Robert J. Kavanagh

Person

Natick, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cyanoadamantyl compounds and polymers
- Patent number 7,309,750
- Issue date Dec 18, 2007
- Rohm and Haas Electronic Materials LLC
- Young C. Bae
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Cyanoadamantyl compounds and polymers and photoresists comprising same
- Patent number 7,270,935
- Issue date Sep 18, 2007
- Rohm and Haas Electronic Materials LLC
- Young C. Bae
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymers, processes for polymer synthesis and photoresist compositions
- Patent number 7,208,261
- Issue date Apr 24, 2007
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Solvents and photoresist compositions for 193 nm imaging
- Patent number 7,205,087
- Issue date Apr 17, 2007
- Shipley Company, L.L.C.
- Robert J. Kavanagh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Copolymers having nitrile and alicyclic leaving groups and photores...
- Patent number 7,090,968
- Issue date Aug 15, 2006
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymers, processes for polymer synthesis and photoresist compositions
- Patent number 6,841,331
- Issue date Jan 11, 2005
- Shipley Company, L.L.C.
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Copolymers having nitrile and alicyclic leaving groups and photores...
- Patent number 6,692,888
- Issue date Feb 17, 2004
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Cyanoadamantyl compounds and polymers
- Publication number 20050208418
- Publication date Sep 22, 2005
- Rohm and Haas Electronic Materials, L.L.C.
- Young C. Bae
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Cyanoadamantyl compounds and polymers and photoresists comprising same
- Publication number 20050208417
- Publication date Sep 22, 2005
- Rohm and Haas Electronic Materials, L.L.C.
- Young C. Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel polymers, processes for polymer synthesis and photoresist com...
- Publication number 20040259025
- Publication date Dec 23, 2004
- Shipley Company, L.L.C.
- George G. Barclay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Copolymers having nitrile and alicyclic leaving groups and photores...
- Publication number 20040076906
- Publication date Apr 22, 2004
- Shipley Company, L.L.C.
- George G. Barclay
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Solvents and photoresist compositions for 193 nm imaging
- Publication number 20040029036
- Publication date Feb 12, 2004
- Shipley Company, L.L.C.
- Robert J. Kavanagh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel polymers, processes for polymer synthesis and photoresist com...
- Publication number 20030027075
- Publication date Feb 6, 2003
- George G. Barclay
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel copolymers and photoresist compositions
- Publication number 20020187420
- Publication date Dec 12, 2002
- Shipley Company, L.L.C.
- George G. Barclay
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Robert J. Kavanagh

Person

Patents Grantslast 30 patents

Cyanoadamantyl compounds and polymers

Cyanoadamantyl compounds and polymers and photoresists comprising same

Polymers, processes for polymer synthesis and photoresist compositions

Solvents and photoresist compositions for 193 nm imaging

Copolymers having nitrile and alicyclic leaving groups and photores...

Polymers, processes for polymer synthesis and photoresist compositions

Copolymers having nitrile and alicyclic leaving groups and photores...

Patents Applicationslast 30 patents

Cyanoadamantyl compounds and polymers

Cyanoadamantyl compounds and polymers and photoresists comprising same

Novel polymers, processes for polymer synthesis and photoresist com...

Copolymers having nitrile and alicyclic leaving groups and photores...

Solvents and photoresist compositions for 193 nm imaging

Novel polymers, processes for polymer synthesis and photoresist com...

Novel copolymers and photoresist compositions