Robert J. Steger

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Technique for improving chucking reproducibility
- Patent number 6,858,265
- Issue date Feb 22, 2005
- Applied Materials, Inc.
- Fred C. Redeker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck having composite dielectric layer and method of...
- Patent number 6,721,162
- Issue date Apr 13, 2004
- Applied Materials Inc.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dielectric covered electrostatic chuck
- Patent number 6,414,834
- Issue date Jul 2, 2002
- Applied Materials, Inc.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric tunable inductively coupled HDP-CVD reactor
- Patent number 6,170,428
- Issue date Jan 9, 2001
- Applied Materials, Inc.
- Fred C. Redeker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck having improved gas conduits
- Patent number 6,108,189
- Issue date Aug 22, 2000
- Applied Materials, Inc.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conduits for flow of heat transfer fluid to the surface of an elect...
- Patent number 5,904,776
- Issue date May 18, 1999
- Applied Materials, Inc.
- Arik Donde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for cleaning of semiconductor process chamber...
- Patent number 5,788,799
- Issue date Aug 4, 1998
- Applied Materials, Inc.
- Robert J. Steger
- B08 - CLEANING
Information Patent Grant
Apparatus and method for transferring heat from a hot electrostatic...
- Patent number 5,730,803
- Issue date Mar 24, 1998
- Applied Materials, Inc.
- Robert Steger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conduits for flow of heat transfer fluid to the surface of an elect...
- Patent number 5,720,818
- Issue date Feb 24, 1998
- Applied Materials, Inc.
- Arik Donde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and structure for improving gas breakdown resistance and red...
- Patent number 5,715,132
- Issue date Feb 3, 1998
- Applied Materials, Inc.
- Robert J. Steger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and structure for improving gas breakdown resistance and red...
- Patent number 5,644,467
- Issue date Jul 1, 1997
- Applied Materials, Inc.
- Robert J. Steger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for supporting a wafer in a combined wafer support and tempe...
- Patent number 5,567,909
- Issue date Oct 22, 1996
- Applied Materials Inc.
- Michael N. Sugarman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for altering magnetic coil current to produce...
- Patent number 5,534,108
- Issue date Jul 9, 1996
- Applied Materials, Inc.
- Xue-Yu Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck having a grooved surface
- Patent number 5,522,131
- Issue date Jun 4, 1996
- Applied Materials, Inc.
- Robert J. Steger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling plasma particulates by contouring the plasma sheath usi...
- Patent number 5,494,523
- Issue date Feb 27, 1996
- Applied Materials, Inc.
- Robert J. Steger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Combined wafer support and temperature monitoring device
- Patent number 5,356,486
- Issue date Oct 18, 1994
- Applied Materials, Inc.
- Michael N. Sugarman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity for magnetically enhanced plasma chambers
- Patent number 5,308,417
- Issue date May 3, 1994
- Applied Materials, Inc.
- David W. Groechel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus with conductive means for inhibiting arcing
- Patent number 5,292,399
- Issue date Mar 8, 1994
- Applied Materials, Inc.
- Terrance Y. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming plasma etch apparatus with conductive coating on...
- Patent number 5,268,200
- Issue date Dec 7, 1993
- Applied Materials, Inc.
- Robert J. Steger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor wafer transfer in processing systems
- Patent number 5,100,502
- Issue date Mar 31, 1992
- Applied Materials, Inc.
- Steven C. Murdoch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch apparatus with conductive coating on inner metal surfac...
- Patent number 5,085,727
- Issue date Feb 4, 1992
- Applied Materials, Inc.
- Robert J. Steger
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Electrostatic chuck having dielectric member with stacked layers an...
- Publication number 20040190215
- Publication date Sep 30, 2004
- APPLIED MATERIALS, INC.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Technique for improving chucking reproducibility
- Publication number 20030180459
- Publication date Sep 25, 2003
- APPLIED MATERIALS, INC.
- Fred C. Redeker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrostatic chuck having composite dielectric layer and method of...
- Publication number 20020135969
- Publication date Sep 26, 2002
- APPLIED MATERIALS, INC.
- Edwin C. Weldon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Robert J. Steger

Person

Patents Grantslast 30 patents

Technique for improving chucking reproducibility

Electrostatic chuck having composite dielectric layer and method of...

Dielectric covered electrostatic chuck

Symmetric tunable inductively coupled HDP-CVD reactor

Electrostatic chuck having improved gas conduits

Conduits for flow of heat transfer fluid to the surface of an elect...

Apparatus and method for cleaning of semiconductor process chamber...

Apparatus and method for transferring heat from a hot electrostatic...

Conduits for flow of heat transfer fluid to the surface of an elect...

Method and structure for improving gas breakdown resistance and red...

Method and structure for improving gas breakdown resistance and red...

Method for supporting a wafer in a combined wafer support and tempe...

Method and apparatus for altering magnetic coil current to produce...

Electrostatic chuck having a grooved surface

Controlling plasma particulates by contouring the plasma sheath usi...

Combined wafer support and temperature monitoring device

Uniformity for magnetically enhanced plasma chambers

Plasma etching apparatus with conductive means for inhibiting arcing

Method of forming plasma etch apparatus with conductive coating on...

Semiconductor wafer transfer in processing systems

Plasma etch apparatus with conductive coating on inner metal surfac...

Patents Applicationslast 30 patents

Electrostatic chuck having dielectric member with stacked layers an...

Technique for improving chucking reproducibility

Electrostatic chuck having composite dielectric layer and method of...