Robert Chebi

Person

San Carlos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Enhanced productivity for an etch system through polymer management
- Patent number 10,037,883
- Issue date Jul 31, 2018
- Applied Materials, Inc.
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a silicon structure and deep silicon etch with profi...
- Patent number 9,865,472
- Issue date Jan 9, 2018
- Lam Research Corporation
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Elevated surface enhanced Raman spectroscopy resonator structures a...
- Patent number 9,857,307
- Issue date Jan 2, 2018
- OPTOKEY, INC.
- Fanqing Frank Chen
- G01 - MEASURING TESTING
Information Patent Grant
Surface enhanced raman spectroscopy resonator structures and method...
- Patent number 9,719,931
- Issue date Aug 1, 2017
- OPTOKEY, INC.
- Fanqing Frank Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High frequency filter for improved RF bias signal stability
- Patent number 9,673,069
- Issue date Jun 6, 2017
- Applied Materials, Inc.
- Yuri Trachuk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of a silicon structure and deep silicon etch with profi...
- Patent number 9,330,926
- Issue date May 3, 2016
- Lam Research Corporation
- Robert Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching a substrate
- Patent number 9,318,341
- Issue date Apr 19, 2016
- Applied Materials, Inc.
- Robert P. Chebi
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Silicon etch with passivation using chemical vapor deposition
- Patent number 9,018,098
- Issue date Apr 28, 2015
- Lam Research Corporation
- Jaroslaw W. Winniczek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for removing photoresist
- Patent number 8,757,178
- Issue date Jun 24, 2014
- Lam Research Corporation
- Robert P. Chebi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon etch with passivation using plasma enhanced oxidation
- Patent number 8,598,037
- Issue date Dec 3, 2013
- Lam Research Corporation
- Jaroslaw W. Winniczek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High strip rate downstream chamber
- Patent number 8,425,682
- Issue date Apr 23, 2013
- Lam Research Corporation
- Ing-Yann Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
High strip rate downstream chamber
- Patent number 8,298,336
- Issue date Oct 30, 2012
- Lam Research Corporation
- Ing-Yann Wang
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silicon etch with passivation using plasma enhanced oxidation
- Patent number 8,173,547
- Issue date May 8, 2012
- Lam Research Corporation
- Jaroslaw W. Winniczek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for removing photoresist
- Patent number 8,043,434
- Issue date Oct 25, 2011
- Lam Research Corporation
- Robert P. Chebi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Variable volume plasma processing chamber and associated methods
- Patent number 7,824,519
- Issue date Nov 2, 2010
- Lam Research Corporation
- Ing-Yann Albert Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist stripping chamber and methods of etching photoresist on...
- Patent number 7,605,063
- Issue date Oct 20, 2009
- Lam Research Corporation
- Robert P. Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching dielectric films with improved resist and/or et...
- Patent number 7,547,635
- Issue date Jun 16, 2009
- Lam Research Corporation
- Aaron Eppler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High chamber temperature process and chamber design for photo-resis...
- Patent number 7,476,291
- Issue date Jan 13, 2009
- Lam Research Corporation
- Ing-Yann Albert Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching photoresist on substrates
- Patent number 7,083,903
- Issue date Aug 1, 2006
- Lam Research Corporation
- Erik A. Edelberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for reducing contamination of semiconductor substrates
- Patent number 6,759,336
- Issue date Jul 6, 2004
- Lam Research Corporation
- Robert Chebi
- B08 - CLEANING
Information Patent Grant
Methods for reducing contamination of semiconductor substrates
- Patent number 6,528,427
- Issue date Mar 4, 2003
- Lam Research Corporation
- Robert Chebi
- B08 - CLEANING
Information Patent Grant
Apparatus for reducing process drift in inductive coupled plasma et...
- Patent number 6,241,845
- Issue date Jun 5, 2001
- Lam Research Corporation
- Prashant Gadgil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for reducing process drift in inductive coupled plasma et...
- Patent number 6,048,798
- Issue date Apr 11, 2000
- Lam Research Corporation
- Prashant Gadgil
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MICROFLUIDIC FILTER DEVICES AND METHODS OF FABRICATING MICROFLUIDIC...
- Publication number 20190270960
- Publication date Sep 5, 2019
- HysOcean, Inc.
- Fanqing Chen
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
MICROFLUIDIC FILTER DEVICES AND METHODS
- Publication number 20190225930
- Publication date Jul 25, 2019
- HysOcean, Inc.
- Fanqing Chen
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Surface Enhanced Raman Spectroscopy (SERS) Structure For Double Res...
- Publication number 20180059026
- Publication date Mar 1, 2018
- OPTOKEY, INC.
- Jian Ye
- G01 - MEASURING TESTING
Information Patent Application
Elevated Surface Enhanced Raman Spectroscopy Resonator Structures A...
- Publication number 20170052121
