED
- Risako MIYOSHI
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF DETERMINING FLOW RATE OF GAS
- Publication number 20190212176
- Publication date Jul 11, 2019
- TOKYO ELECTRON LIMITED
- Risako MIYOSHI
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF INSPECTING FLOW RATE MEASURING SYSTEM
- Publication number 20190063987
- Publication date Feb 28, 2019
- TOKYO ELECTRON LIMITED
- Jun HIROSE
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF INSPECTING GAS SUPPLY SYSTEM
- Publication number 20180374727
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Risako MIYOSHI
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF INSPECTING GAS SUPPLY SYSTEM
- Publication number 20180374726
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Risako MIYOSHI
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF OBTAINING OUTPUT FLOW RATE OF FLOW RATE CONTROLLER AND ME...
- Publication number 20180299908
- Publication date Oct 18, 2018
- TOKYO ELECTRON LIMITED
- Norihiko Amikura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INSPECTING GAS SUPPLY SYSTEM, METHOD OF CALIBRATING FLOW...
- Publication number 20180073911
- Publication date Mar 15, 2018
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR INSPECTING SHOWER PLATE OF PLASMA PROCESSING APPARATUS
- Publication number 20180053637
- Publication date Feb 22, 2018
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ARRANGING TREATMENT PROCESS
- Publication number 20170261258
- Publication date Sep 14, 2017
- TOKYO ELECTRON LIMITED
- Jun HIROSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CALCULATING OUTPUT FLOW RATE OF FLOW RATE CONTROLLER
- Publication number 20170074694
- Publication date Mar 16, 2017
- TOKYO ELECTRON LIMITED
- Norihiko Amikura
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF INSPECTING GAS SUPPLY SYSTEM
- Publication number 20170075361
- Publication date Mar 16, 2017
- TOKYO ELECTRON LIMITED
- Norihiko Amikura
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
METHOD FOR PREVENTING EXPLOSION OF EXHAUST GAS IN DECOMPRESSION PRO...
- Publication number 20150330631
- Publication date Nov 19, 2015
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20140203702
- Publication date Jul 24, 2014
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND GAS SUPPLY METHOD THEREFOR
- Publication number 20120305188
- Publication date Dec 6, 2012
- TOKYO ELECTRON LIMITED
- Yoshiyuki KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXHAUSTING METHOD AND GAS PROCESSING APPARATUS
- Publication number 20120031266
- Publication date Feb 9, 2012
- TOKYO ELECTRON LIMITED
- Norihiko AMIKURA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Semiconductor treating device
- Publication number 20070160447
- Publication date Jul 12, 2007
- TOKYO ELECTRON LIMITED
- Norihiko Amikura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Risako MIYOSHI

Person

Patents Grantslast 30 patents

Method of obtaining output flow rate of flow rate controller and me...

Method of determining flow rate of a gas in a substrate processing...

Substrate processing system and method of determining flow rate of gas

Method of inspecting flow rate measuring system

Method of arranging treatment process

Method of inspecting gas supply system, method of calibrating flow...

Method of inspecting gas supply system

Method of inspecting gas supply system

Method for inspecting shower plate of plasma processing apparatus

Method of inspecting gas supply system

Method for preventing explosion of exhaust gas in decompression pro...

Method of calculating output flow rate of flow rate controller

Plasma processing apparatus

Plasma processing apparatus and gas supply method therefor

Exhausting method and gas processing apparatus

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM AND METHOD OF DETERMINING FLOW RATE OF GAS

METHOD OF DETERMINING FLOW RATE OF GAS

METHOD OF INSPECTING FLOW RATE MEASURING SYSTEM

METHOD OF INSPECTING GAS SUPPLY SYSTEM

METHOD OF INSPECTING GAS SUPPLY SYSTEM

METHOD OF OBTAINING OUTPUT FLOW RATE OF FLOW RATE CONTROLLER AND ME...

METHOD OF INSPECTING GAS SUPPLY SYSTEM, METHOD OF CALIBRATING FLOW...

METHOD FOR INSPECTING SHOWER PLATE OF PLASMA PROCESSING APPARATUS

METHOD OF ARRANGING TREATMENT PROCESS

METHOD OF CALCULATING OUTPUT FLOW RATE OF FLOW RATE CONTROLLER

METHOD OF INSPECTING GAS SUPPLY SYSTEM

METHOD FOR PREVENTING EXPLOSION OF EXHAUST GAS IN DECOMPRESSION PRO...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND GAS SUPPLY METHOD THEREFOR

EXHAUSTING METHOD AND GAS PROCESSING APPARATUS

Semiconductor treating device