Robert B. Hagen

Person

Newark, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
- Patent number 7,186,943
- Issue date Mar 6, 2007
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
- Patent number 7,132,618
- Issue date Nov 7, 2006
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with overhead RF electrode tuned to the plasma with...
- Patent number 7,030,335
- Issue date Apr 18, 2006
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively coupled plasma reactor with uniform radial distributio...
- Patent number 6,900,596
- Issue date May 31, 2005
- Applied Materials, Inc.
- Jang Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Merie plasma reactor with overhead RF electrode tuned to the plasma...
- Patent number 6,894,245
- Issue date May 17, 2005
- Applied Materials, Inc.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution plate electrode for a plasma receptor
- Patent number 6,677,712
- Issue date Jan 13, 2004
- Applied Materials Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with spoke antenna having a VHF mode with the spokes...
- Patent number 6,667,577
- Issue date Dec 23, 2003
- Applied Materials, Inc.
- Steven Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution plate electrode for a plasma reactor
- Patent number 6,586,886
- Issue date Jul 1, 2003
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Merie plasma reactor with overhead RF electrode tuned to the plasma...
- Publication number 20050236377
- Publication date Oct 27, 2005
- APPLIED MATERIALS, INC.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Merie plasma reactor with overhead RF electrode tuned to the plasma...
- Publication number 20040211759
- Publication date Oct 28, 2004
- APPLIED MATERIALS, INC.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitively coupled plasma reactor with uniform radial distributio...
- Publication number 20040056602
- Publication date Mar 25, 2004
- APPLIED MATERIALS, INC.
- Jang Gyoo Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION PLATE ELECTRODE FOR A PLASMA REACTOR
- Publication number 20030201723
- Publication date Oct 30, 2003
- APPLIED MATERIALS, INC.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MERIE plasma reactor with overhead RF electrode tuned to the plasma...
- Publication number 20030136766
- Publication date Jul 24, 2003
- APPLIED MATERIALS, INC.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION PLATE ELECTRODE FOR A PLASMA REACTOR
- Publication number 20030111961
- Publication date Jun 19, 2003
- APPLIED MATERIALS, INC.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with spoke antenna having a VHF mode with the spokes...
- Publication number 20030111962
- Publication date Jun 19, 2003
- Steven Shannon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with overhead RF electrode tuned to the plasma with...
- Publication number 20020108933
- Publication date Aug 15, 2002
- APPLIED MATERIALS, INC.
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS

Robert B. Hagen

Person

Patents Grantslast 30 patents

MERIE plasma reactor with overhead RF electrode tuned to the plasma...

MERIE plasma reactor with overhead RF electrode tuned to the plasma...

Plasma reactor with overhead RF electrode tuned to the plasma with...

Capacitively coupled plasma reactor with uniform radial distributio...

Merie plasma reactor with overhead RF electrode tuned to the plasma...

Gas distribution plate electrode for a plasma receptor

Plasma reactor with spoke antenna having a VHF mode with the spokes...

Gas distribution plate electrode for a plasma reactor

Patents Applicationslast 30 patents

Merie plasma reactor with overhead RF electrode tuned to the plasma...

Merie plasma reactor with overhead RF electrode tuned to the plasma...

Capacitively coupled plasma reactor with uniform radial distributio...

GAS DISTRIBUTION PLATE ELECTRODE FOR A PLASMA REACTOR

MERIE plasma reactor with overhead RF electrode tuned to the plasma...

GAS DISTRIBUTION PLATE ELECTRODE FOR A PLASMA REACTOR

Plasma reactor with spoke antenna having a VHF mode with the spokes...

Plasma reactor with overhead RF electrode tuned to the plasma with...