Robert Jacques

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of timing laser beam pulses to regulate extreme ultraviolet...
- Patent number 8,872,123
- Issue date Oct 28, 2014
- ASML Netherlands B.V.
- James Crouch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Multi-chamber gas discharge laser bandwidth control through dischar...
- Patent number 8,102,889
- Issue date Jan 24, 2012
- Cymer, Inc.
- Robert N. Jacques
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active spectral control of DUV laser light source
- Patent number 8,098,698
- Issue date Jan 17, 2012
- Cymer, Inc.
- Wayne J. Dunstan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control system for a two chamber gas discharge laser system
- Patent number RE42588
- Issue date Aug 2, 2011
- Cymer, Inc.
- John P. Fallon
- 372 - Coherent light generators
Information Patent Grant
Active spectral control of DUV light source
- Patent number 7,852,889
- Issue date Dec 14, 2010
- Cymer, Inc.
- Wayne J. Dunstan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser gas injection system
- Patent number 7,835,414
- Issue date Nov 16, 2010
- Cymer, Inc.
- Wayne J. Dunstan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultraviolet laser light source pulse energy control system
- Patent number 7,830,942
- Issue date Nov 9, 2010
- Cymer, Inc.
- Wayne J. Dunstan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-chamber gas discharge laser bandwidth control through dischar...
- Patent number 7,830,934
- Issue date Nov 9, 2010
- Cymer, Inc.
- Robert N. Jacques
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for stabilizing and tuning the bandwidth of la...
- Patent number 7,822,084
- Issue date Oct 26, 2010
- Cymer, Inc.
- Kevin M. O'Brien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for laser control in a two chamber gas dischar...
- Patent number 7,756,171
- Issue date Jul 13, 2010
- Cymer, Inc.
- Robert N. Jacques
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for laser control in a two chamber gas dischar...
- Patent number 7,751,453
- Issue date Jul 6, 2010
- Cymer, Inc.
- Robert N. Jacques
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-chambered excimer or molecular fluorine gas discharge laser f...
- Patent number 7,741,639
- Issue date Jun 22, 2010
- Cymer, Inc.
- Herve A. Besaucele
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for laser control in a two chamber gas dischar...
- Patent number 7,720,120
- Issue date May 18, 2010
- Cymer, Inc.
- Robert N. Jacques
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for gas discharge laser bandwidth and center w...
- Patent number 7,643,522
- Issue date Jan 5, 2010
- Cymer, Inc.
- Fedor B. Trintchouk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion lithography laser light source with pulse stretcher
- Patent number 7,643,528
- Issue date Jan 5, 2010
- Cymer, Inc.
- William N. Partlo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control system for a two chamber gas discharge laser
- Patent number 7,596,164
- Issue date Sep 29, 2009
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser spectral engineering for lithographic process
- Patent number 7,382,815
- Issue date Jun 3, 2008
- Cymer, Inc.
- Ronald L. Spangler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser spectral engineering for lithographic process
- Patent number 7,298,770
- Issue date Nov 20, 2007
- Cymer, Inc.
- Ronald L. Spangler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV light source
- Patent number 7,164,144
- Issue date Jan 16, 2007
- Cymer Inc.
- William N. Partlo
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Tuning control parameters of vibration reduction and motion control...
- Patent number 7,158,840
- Issue date Jan 2, 2007
- Cymer, Inc.
- Robert Jacques
- G05 - CONTROLLING REGULATING
Information Patent Grant
Laser output light pulse beam parameter transient correction system
- Patent number 7,116,695
- Issue date Oct 3, 2006
- Cymer, Inc.
- Robert N. Jacques
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High repetition rate laser produced plasma EUV light source
- Patent number 7,087,914
- Issue date Aug 8, 2006
- Cymer, Inc.
- Robert P. Akins
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Control system for a two chamber gas discharge laser
- Patent number 7,079,564
- Issue date Jul 18, 2006
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control system for a two chamber gas discharge laser
- Patent number 7,039,086
- Issue date May 2, 2006
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for vibration control
- Patent number 6,959,484
- Issue date Nov 1, 2005
- Cymer, Inc.
- Ronald Spangler
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Vibration control utilizing signal detrending
- Patent number 6,872,961
- Issue date Mar 29, 2005
- Cymer, Inc.
- Robert N. Jacques
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Laser spectral engineering for lithographic process
- Patent number 6,853,653
- Issue date Feb 8, 2005
- Cymer, Inc.
- Ronald L. Spangler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control system for a two chamber gas discharge laser
- Patent number 6,690,704
- Issue date Feb 10, 2004
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser wavelength control unit with piezoelectric driver
- Patent number 6,650,666
- Issue date Nov 18, 2003
- Cymer, Inc.
- Ronald L. Spangler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shoe with quick tightening upper
- Patent number 6,598,322
- Issue date Jul 29, 2003
- Cymer, Inc.
- Robert N. Jacques
- A43 - FOOTWEAR

