Robert J. Purtell

Person

Mohegan Lake, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Single crystal U-MOS gates using microwave crystal regrowth
- Patent number 8,658,500
- Issue date Feb 25, 2014
- Fairchild Semiconductor Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature dielectric flow using microwaves
- Patent number 8,569,183
- Issue date Oct 29, 2013
- Fairchild Semiconductor Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming nickel silicide with low defect de...
- Patent number 8,298,385
- Issue date Oct 30, 2012
- International Business Machines Corporation
- Keith Kwong Hon Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Structure and method for forming a salicide on the gate electrode o...
- Patent number 8,143,125
- Issue date Mar 27, 2012
- Fairchild Semiconductor Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming nickel silicide with low defect de...
- Patent number 7,759,741
- Issue date Jul 20, 2010
- International Business Machines Corporation
- Keith Kwong Hon Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of base formation in a BiCOMS process
- Patent number 7,696,034
- Issue date Apr 13, 2010
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air break for improved silicide formation with composite caps
- Patent number 7,659,199
- Issue date Feb 9, 2010
- International Business Machines Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improved formation of nickel silicide contacts in semico...
- Patent number 7,622,386
- Issue date Nov 24, 2009
- International Business Machines Corporation
- Anita Madan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming CMOS devices with intrinsically stressed metal...
- Patent number 7,504,336
- Issue date Mar 17, 2009
- International Business Machines Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improved formation of cobalt silicide contacts in semico...
- Patent number 7,485,572
- Issue date Feb 3, 2009
- International Business Machines Corporation
- Anita Madan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming nickel silicide with low defect de...
- Patent number 7,456,095
- Issue date Nov 25, 2008
- International Business Machines Corporation
- Keith Kwong Hon Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Air break for improved silicide formation with composite caps
- Patent number 7,417,290
- Issue date Aug 26, 2008
- International Business Machines Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of base formation in a BiCMOS process
- Patent number 7,390,721
- Issue date Jun 24, 2008
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clustered surface preparation for silicide and metal contacts
- Patent number 7,344,983
- Issue date Mar 18, 2008
- International Business Machines Corporation
- Sadanand V. Deshpande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for reducing dendrite formation in nickel silicon salicide p...
- Patent number 7,320,938
- Issue date Jan 22, 2008
- Internatioanl Business Machines Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for enhanced uni-directional diffusion of metal and subseque...
- Patent number 7,208,414
- Issue date Apr 24, 2007
- International Business Machines Corporation
- Anthony G. Domenicucci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling voiding and bridging in silicide formation
- Patent number 7,129,169
- Issue date Oct 31, 2006
- International Business Machines Corporation
- Bradley P. Jones
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing dendrite formation in nickel silicon salicide p...
- Patent number 7,109,116
- Issue date Sep 19, 2006
- International Business Machines Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure for controlling the interface roughness of cobalt disilicide
- Patent number 7,081,676
- Issue date Jul 25, 2006
- International Business Machines Corporation
- Paul David Agnello
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to build a microfilter
- Patent number 7,081,208
- Issue date Jul 25, 2006
- International Business Machines Corporation
- Kenneth J McCullough
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method of base formation in a BiCMOS process
- Patent number 6,965,133
- Issue date Nov 15, 2005
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of in situ monitoring of supercritical fluid process conditions
- Patent number 6,927,393
- Issue date Aug 9, 2005
- International Business Machines Corporation
- John M. Cotte
- G01 - MEASURING TESTING
Information Patent Grant
Solid CO2 cleaning
- Patent number 6,875,286
- Issue date Apr 5, 2005
- International Business Machines Corporation
- John M. Cotte
- B08 - CLEANING
Information Patent Grant
Method and structure for controlling the interface roughness of cob...
- Patent number 6,809,030
- Issue date Oct 26, 2004
- International Business Machines Corporation
- Paul David Agnello
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method to reduce silicon substrate consumption and im...
- Patent number 6,657,244
- Issue date Dec 2, 2003
- International Business Machines Corporation
- Omer H. Dokumaci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for controlling the interface roughness of cob...
- Patent number 6,440,851
- Issue date Aug 27, 2002
- International Business Machines Corporation
- Paul David Agnello
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal of fluorine or chlorine residue by liquid CO.sub.2
- Patent number 5,976,264
- Issue date Nov 2, 1999
- International Business Machines Corporation
- Kenneth John McCullough
- B08 - CLEANING
Information Patent Grant
Residue removal by supercritical fluids
- Patent number 5,908,510
- Issue date Jun 1, 1999
- International Business Machines Corporation
- Kenneth John McCullough
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
UMOS Semiconductor Devices Formed by Low Temperature Processing
- Publication number 20130224922
- Publication date Aug 29, 2013
- Fairchild Semiconductor Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ESD PROTECTION USING LOW LEAKAGE ZENER DIODES FORMED WITH MICROWAVE...
- Publication number 20130075747
- Publication date Mar 28, 2013
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
U-MOS TRENCH PROFILE OPTIMIZATION AND ETCH DAMAGE REMOVAL USING MIC...
- Publication number 20130023097
- Publication date Jan 24, 2013
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE METHODS AND APPARATUS FOR MICROWAVE CRYSTAL REGROWTH
- Publication number 20130023111
- Publication date Jan 24, 2013
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SINGLE CRYSTAL U-MOS GATES USING MICROWAVE CRYSTAL REGROWTH
- Publication number 20130023096
- Publication date Jan 24, 2013
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UMOS SEMICONDUCTOR DEVICES FORMED BY LOW TEMPERATURE PROCESSING
- Publication number 20120080749
- Publication date Apr 5, 2012
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE MICROWAVE ACTIVATION OF HEAVY BODY IMPLANTS
- Publication number 20120034769
- Publication date Feb 9, 2012
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE TRENCH CONDUCTOR FILL
- Publication number 20120021577
- Publication date Jan 26, 2012
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Temperature Dielectric Flow Using Microwaves
- Publication number 20110212627
- Publication date Sep 1, 2011
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NICKEL-TITANUM CONTACT LAYERS IN SEMICONDUCTOR DEVICES
- Publication number 20110006409
- Publication date Jan 13, 2011
- Michael D. Gruenhagen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure and Method for Forming a Salicide on the Gate Electrode o...
- Publication number 20100244126
- Publication date Sep 30, 2010
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND STRUCTURE FOR SEMICONDUCTOR DEVICES WITH SILICON-GERMANI...
- Publication number 20090152590
- Publication date Jun 18, 2009
- International Business Machines Corporation
- Thomas N. Adam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF SILICIDE FORMATION FOR NANO STRUCTURES
- Publication number 20090029549
- Publication date Jan 29, 2009
- Oh-Jung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF BASE FORMATION IN A BiCMOS PROCESS
- Publication number 20080268604
- Publication date Oct 30, 2008
- International Business Machines Corporation
- Peter J. Geiss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR BREAK FOR IMPROVED SILICIDE FORMATION WITH COMPOSITE CAPS
- Publication number 20080220604
- Publication date Sep 11, 2008
- International Business Machines Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING NICKEL SILICIDE WITH LOW DEFECT DE...
- Publication number 20080164540
- Publication date Jul 10, 2008
- International Business Machines Corporation
- Keith Kwong Hon Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CLUSTERED SURFACE PREPARATION FOR SILICIDE AND METAL CONTACTS
- Publication number 20080156257
- Publication date Jul 3, 2008
- International Business Machines Corporation
- Sadanand V. Deshpande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FORMING NICKEL SILICIDE WITH LOW DEFECT DE...
- Publication number 20080156265
- Publication date Jul 3, 2008
- International Business Machines Corporation
- Keith Kwong Hon Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR IMPROVED FORMATION OF NICKEL SILICIDE CONTACTS IN SEMICO...
- Publication number 20080138985
- Publication date Jun 12, 2008
- International Business Machines Corporation
- Anita Madan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR IMPROVED FORMATION OF COBALT SILICIDE CONTACTS IN SEMICO...
- Publication number 20080124925
- Publication date May 29, 2008
- International Business Machines Corporation
- Anita Madan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICIDE CAP STRUCTURE AND PROCESS FOR REDUCED STRESS AND IMPROVED...
- Publication number 20080020535
- Publication date Jan 24, 2008
- International Business Machines Corporation
- Levent Gulari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND METHOD FOR FORMING CMOS DEVICES WITH INTRINSICALLY ST...
- Publication number 20070269970
- Publication date Nov 22, 2007
- International Business Machines Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR BREAK FOR IMPROVED SILICIDE FORMATION WITH COMPOSITE CAPS
- Publication number 20070161240
- Publication date Jul 12, 2007
- International Business Machines Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ENHANCED UNI-DIRECTIONAL DIFFUSION OF METAL AND SUBSEQUE...
- Publication number 20070128867
- Publication date Jun 7, 2007
- International Business Machines Corporation
- Anthony G. Domenicucci
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO FORM HETEROGENEOUS SILICIDES/GERMANIDES IN CMOS TECHNOLOGY
- Publication number 20070123042
- Publication date May 31, 2007
- International Business Machines Corporation
- Kern Rim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR DEPOSITION & FORMATION OF METAL SILICIDES
- Publication number 20070087541
- Publication date Apr 19, 2007
- Kenneth John Giewont
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FORMING NICKEL SILICIDE WITH LOW DEFECT DE...
- Publication number 20070077760
- Publication date Apr 5, 2007
- International Business Machines Corporation
- Keith Kwong Hon Wong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REDUCING DENDRITE FORMATION IN NICKEL SILICON SALICIDE P...
- Publication number 20070020929
- Publication date Jan 25, 2007
- International Business Machines Corporation
- Robert J. Purtell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLUSTERED SURFACE PREPARATION FOR SILICIDE AND METAL CONTACTS
- Publication number 20060211244
- Publication date Sep 21, 2006
- International Business Machines Corporation
- Sadanand V. Deshpande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICIDE CAP STRUCTURE AND PROCESS FOR REDUCED STRESS AND IMPROVED...
- Publication number 20060163671
- Publication date Jul 27, 2006
- International Business Machines Corporation
- Levent Gulari
- H01 - BASIC ELECTRIC ELEMENTS

Robert J. Purtell

Person

Patents Grantslast 30 patents

Single crystal U-MOS gates using microwave crystal regrowth

Low temperature dielectric flow using microwaves

Method and apparatus for forming nickel silicide with low defect de...

Structure and method for forming a salicide on the gate electrode o...

Method and apparatus for forming nickel silicide with low defect de...

Methods of base formation in a BiCOMS process

Air break for improved silicide formation with composite caps

Method for improved formation of nickel silicide contacts in semico...

Methods for forming CMOS devices with intrinsically stressed metal...

Method for improved formation of cobalt silicide contacts in semico...

Method and apparatus for forming nickel silicide with low defect de...

Air break for improved silicide formation with composite caps

Methods of base formation in a BiCMOS process

Clustered surface preparation for silicide and metal contacts

Method for reducing dendrite formation in nickel silicon salicide p...

Method for enhanced uni-directional diffusion of metal and subseque...

Method for controlling voiding and bridging in silicide formation

Method for reducing dendrite formation in nickel silicon salicide p...

Structure for controlling the interface roughness of cobalt disilicide

Method to build a microfilter

Method of base formation in a BiCMOS process

Method of in situ monitoring of supercritical fluid process conditions

Solid CO2 cleaning

Method and structure for controlling the interface roughness of cob...

Structure and method to reduce silicon substrate consumption and im...

Method and structure for controlling the interface roughness of cob...

Removal of fluorine or chlorine residue by liquid CO.sub.2

Residue removal by supercritical fluids

Patents Applicationslast 30 patents

UMOS Semiconductor Devices Formed by Low Temperature Processing

ESD PROTECTION USING LOW LEAKAGE ZENER DIODES FORMED WITH MICROWAVE...

U-MOS TRENCH PROFILE OPTIMIZATION AND ETCH DAMAGE REMOVAL USING MIC...

LOW TEMPERATURE METHODS AND APPARATUS FOR MICROWAVE CRYSTAL REGROWTH

SINGLE CRYSTAL U-MOS GATES USING MICROWAVE CRYSTAL REGROWTH

UMOS SEMICONDUCTOR DEVICES FORMED BY LOW TEMPERATURE PROCESSING

LOW TEMPERATURE MICROWAVE ACTIVATION OF HEAVY BODY IMPLANTS

GATE TRENCH CONDUCTOR FILL

Low Temperature Dielectric Flow Using Microwaves

NICKEL-TITANUM CONTACT LAYERS IN SEMICONDUCTOR DEVICES

Structure and Method for Forming a Salicide on the Gate Electrode o...

METHOD AND STRUCTURE FOR SEMICONDUCTOR DEVICES WITH SILICON-GERMANI...

METHOD OF SILICIDE FORMATION FOR NANO STRUCTURES

METHODS OF BASE FORMATION IN A BiCMOS PROCESS

AIR BREAK FOR IMPROVED SILICIDE FORMATION WITH COMPOSITE CAPS

METHOD AND APPARATUS FOR FORMING NICKEL SILICIDE WITH LOW DEFECT DE...

CLUSTERED SURFACE PREPARATION FOR SILICIDE AND METAL CONTACTS

METHOD AND APPARATUS FOR FORMING NICKEL SILICIDE WITH LOW DEFECT DE...

METHOD FOR IMPROVED FORMATION OF NICKEL SILICIDE CONTACTS IN SEMICO...

METHOD FOR IMPROVED FORMATION OF COBALT SILICIDE CONTACTS IN SEMICO...

SILICIDE CAP STRUCTURE AND PROCESS FOR REDUCED STRESS AND IMPROVED...

STRUCTURE AND METHOD FOR FORMING CMOS DEVICES WITH INTRINSICALLY ST...

AIR BREAK FOR IMPROVED SILICIDE FORMATION WITH COMPOSITE CAPS

METHOD FOR ENHANCED UNI-DIRECTIONAL DIFFUSION OF METAL AND SUBSEQUE...

METHODS TO FORM HETEROGENEOUS SILICIDES/GERMANIDES IN CMOS TECHNOLOGY

METHOD AND APPARATUS FOR DEPOSITION & FORMATION OF METAL SILICIDES

METHOD AND APPARATUS FOR FORMING NICKEL SILICIDE WITH LOW DEFECT DE...

METHOD FOR REDUCING DENDRITE FORMATION IN NICKEL SILICON SALICIDE P...

CLUSTERED SURFACE PREPARATION FOR SILICIDE AND METAL CONTACTS

SILICIDE CAP STRUCTURE AND PROCESS FOR REDUCED STRESS AND IMPROVED...