Robert Douglas Mohondro

Person

Sykesville, MD, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process for optically erasing charge buildup during fabrication of...
- Patent number 6,803,319
- Issue date Oct 12, 2004
- Axcelis Technologies, Inc.
- Alan C. Janos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for reducing edge roughness in patterned photoresist
- Patent number 6,709,807
- Issue date Mar 23, 2004
- Axcelis Technologies, Inc.
- John S. Hallock
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Process for optically erasing charge buildup during fabrication of...
- Patent number 6,605,484
- Issue date Aug 12, 2003
- Axcelis Technologies, Inc.
- Alan C. Janos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for reducing edge roughness in patterned photoresist
- Patent number 6,582,891
- Issue date Jun 24, 2003
- Axcelis Technologies, Inc.
- John S. Hallock
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
UV assisted chemical modification of photoresist
- Patent number 6,503,693
- Issue date Jan 7, 2003
- Axcelis Technologies, Inc.
- Robert Douglas Mohondro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment of dielectric materials
- Patent number 6,417,115
- Issue date Jul 9, 2002
- Axeclis Technologies, Inc.
- Terrence Alair McDevitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of stripping photoresist using re-coating material
- Patent number 6,406,836
- Issue date Jun 18, 2002
- Axcelis Technologies, Inc.
- Robert Mohondro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controlled amine poisoning for reduced shrinkage of features formed...
- Patent number 6,214,524
- Issue date Apr 10, 2001
- Fusion Systems Corporation
- Robert Douglas Mohondro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controlled shrinkage of photoresist
- Patent number 6,117,622
- Issue date Sep 12, 2000
- Fusion Systems Corporation
- Jeffrey Allan Eisele
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Controlled amine poisoning for reduced shrinkage of features formed...
- Patent number 6,057,084
- Issue date May 2, 2000
- Fusion Systems Corporation
- Robert Douglas Mohondro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROCESS FOR OPTICALLY ERASING CHARGE BUILDUP DURING FABRICATION OF...
- Publication number 20030180976
- Publication date Sep 25, 2003
- Alan C. Janos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for reducing edge roughness in patterned photoresist
- Publication number 20030049571
- Publication date Mar 13, 2003
- Axcelis Technologies, Inc.
- John S. Hallock
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Robert Douglas Mohondro

Person

Patents Grantslast 30 patents

Process for optically erasing charge buildup during fabrication of...

Process for reducing edge roughness in patterned photoresist

Process for optically erasing charge buildup during fabrication of...

Process for reducing edge roughness in patterned photoresist

UV assisted chemical modification of photoresist

Treatment of dielectric materials

Method of stripping photoresist using re-coating material

Controlled amine poisoning for reduced shrinkage of features formed...

Controlled shrinkage of photoresist

Controlled amine poisoning for reduced shrinkage of features formed...

Patents Applicationslast 30 patents

PROCESS FOR OPTICALLY ERASING CHARGE BUILDUP DURING FABRICATION OF...

Process for reducing edge roughness in patterned photoresist