Robert G. O'Neill

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Edge ring arrangement with moveable edge rings
- Patent number 12,027,410
- Issue date Jul 2, 2024
- Lam Research Corporation
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Moveable edge coupling ring for edge process control during semicon...
- Patent number 10,658,222
- Issue date May 19, 2020
- Lam Research Corporation
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating system and method for coating interior fluid wetted surface...
- Patent number 9,873,940
- Issue date Jan 23, 2018
- Lam Research Corporation
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Application of powered electrostatic faraday shield to recondition...
- Patent number 9,767,996
- Issue date Sep 19, 2017
- Lam Research Corporation
- Robert G. O'Neill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dense oxide coated component of a plasma processing chamber and met...
- Patent number 9,546,432
- Issue date Jan 17, 2017
- Lam Research Corporation
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Calculating power input to an array of thermal control elements to...
- Patent number 9,435,692
- Issue date Sep 6, 2016
- Lam Research Corporation
- Ole Waldmann
- G01 - MEASURING TESTING
Information Patent Grant
System, method and apparatus for RF power compensation in plasma et...
- Patent number 9,412,670
- Issue date Aug 9, 2016
- Lam Research Corporation
- Robert G. O'Neill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Corrosion resistant aluminum coating on plasma chamber components
- Patent number 9,337,002
- Issue date May 10, 2016
- Lam Research Corporation
- John Daugherty
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Dense oxide coated component of a plasma processing chamber and met...
- Patent number 9,123,651
- Issue date Sep 1, 2015
- Lam Research Corporation
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for centering wafer on chuck
- Patent number 8,060,330
- Issue date Nov 15, 2011
- Lam Research Corporation
- Robert Griffith O'Neill
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS
- Publication number 20240355667
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS
- Publication number 20210183687
- Publication date Jun 17, 2021
- LAM RESEARCH CORPORATION
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVEABLE EDGE RING DESIGN
- Publication number 20190013232
- Publication date Jan 10, 2019
- LAM RESEARCH CORPORATION
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING SYSTEM AND METHOD FOR COATING INTERIOR FLUID WETTED SURFACE...
- Publication number 20180127868
- Publication date May 10, 2018
- LAM RESEARCH CORPORATION
- Lin XU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPLICATION OF POWERED ELECTROSTATIC FARADAY SHIELD TO RECONDITION...
- Publication number 20170053782
- Publication date Feb 23, 2017
- LAM RESEARCH CORPORATION
- Robert G. O'Neill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVEABLE EDGE COUPLING RING FOR EDGE PROCESS CONTROL DURING SEMICON...
- Publication number 20160211166
- Publication date Jul 21, 2016
- LAM RESEARCH CORPORATION
- Haoquan Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DENSE OXIDE COATED COMPONENT OF A PLASMA PROCESSING CHAMBER AND MET...
- Publication number 20150337450
- Publication date Nov 26, 2015
- LAM RESEARCH CORPORATION
- Hong SHIH
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CALCULATING POWER INPUT TO AN ARRAY OF THERMAL CONTROL ELEMENTS TO...
- Publication number 20150219499
- Publication date Aug 6, 2015
- LAM RESEARCH CORPORATION
- Ole Waldmann
- G01 - MEASURING TESTING
Information Patent Application
COMPONENT OF A PLASMA PROCESSING APPARATUS INCLUDING AN ELECTRICALL...
- Publication number 20150187615
- Publication date Jul 2, 2015
- LAM RESEARCH CORPORATION
- John Daugherty
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
COATING SYSTEM AND METHOD FOR COATING INTERIOR FLUID WETTED SURFACE...
- Publication number 20150184296
- Publication date Jul 2, 2015
- Lam Research Corporation
- Lin Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System, Method and Apparatus for RF Power Compensation in Plasma Et...
- Publication number 20140349417
- Publication date Nov 27, 2014
- LAM RESEARCH CORPORATION
- Robert G. O'Neill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DENSE OXIDE COATED COMPONENT OF A PLASMA PROCESSING CHAMBER AND MET...
- Publication number 20140295670
- Publication date Oct 2, 2014
- LAM RESEARCH CORPORATION
- Hong Shih
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
CORROSION RESISTANT ALUMINUM COATING ON PLASMA CHAMBER COMPONENTS
- Publication number 20140272459
- Publication date Sep 18, 2014
- LAM RESEARCH CORPORATION
- John Daugherty
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
EDGE RING ASSEMBLY FOR PLASMA PROCESSING CHAMBER AND METHOD OF MANU...
- Publication number 20140034242
- Publication date Feb 6, 2014
- LAM RESEARCH CORPORATION
- Sanket P. Sant
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENTS OF PLASMA PROCESSING CHAMBERS HAVING TEXTURED PLASMA RES...
- Publication number 20130102156
- Publication date Apr 25, 2013
- LAM RESEARCH CORPORATION
- Tom Stevenson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Centering Wafer on Chuck
- Publication number 20100150695
- Publication date Jun 17, 2010
- LAM RESEARCH CORPORATION
- Robert Griffith O'Neill
- G01 - MEASURING TESTING

Robert G. O'Neill

Person

Patents Grantslast 30 patents

Edge ring arrangement with moveable edge rings

Moveable edge coupling ring for edge process control during semicon...

Coating system and method for coating interior fluid wetted surface...

Application of powered electrostatic faraday shield to recondition...

Dense oxide coated component of a plasma processing chamber and met...

Calculating power input to an array of thermal control elements to...

System, method and apparatus for RF power compensation in plasma et...

Corrosion resistant aluminum coating on plasma chamber components

Dense oxide coated component of a plasma processing chamber and met...

Method and system for centering wafer on chuck

Patents Applicationslast 30 patents

EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS

EDGE RING ARRANGEMENT WITH MOVEABLE EDGE RINGS

MOVEABLE EDGE RING DESIGN

COATING SYSTEM AND METHOD FOR COATING INTERIOR FLUID WETTED SURFACE...

APPLICATION OF POWERED ELECTROSTATIC FARADAY SHIELD TO RECONDITION...

MOVEABLE EDGE COUPLING RING FOR EDGE PROCESS CONTROL DURING SEMICON...

DENSE OXIDE COATED COMPONENT OF A PLASMA PROCESSING CHAMBER AND MET...

CALCULATING POWER INPUT TO AN ARRAY OF THERMAL CONTROL ELEMENTS TO...

COMPONENT OF A PLASMA PROCESSING APPARATUS INCLUDING AN ELECTRICALL...

COATING SYSTEM AND METHOD FOR COATING INTERIOR FLUID WETTED SURFACE...

System, Method and Apparatus for RF Power Compensation in Plasma Et...

DENSE OXIDE COATED COMPONENT OF A PLASMA PROCESSING CHAMBER AND MET...

CORROSION RESISTANT ALUMINUM COATING ON PLASMA CHAMBER COMPONENTS

EDGE RING ASSEMBLY FOR PLASMA PROCESSING CHAMBER AND METHOD OF MANU...

COMPONENTS OF PLASMA PROCESSING CHAMBERS HAVING TEXTURED PLASMA RES...

Method and System for Centering Wafer on Chuck