Robbert Edgar Van Leeuwen

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Optical fibers and production methods therefor
- Patent number 11,999,645
- Issue date Jun 4, 2024
- ASML Netherlands B.V.
- Robbert Edgar Van Leeuwen
- G01 - MEASURING TESTING
Information Patent Grant
Actuator system and lithographic apparatus
- Patent number 10,338,483
- Issue date Jul 2, 2019
- ASML Netherlands B.V.
- Robbert Edgar Van Leeuwen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement system and lithographic apparatus
- Patent number 10,331,045
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement system, interferometer and lithographic apparatus
- Patent number 10,289,011
- Issue date May 14, 2019
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus, lithographic apparatus and method of positioning a...
- Patent number 9,915,880
- Issue date Mar 13, 2018
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, method of deforming a substrate table and d...
- Patent number 9,329,501
- Issue date May 3, 2016
- ASML Netherlands B.V.
- Yang-Shan Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stage apparatus, lithographic apparatus and method of positioning a...
- Patent number 9,316,928
- Issue date Apr 19, 2016
- ASML Netherlands B.V.
- Engelbertus Antonius Fransiscus Van Der Pasch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement system, lithographic apparatus and device manu...
- Patent number 8,922,756
- Issue date Dec 30, 2014
- ASML Netherlands B.V.
- Willem Herman Gertruda Anna Koenen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,675,175
- Issue date Mar 18, 2014
- ASML Netherlands B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Encoder-type measurement system, lithographic apparatus and method...
- Patent number 8,614,783
- Issue date Dec 24, 2013
- ASML Netherlands B.V.
- Emiel Jozef Melanie Eussen
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,395,755
- Issue date Mar 12, 2013
- ASML Netherlands B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,576,834
- Issue date Aug 18, 2009
- ASML Netherlands B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,385,675
- Issue date Jun 10, 2008
- ASML Netherlands B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method of measurement, system and method of alignment, l...
- Patent number 7,280,228
- Issue date Oct 9, 2007
- ASML Netherlands B.V.
- Gerrit Johannes Nijmeijer
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL FIBERS AND PRODUCTION METHODS THEREFOR
- Publication number 20210387892
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Robbert Edgar VAN LEEUWEN
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
ACTUATOR SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20190079416
- Publication date Mar 14, 2019
- ASML NETHERLANDS B.V.
- Robbert Edgar VAN LEEUWEN
- G01 - MEASURING TESTING
Information Patent Application
STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...
- Publication number 20160223917
- Publication date Aug 4, 2016
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20130201466
- Publication date Aug 8, 2013
- ASML NETHERLANDS B.V.
- Richard Alexander GEORGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANU...
- Publication number 20130050670
- Publication date Feb 28, 2013
- ASML NETHERLANDS B.V.
- Willem Herman Gertruda Anna Koenen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS, METHOD OF DEFORMING A SUBSTRATE TABLE AND D...
- Publication number 20120327386
- Publication date Dec 27, 2012
- ASML NETHERLANDS B.V.
- Yang-Shan Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...
- Publication number 20120050709
- Publication date Mar 1, 2012
- ASML NETHERLANDS B.V.
- Engelbertus Antonius Fransiscus VAN DER PASCH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus and Device Manufacturing Method
- Publication number 20090284720
- Publication date Nov 19, 2009
- ASML NETHERLANDS B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENCODER-TYPE MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD...
- Publication number 20090237634
- Publication date Sep 24, 2009
- ASML NETHERLANDS B.V.
- Emiel Jozef Melanie EUSSEN
- G01 - MEASURING TESTING
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20080218718
- Publication date Sep 11, 2008
- ASML NETHERLANDS B.V.
- Richard Alexander George
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method of measurement, system and method of alignment, l...
- Publication number 20050046845
- Publication date Mar 3, 2005
- ASML NETHERLANDS B.V.
- Gerrit Johannes Nijmeijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Robbert Edgar Van Leeuwen

Person

Patents Grantslast 30 patents

Optical fibers and production methods therefor

Actuator system and lithographic apparatus

Position measurement system and lithographic apparatus

Position measurement system, interferometer and lithographic apparatus

Stage apparatus, lithographic apparatus and method of positioning a...

Lithographic apparatus, method of deforming a substrate table and d...

Stage apparatus, lithographic apparatus and method of positioning a...

Position measurement system, lithographic apparatus and device manu...

Lithographic apparatus and device manufacturing method

Encoder-type measurement system, lithographic apparatus and method...

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

System and method of measurement, system and method of alignment, l...

Patents Applicationslast 30 patents

OPTICAL FIBERS AND PRODUCTION METHODS THEREFOR

ACTUATOR SYSTEM AND LITHOGRAPHIC APPARATUS

STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...

Lithographic Apparatus and Device Manufacturing Method

POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANU...

LITHOGRAPHIC APPARATUS, METHOD OF DEFORMING A SUBSTRATE TABLE AND D...

STAGE APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD OF POSITIONING A...

Lithographic Apparatus and Device Manufacturing Method

ENCODER-TYPE MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD...

Lithographic apparatus and device manufacturing method

System and method of measurement, system and method of alignment, l...