Robert E. Ryan

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Plasma reactor with dynamic RF inductive and capacitive coupling co...
- Patent number 6,447,636
- Issue date Sep 10, 2002
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber having a voltage distribution electrode
- Patent number 6,447,637
- Issue date Sep 10, 2002
- Applied Materials Inc.
- Valentin N. Todorov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Closed-loop dome thermal control apparatus for a semiconductor wafe...
- Patent number 6,367,410
- Issue date Apr 9, 2002
- Applied Materials, Inc.
- Patrick Leahey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with fluid flow regulator
- Patent number 5,883,778
- Issue date Mar 16, 1999
- Applied Materials, Inc.
- Semyon Sherstinsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Focus ring for semiconductor wafer processing in a plasma reactor
- Patent number 5,685,914
- Issue date Nov 11, 1997
- Applied Materials, Inc.
- Graham W. Hills
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barrier seal for electrostatic chuck
- Patent number 5,636,098
- Issue date Jun 3, 1997
- Applied Materials, Inc.
- Joseph Salfelder
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Process chamber having a voltage distribution electrode
- Publication number 20030006009
- Publication date Jan 9, 2003
- APPLIED MATERIALS, INC.
- Valentin N. Todorov
- H01 - BASIC ELECTRIC ELEMENTS