- Publication date Feb 23, 2017
- OPTOKEY, INC.
- Fanqing Frank Chen
- G01 - MEASURING TESTING
Information Patent Application
FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...
- Publication number 20160233102
- Publication date Aug 11, 2016
- LAM RESEARCH CORPORATION
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Enhanced Raman Spectroscopy Resonator Structures And Method...
- Publication number 20160146736
- Publication date May 26, 2016
- Fanqing Frank Chen
- G01 - MEASURING TESTING
Information Patent Application
ENHANCED PRODUCTIVITY FOR AN ETCH SYSTEM THROUGH POLYMER MANAGEMENT
- Publication number 20140273520
- Publication date Sep 18, 2014
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH STRIP RATE DOWNSTREAM CHAMBER
- Publication number 20140261803
- Publication date Sep 18, 2014
- Ing-Yann Wang
- F17 - STORING OF DISTRIBUTING GASES OR LIQUIDS
Information Patent Application
HIGH FREQUENCY FILTER FOR IMPROVED RF BIAS SIGNAL STABILITY
- Publication number 20140162462
- Publication date Jun 12, 2014
- Applied Materials Inc.
- Yuri Trachuck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH STRIP RATE DOWNSTREAM CHAMBER
- Publication number 20130025693
- Publication date Jan 31, 2013
- LAM RESEARCH CORPORATION
- Ing-Yann Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR GAS DELIVERY INTO PLASMA PROCESSING CHAMBERS
- Publication number 20120152900
- Publication date Jun 21, 2012
- Applied Materials, Inc.
- ROBERT P. CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING A SUBSTRATE
- Publication number 20120152895
- Publication date Jun 21, 2012
- Applied Materials, Inc.
- ROBERT P. CHEBI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PLASMA PROCESSING APPARATUS WITH REDUCED EFFECTS OF PROCESS CHAMBER...
- Publication number 20120103524
- Publication date May 3, 2012
- Applied Materials, Inc.
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON ETCH WITH PASSIVATION USING PLASMA ENHANCED OXIDATION
- Publication number 20120100720
- Publication date Apr 26, 2012
- LAM RESEARCH CORPORATION
- Jaroslaw W. Winniczek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REMOVING PHOTORESIST
- Publication number 20120006486
- Publication date Jan 12, 2012
- LAM RESEARCH CORPORATION
- Robert P. Chebi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Variable Volume Plasma Processing Chamber and Associated Methods
- Publication number 20110023779
- Publication date Feb 3, 2011
- LAM RESEARCH CORPORATION
- Ing-Yann Albert Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REMOVING PHOTORESIST
- Publication number 20100101603
- Publication date Apr 29, 2010
- LAM RESEARCH CORPORATION
- Robert P. Chebi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON ETCH WITH PASSIVATION USING CHEMICAL VAPOR DEPOSITION
- Publication number 20100105208
- Publication date Apr 29, 2010
- LAM RESEARCH CORPORATION
- Jaroslaw W. Winniczek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON ETCH WITH PASSIVATION USING PLASMA ENHANCED OXIDATION
- Publication number 20100105209
- Publication date Apr 29, 2010
- LAM RESEARCH CORPORATION
- Jaroslaw W. Winniczek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...
- Publication number 20090184089
- Publication date Jul 23, 2009
- LAM RESEARCH CORPORATION
- Robert CHEBI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Variable Volume Plasma Processing Chamber and Associated Methods
- Publication number 20080286489
- Publication date Nov 20, 2008
- LAM RESEARCH CORPORATION
- Ing-Yann Albert Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of etching photoresist on substrates
- Publication number 20080182422
- Publication date Jul 31, 2008
- LAM RESEARCH CORPORATION
- Erik A. Edelberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High chamber temperature process and chamber design for photo-resis...
- Publication number 20080078744
- Publication date Apr 3, 2008
- LAM RESEARCH CORPORATION
- Ing-Yann Albert Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Photoresist stripping chamber and methods of etching photoresist on...
- Publication number 20070264841
- Publication date Nov 15, 2007
- Lam Research Corporation
- Robert P. Chebi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High strip rate downstream chamber
- Publication number 20060219361
- Publication date Oct 5, 2006
- Lam Research Corporation
- Ing-Yann Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of etching photoresist on substrates
- Publication number 20060201911
- Publication date Sep 14, 2006
- Lam Research Corporation
- Erik A. Edelberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Solutions for cleaning silicon semiconductors or silicon oxides
- Publication number 20060073997
- Publication date Apr 6, 2006
- LAM RESEARCH CORPORATION
- Oana Leonte
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of etching photoresist on substrates
- Publication number 20060051965
- Publication date Mar 9, 2006
- Lam Research Corporation
- Erik A. Edelberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of etching photoresist on substrates
- Publication number 20040256357
- Publication date Dec 23, 2004
- Erik A. Edelberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR REDUCING CONTAMINATION OF SEMICONDUCTOR SUBSTRATES
- Publication number 20040137741
- Publication date Jul 15, 2004
- Robert Chebi
- B08 - CLEANING

