Robert Jay Rafac

Person

Encinitas, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Laser system for source material conditioning in an EUV light source
- Patent number 12,369,244
- Issue date Jul 22, 2025
- ASML Netherlands B.V.
- Igor Vladimirovich Fomenkov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source target metrology
- Patent number 12,238,848
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser system for target metrology and alteration in an EUV light so...
- Patent number 12,078,934
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining moving properties of a target in an extreme ultraviolet...
- Patent number 11,758,639
- Issue date Sep 12, 2023
- ASML Netherlands B.V.
- Robert Jay Rafac
- G01 - MEASURING TESTING
Information Patent Grant
System for monitoring a plasma
- Patent number 11,266,002
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target expansion rate control in an extreme ultraviolet light source
- Patent number 11,096,266
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Reducing the effect of plasma on an object in an extreme ultraviole...
- Patent number 10,904,993
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target expansion rate control in an extreme ultraviolet light source
- Patent number 10,674,591
- Issue date Jun 2, 2020
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source
- Patent number 10,667,377
- Issue date May 26, 2020
- ASML Netherlands B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavelength-based optical filtering
- Patent number 10,663,866
- Issue date May 26, 2020
- ASML Netherlands B.V.
- Alexander Anthony Schafgans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compensating for a physical effect in an optical system
- Patent number 10,401,704
- Issue date Sep 3, 2019
- ASML Netherlands B.V.
- Robert Jay Rafac
- G02 - OPTICS
Information Patent Grant
Reducing the effect of plasma on an object in an extreme ultraviole...
- Patent number 10,349,509
- Issue date Jul 9, 2019
- ASML Netherlands B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target expansion rate control in an extreme ultraviolet light source
- Patent number 10,314,153
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods for controlling EUV energy generation using pul...
- Patent number 9,980,359
- Issue date May 22, 2018
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV LPP source with dose control and laser stabilization using vari...
- Patent number 9,832,852
- Issue date Nov 28, 2017
- ASML Netherlands B.V.
- Igor V. Fomenkov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for stabilization of droplet-plasma interaction...
- Patent number 9,832,854
- Issue date Nov 28, 2017
- ASML Netherlands B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Grant
Target expansion rate control in an extreme ultraviolet light source
- Patent number 9,820,368
- Issue date Nov 14, 2017
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Polarization control of pulsed light beam
- Patent number 9,709,897
- Issue date Jul 18, 2017
- Cymer, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stabilizing EUV light power in an extreme ultraviolet light source
- Patent number 9,713,240
- Issue date Jul 18, 2017
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Variable radius mirror dichroic beam splitter module for extreme ul...
- Patent number 9,516,729
- Issue date Dec 6, 2016
- ASML Netherlands B.V.
- Kevin W Zhang
- G02 - OPTICS
Information Patent Grant
Target for extreme ultraviolet light source
- Patent number 9,462,668
- Issue date Oct 4, 2016
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System and method for controlling source laser firing in an LPP EUV...
- Patent number 9,426,872
- Issue date Aug 23, 2016
- ASML Netherlands B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Regenerative ring resonator
- Patent number RE45957
- Issue date Mar 29, 2016
- Cymer, LLC
- Hong Ye
- 001 -
Information Patent Grant
Calibration of photoelectromagnetic sensor in a laser source
- Patent number 9,239,268
- Issue date Jan 19, 2016
- ASML Netherlands B.V.
- Rong Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Calibration of photoelectromagnetic sensor in a laser source
- Patent number 9,239,269
- Issue date Jan 19, 2016
- ASML Netherlands B.V.
- Rong Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Extreme ultraviolet light source
- Patent number 9,232,623
- Issue date Jan 5, 2016
- ASML Netherlands B.V.
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for laser produced plasma extreme ultraviolet light source
- Patent number 9,232,624
- Issue date Jan 5, 2016
- ASML Netherlands B.V.
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for extreme ultraviolet light source
- Patent number 9,155,179
- Issue date Oct 6, 2015
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for laser produced plasma extreme ultraviolet light source
- Patent number 9,107,279
- Issue date Aug 11, 2015
- ASML Netherlands B.V.
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV LIGHT SOURCE TARGET METROLOGY
- Publication number 20230300965
- Publication date Sep 21, 2023
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE
- Publication number 20220192000
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Igor Vladimirovich Fomenkov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR MONITORING A PLASMA
- Publication number 20220151052
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Michael Anthony Purvis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING MOVING PROPERTIES OF A TARGET IN AN EXTREME ULTRAVIOLET...
- Publication number 20220086998
- Publication date Mar 17, 2022
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G01 - MEASURING TESTING
Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20210263422
- Publication date Aug 26, 2021
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEM FOR MONITORING A PLASMA
- Publication number 20200344868
- Publication date Oct 29, 2020
- ASML NETHERLANDS B.V.
- Michael Anthony Purvis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20200260564
- Publication date Aug 13, 2020
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...
- Publication number 20190274210
- Publication date Sep 5, 2019
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20190254152
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...
- Publication number 20180343730
- Publication date Nov 29, 2018
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
COMPENSATING FOR A PHYSICAL EFFECT IN AN OPTICAL SYSTEM
- Publication number 20180136541
- Publication date May 17, 2018
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G02 - OPTICS
Information Patent Application
TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20180139831
- Publication date May 17, 2018
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
WAVELENGTH-BASED OPTICAL FILTERING
- Publication number 20180081280
- Publication date Mar 22, 2018
- ASML NETHERLANDS B.V.
- Alexander Anthony Schafgans
- G02 - OPTICS
Information Patent Application
REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...
- Publication number 20170311429
- Publication date Oct 26, 2017
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
POLARIZATION CONTROL OF PULSED LIGHT BEAM
- Publication number 20170123324
- Publication date May 4, 2017
- CYMER, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR STABILIZATION OF DROPLET-PLASMA INTERACTION...
- Publication number 20170048959
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- G01 - MEASURING TESTING
Information Patent Application
Target Expansion Rate Control in an Extreme Ultraviolet Light Source
- Publication number 20170048957
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SYSTEMS AND METHODS FOR CONTROLLING EUV ENERGY GENERATION USING PUL...
- Publication number 20170048960
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Stabilizing EUV Light Power in an Extreme Ultraviolet Light Source
- Publication number 20170048958
- Publication date Feb 16, 2017
- ASML NETHERLANDS B.V.
- Daniel Jason Riggs
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20160192468
- Publication date Jun 30, 2016
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Variable Radius Mirror Dichroic Beam Splitter Module for Extreme Ul...
- Publication number 20160174351
- Publication date Jun 16, 2016
- ASML NETHERLANDS B.V.
- Kevin W. Zhang
- G02 - OPTICS
Information Patent Application
TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20160029471
- Publication date Jan 28, 2016
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE
- Publication number 20160011056
- Publication date Jan 14, 2016
- ASML NETHERLANDS B.V.
- Rong Liu
- G01 - MEASURING TESTING
Information Patent Application
CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE
- Publication number 20160011057
- Publication date Jan 14, 2016
- ASML NETHERLANDS B.V.
- Rong Liu
- G01 - MEASURING TESTING
Information Patent Application
TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150342016
- Publication date Nov 26, 2015
- ASML NETHERLANDS B.V.
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150208494
- Publication date Jul 23, 2015
- ASML NETHERLANDS B.V.
- Robert J. Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150189729
- Publication date Jul 2, 2015
- ASML NETHERLANDS B.V.
- Robert J. Rafac
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150076374
- Publication date Mar 19, 2015
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20140299791
- Publication date Oct 9, 2014
- Yezheng Tao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Robert Jay Rafac