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR LASER-TO-DROPLET ALIGNMENT
- Publication number 20230269858
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Poorya Haghi
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet...
- Publication number 20140191133
- Publication date Jul 10, 2014
- Cymer, Inc.
- James Crouch
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Active spectral control of DUV laser light source
- Publication number 20110051760
- Publication date Mar 3, 2011
- Cymer, Inc.
- Wayne J. Dunstan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-chamber gas discharge laser bandwidth control through dischar...
- Publication number 20100309939
- Publication date Dec 9, 2010
- Cymer, Inc.
- Robert N. Jacques
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Laser Control in a Two Chamber Gas Dischar...
- Publication number 20100098122
- Publication date Apr 22, 2010
- Robert N. Jacques
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR LASER CONTROL IN A TWO CHAMBER GAS DISCHAR...
- Publication number 20100098124
- Publication date Apr 22, 2010
- Robert N. Jacques
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR LASER CONTROL IN A TWO CHAMBER GAS DISCHAR...
- Publication number 20100098123
- Publication date Apr 22, 2010
- Robert N. Jacques
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithography laser light source with pulse stretcher
- Publication number 20100074295
- Publication date Mar 25, 2010
- Cymer, Inc.
- William N. Partlo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion lithography laser light source with pulse stretcher
- Publication number 20090080476
- Publication date Mar 26, 2009
- Cymer, Inc.
- William N. Partlo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ultraviolet laser light source pulse energy control system
- Publication number 20090067457
- Publication date Mar 12, 2009
- Cymer, Inc.
- Wayne J. Dunstan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for stabilizing and tuning the bandwidth of la...
- Publication number 20080232408
- Publication date Sep 25, 2008
- Cymer, Inc.
- Kevin M. O'Brien
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Laser gas injection system
- Publication number 20080205472
- Publication date Aug 28, 2008
- Cymer, Inc.
- Wayne J. Dunstan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High repetition rate laser produced plasma EUV light source
- Publication number 20080197297
- Publication date Aug 21, 2008
- Robert P. Akins
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Active spectral control of DUV light source
- Publication number 20070195836
- Publication date Aug 23, 2007
- Cymer, Inc.
- Wayne J. Dunstan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Control system for a two chamber gas discharge laser
- Publication number 20060209917
- Publication date Sep 21, 2006
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-chamber gas discharge laser bandwidth control through dischar...
- Publication number 20060146900
- Publication date Jul 6, 2006
- Cymer, Inc.
- Robert N. Jacques
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for gas discharge laser bandwidth and center w...
- Publication number 20060114958
- Publication date Jun 1, 2006
- Cymer, Inc.
- Fedor B. Trintchouk
- B82 - NANO-TECHNOLOGY
Information Patent Application
Laser output light pulse beam parameter transient correction system
- Publication number 20060072636
- Publication date Apr 6, 2006
- Robert N. Jacques
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Control system for a two chamber gas discharge laser
- Publication number 20050265417
- Publication date Dec 1, 2005
- Cymer, Inc.
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High repetition rate laser produced plasma EUV light source
- Publication number 20050205810
- Publication date Sep 22, 2005
- Robert P. Akins
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV light source
- Publication number 20050199829
- Publication date Sep 15, 2005
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method and device for vibration control
- Publication number 20050200243
- Publication date Sep 15, 2005
- Active Control Experts, Inc.
- Ronald Spangler
- G05 - CONTROLLING REGULATING
Information Patent Application
Multi-chambered excimer or molecular fluorine gas discharge laser f...
- Publication number 20050094698
- Publication date May 5, 2005
- Herve A. Besaucele
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laser spectral engineering for lithographic process
- Publication number 20050068997
- Publication date Mar 31, 2005
- Cymer, Inc.
- Ronald L. Spangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Laser spectral engineering for lithographic process
- Publication number 20050041701
- Publication date Feb 24, 2005
- Ronald L. Spangler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Control system for a two chamber gas discharge laser
- Publication number 20040057489
- Publication date Mar 25, 2004
- John P. Fallon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Vibration control utilizing signal detrending
- Publication number 20030041447
- Publication date Mar 6, 2003
- Robert N. Jacques
- G05 - CONTROLLING REGULATING
Information Patent Application
Control system for a two chamber gas discharge laser
- Publication number 20030031216
- Publication date Feb 13, 2003
- John P. Fallon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Tuning control parameters of vibration reduction and motion control...
- Publication number 20030028266
- Publication date Feb 6, 2003
- Robert Jacques
- G05 - CONTROLLING REGULATING
Information Patent Application
Laser spectral engineering for lithographic process
- Publication number 20020167975
- Publication date Nov 14, 2002
- Ronald L. Spangler
- H01 - BASIC ELECTRIC ELEMENTS

Robert Jacques

Person

Patents Grantslast 30 patents

Method of timing laser beam pulses to regulate extreme ultraviolet...

Multi-chamber gas discharge laser bandwidth control through dischar...

Active spectral control of DUV laser light source

Control system for a two chamber gas discharge laser system

Active spectral control of DUV light source

Laser gas injection system

Ultraviolet laser light source pulse energy control system

Multi-chamber gas discharge laser bandwidth control through dischar...

Method and apparatus for stabilizing and tuning the bandwidth of la...

Method and apparatus for laser control in a two chamber gas dischar...

Method and apparatus for laser control in a two chamber gas dischar...

Multi-chambered excimer or molecular fluorine gas discharge laser f...

Method and apparatus for laser control in a two chamber gas dischar...

Method and apparatus for gas discharge laser bandwidth and center w...

Immersion lithography laser light source with pulse stretcher

Control system for a two chamber gas discharge laser

Laser spectral engineering for lithographic process

Laser spectral engineering for lithographic process

EUV light source

Tuning control parameters of vibration reduction and motion control...

Laser output light pulse beam parameter transient correction system

High repetition rate laser produced plasma EUV light source

Control system for a two chamber gas discharge laser

Control system for a two chamber gas discharge laser

System for vibration control

Vibration control utilizing signal detrending

Laser spectral engineering for lithographic process

Control system for a two chamber gas discharge laser

Laser wavelength control unit with piezoelectric driver

Shoe with quick tightening upper

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR LASER-TO-DROPLET ALIGNMENT

Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet...

Active spectral control of DUV laser light source

Multi-chamber gas discharge laser bandwidth control through dischar...

Method and Apparatus for Laser Control in a Two Chamber Gas Dischar...

METHOD AND APPARATUS FOR LASER CONTROL IN A TWO CHAMBER GAS DISCHAR...

METHOD AND APPARATUS FOR LASER CONTROL IN A TWO CHAMBER GAS DISCHAR...

Immersion lithography laser light source with pulse stretcher

Immersion lithography laser light source with pulse stretcher

Ultraviolet laser light source pulse energy control system

Method and apparatus for stabilizing and tuning the bandwidth of la...

Laser gas injection system

High repetition rate laser produced plasma EUV light source

Active spectral control of DUV light source

Control system for a two chamber gas discharge laser

Multi-chamber gas discharge laser bandwidth control through dischar...

Method and apparatus for gas discharge laser bandwidth and center w...

Laser output light pulse beam parameter transient correction system

Control system for a two chamber gas discharge laser

High repetition rate laser produced plasma EUV light source

EUV light source

Method and device for vibration control

Multi-chambered excimer or molecular fluorine gas discharge laser f...

Laser spectral engineering for lithographic process

Laser spectral engineering for lithographic process

Control system for a two chamber gas discharge laser

Vibration control utilizing signal detrending

Control system for a two chamber gas discharge laser

Tuning control parameters of vibration reduction and motion control...

Laser spectral engineering for lithographic process