Robert Chebi

Person

Patents Grantslast 30 patents

Enhanced productivity for an etch system through polymer management

Fabrication of a silicon structure and deep silicon etch with profi...

Elevated surface enhanced Raman spectroscopy resonator structures a...

Surface enhanced raman spectroscopy resonator structures and method...

High frequency filter for improved RF bias signal stability

Fabrication of a silicon structure and deep silicon etch with profi...

Methods for etching a substrate

Silicon etch with passivation using chemical vapor deposition

Method and apparatus for removing photoresist

Silicon etch with passivation using plasma enhanced oxidation

High strip rate downstream chamber

High strip rate downstream chamber

Silicon etch with passivation using plasma enhanced oxidation

Method and apparatus for removing photoresist

Variable volume plasma processing chamber and associated methods

Photoresist stripping chamber and methods of etching photoresist on...

Process for etching dielectric films with improved resist and/or et...

High chamber temperature process and chamber design for photo-resis...

Methods of etching photoresist on substrates

Methods for reducing contamination of semiconductor substrates

Methods for reducing contamination of semiconductor substrates

Apparatus for reducing process drift in inductive coupled plasma et...

Apparatus for reducing process drift in inductive coupled plasma et...

Patents Applicationslast 30 patents

MICROFLUIDIC FILTER DEVICES AND METHODS OF FABRICATING MICROFLUIDIC...

MICROFLUIDIC FILTER DEVICES AND METHODS

Surface Enhanced Raman Spectroscopy (SERS) Structure For Double Res...

Elevated Surface Enhanced Raman Spectroscopy Resonator Structures A...

FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...

Surface Enhanced Raman Spectroscopy Resonator Structures And Method...

ENHANCED PRODUCTIVITY FOR AN ETCH SYSTEM THROUGH POLYMER MANAGEMENT

HIGH STRIP RATE DOWNSTREAM CHAMBER

HIGH FREQUENCY FILTER FOR IMPROVED RF BIAS SIGNAL STABILITY

HIGH STRIP RATE DOWNSTREAM CHAMBER

METHODS AND APPARATUS FOR GAS DELIVERY INTO PLASMA PROCESSING CHAMBERS

METHODS FOR ETCHING A SUBSTRATE

PLASMA PROCESSING APPARATUS WITH REDUCED EFFECTS OF PROCESS CHAMBER...

SILICON ETCH WITH PASSIVATION USING PLASMA ENHANCED OXIDATION

METHOD AND APPARATUS FOR REMOVING PHOTORESIST

Variable Volume Plasma Processing Chamber and Associated Methods

METHOD AND APPARATUS FOR REMOVING PHOTORESIST

SILICON ETCH WITH PASSIVATION USING CHEMICAL VAPOR DEPOSITION

SILICON ETCH WITH PASSIVATION USING PLASMA ENHANCED OXIDATION

FABRICATION OF A SILICON STRUCTURE AND DEEP SILICON ETCH WITH PROFI...

Variable Volume Plasma Processing Chamber and Associated Methods

Methods of etching photoresist on substrates

High chamber temperature process and chamber design for photo-resis...

Photoresist stripping chamber and methods of etching photoresist on...

High strip rate downstream chamber

Methods of etching photoresist on substrates

Solutions for cleaning silicon semiconductors or silicon oxides

Methods of etching photoresist on substrates

Methods of etching photoresist on substrates

METHODS FOR REDUCING CONTAMINATION OF SEMICONDUCTOR SUBSTRATES