Person

Patents Grantslast 30 patents

Laser system for source material conditioning in an EUV light source

EUV light source target metrology

System for monitoring a plasma

Laser system for target metrology and alteration in an EUV light so...

Determining moving properties of a target in an extreme ultraviolet...

System for monitoring a plasma

Target expansion rate control in an extreme ultraviolet light source

Reducing the effect of plasma on an object in an extreme ultraviole...

Target expansion rate control in an extreme ultraviolet light source

Extreme ultraviolet light source

Wavelength-based optical filtering

Compensating for a physical effect in an optical system

Reducing the effect of plasma on an object in an extreme ultraviole...

Target expansion rate control in an extreme ultraviolet light source

Systems and methods for controlling EUV energy generation using pul...

EUV LPP source with dose control and laser stabilization using vari...

Systems and methods for stabilization of droplet-plasma interaction...

Target expansion rate control in an extreme ultraviolet light source

Polarization control of pulsed light beam

Stabilizing EUV light power in an extreme ultraviolet light source

Variable radius mirror dichroic beam splitter module for extreme ul...

Target for extreme ultraviolet light source

System and method for controlling source laser firing in an LPP EUV...

Regenerative ring resonator

Calibration of photoelectromagnetic sensor in a laser source

Calibration of photoelectromagnetic sensor in a laser source

Extreme ultraviolet light source

Target for laser produced plasma extreme ultraviolet light source

Target for extreme ultraviolet light source

Target for laser produced plasma extreme ultraviolet light source

Patents Applicationslast 30 patents

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

EUV LIGHT SOURCE TARGET METROLOGY

LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE

SYSTEM FOR MONITORING A PLASMA

DETERMINING MOVING PROPERTIES OF A TARGET IN AN EXTREME ULTRAVIOLET...

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

SYSTEM FOR MONITORING A PLASMA

TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE

REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...

TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE

REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...

COMPENSATING FOR A PHYSICAL EFFECT IN AN OPTICAL SYSTEM

TARGET EXPANSION RATE CONTROL IN AN EXTREME ULTRAVIOLET LIGHT SOURCE

WAVELENGTH-BASED OPTICAL FILTERING

REDUCING THE EFFECT OF PLASMA ON AN OBJECT IN AN EXTREME ULTRAVIOLE...

POLARIZATION CONTROL OF PULSED LIGHT BEAM

SYSTEMS AND METHODS FOR STABILIZATION OF DROPLET-PLASMA INTERACTION...

Target Expansion Rate Control in an Extreme Ultraviolet Light Source

SYSTEMS AND METHODS FOR CONTROLLING EUV ENERGY GENERATION USING PUL...

Stabilizing EUV Light Power in an Extreme Ultraviolet Light Source

EXTREME ULTRAVIOLET LIGHT SOURCE

Variable Radius Mirror Dichroic Beam Splitter Module for Extreme Ul...

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE

CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE

CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE

TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE

EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE