Robert John O'Donnell

Person

San Francisco, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Using identifiers to map edge ring part numbers onto slot numbers
- Patent number 10,651,097
- Issue date May 12, 2020
- Lam Research Corporation
- Evelio Sevillano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low contamination components for semiconductor processing apparatus...
- Patent number 8,935,990
- Issue date Jan 20, 2015
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ reclaim of volatile components
- Patent number 8,637,408
- Issue date Jan 28, 2014
- Lam Research Corporation
- Robert O'Donnell
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Reduction of entrance and exit marks left by a substrate-processing...
- Patent number 8,623,152
- Issue date Jan 7, 2014
- Lam Research Corporation
- Robert O'Donnell
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Carrier for reducing entrance and/or exit marks left by a substrate...
- Patent number 8,534,303
- Issue date Sep 17, 2013
- Lam Research Corporation
- Robert O'Donnell
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Corrosion resistant component of semiconductor processing equipment...
- Patent number 8,486,841
- Issue date Jul 16, 2013
- Lam Research Corporation
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of entrance and exit marks left by a substrate-processing...
- Patent number 8,317,932
- Issue date Nov 27, 2012
- Lam Research Corporation
- Robert O'Donnell
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Low contamination components for semiconductor processing apparatus...
- Patent number 8,318,327
- Issue date Nov 27, 2012
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System, method and apparatus for maintaining separation of liquids...
- Patent number 8,313,582
- Issue date Nov 20, 2012
- Lam Research Corporation
- Robert O'Donnell
- B08 - CLEANING
Information Patent Grant
In-situ reclaim of volatile components
- Patent number 8,309,470
- Issue date Nov 13, 2012
- Lam Research Corporation
- Robert O'Donnell
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
System, method and apparatus for maintaining separation of liquids...
- Patent number 8,141,566
- Issue date Mar 27, 2012
- Lam Research Corporation
- Robert O'Donnell
- B08 - CLEANING
Information Patent Grant
Carrier for reducing entrance and/or exit marks left by a substrate...
- Patent number 8,105,441
- Issue date Jan 31, 2012
- Lam Research Corporation
- Robert O'Donnell
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Carrier for reducing entrance and/or exit marks left by a substrate...
- Patent number 7,946,303
- Issue date May 24, 2011
- Lam Research Corporation
- Robert O'Donnell
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Reduction of entrance and exit marks left by a substrate-processing...
- Patent number 7,703,462
- Issue date Apr 27, 2010
- Lam Research Corporation
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Corrosion resistant component of semiconductor processing equipment...
- Patent number 7,605,086
- Issue date Oct 20, 2009
- Lam Research Corporation
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solidifying layer for wafer cleaning
- Patent number 7,503,977
- Issue date Mar 17, 2009
- Lam Research Corporation
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for utilizing a meniscus in substrate processing
- Patent number 7,363,727
- Issue date Apr 29, 2008
- Lam Research Corporation
- Robert J. O'Donnell
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Productivity enhancing thermal sprayed yttria-containing coating fo...
- Patent number 7,311,797
- Issue date Dec 25, 2007
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Productivity enhancing thermal sprayed yttria-containing coating fo...
- Patent number 7,300,537
- Issue date Nov 27, 2007
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for simulating standard test wafers
- Patent number 7,270,760
- Issue date Sep 18, 2007
- Lam Research Corporation
- Gregory J. Goldspring
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Zirconia toughened ceramic components and coatings in semiconductor...
- Patent number 7,255,898
- Issue date Aug 14, 2007
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Corrosion resistant component of semiconductor processing equipment...
- Patent number 7,128,804
- Issue date Oct 31, 2006
- Lam Research Corporation
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for utilizing a meniscus in substrate processing
- Patent number 7,093,375
- Issue date Aug 22, 2006
- Lam Research Corporation
- Robert J. O'Donnell
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Phobic barrier meniscus separation and containment
- Patent number 6,988,326
- Issue date Jan 24, 2006
- Lam Research Corporation
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Concentric proximity processing head
- Patent number 6,954,993
- Issue date Oct 18, 2005
- Lam Research Corporation
- Michael G. R. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insitu post etch process to remove remaining photoresist and residu...
- Patent number 6,852,636
- Issue date Feb 8, 2005
- Lam Research Corporation
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cerium oxide containing ceramic components and coatings in semicond...
- Patent number 6,830,622
- Issue date Dec 14, 2004
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fullerene coated component of semiconductor processing equipment an...
- Patent number 6,790,242
- Issue date Sep 14, 2004
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low contamination components for semiconductor processing apparatus...
- Patent number 6,780,787
- Issue date Aug 24, 2004
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron nitride/yttria composite components of semiconductor processi...
- Patent number 6,773,751
- Issue date Aug 10, 2004
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
USING IDENTIFIERS TO MAP EDGE RING PART NUMBERS ONTO SLOT NUMBERS
- Publication number 20200075430
- Publication date Mar 5, 2020
- LAM RESEARCH CORPORATION
- Evelio Sevillano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OF ENTRANCE AND EXIT MARKS LEFT BY A SUBSTRATE-PROCESSING...
- Publication number 20130061879
- Publication date Mar 14, 2013
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW CONTAMINATION COMPONENTS FOR SEMICONDUCTOR PROCESSSING APPARATU...
- Publication number 20130059071
- Publication date Mar 7, 2013
- LAM RESEARCH CORPORATION
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
In-Situ Reclaim of Volatile Components
- Publication number 20130025633
- Publication date Jan 31, 2013
- Robert O'Donnell
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SYSTEM, METHOD AND APPARATUS FOR MAINTAINING SEPARATION OF LIQUIDS...
- Publication number 20120138098
- Publication date Jun 7, 2012
- Robert O'Donnell
- B08 - CLEANING
Information Patent Application
Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate...
- Publication number 20120079698
- Publication date Apr 5, 2012
- LAM RESEARCH CORPORATION
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate...
- Publication number 20110197928
- Publication date Aug 18, 2011
- LAM RESEARCH CORPORATION
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Modifications to Surface Topography of Proximity Head
- Publication number 20100294742
- Publication date Nov 25, 2010
- Enrico Magni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduction of Entrance and Exit Marks Left by a Substrate-Processing...
- Publication number 20100170539
- Publication date Jul 8, 2010
- LAM RESEARCH CORPORATION
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORROSION RESISTANT COMPONENT OF SEMICONDUCTOR PROCESSING EQUIPMENT...
- Publication number 20100003826
- Publication date Jan 7, 2010
- LAM RESEARCH CORPORATION
- ROBERT J. O'DONNELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW CONTAMINATION COMPONENTS FOR SEMICONDUCTOR PROCESSING APPARATUS...
- Publication number 20090120790
- Publication date May 14, 2009
- LAM RESEARCH CORPORATION
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW CONTAMINATION COMPONENTS FOR SEMICONDUCTOR PROCESSING APPARATUS...
- Publication number 20090123735
- Publication date May 14, 2009
- LAM RESEARCH CORPORATION
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low contamination components for semiconductor processing apparatus...
- Publication number 20090068845
- Publication date Mar 12, 2009
- LAM RESEARCH CORPORATION
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System, method and apparatus for maintaining separation of liquids...
- Publication number 20080314422
- Publication date Dec 25, 2008
- LAM RESEARCH CORPORATION
- Robert O'Donnell
- B08 - CLEANING
Information Patent Application
In-situ reclaim of volatile components
- Publication number 20080142053
- Publication date Jun 19, 2008
- LAM RESEARCH, CORP.
- Robert O'Donnell
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CARRIER FOR REDUCING ENTRANCE AND/OR EXIT MARKS LEFT BY A SUBSTRATE...
- Publication number 20080081775
- Publication date Apr 3, 2008
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OF ENTRANCE AND EXIT MARKS LEFT BY A SUBSTRATE-PROCESSING...
- Publication number 20080078421
- Publication date Apr 3, 2008
- Robert O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Corrosion resistant component of semiconductor processing equipment...
- Publication number 20070012657
- Publication date Jan 18, 2007
- Lam Research Corporation
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for utilizing a meniscus in substrate processing
- Publication number 20060254078
- Publication date Nov 16, 2006
- Lam Research Corp.
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for simulating standard test wafers
- Publication number 20060032835
- Publication date Feb 16, 2006
- Lam Research Corporation
- Gregory J. Goldspring
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONCENTRIC PROXIMITY PROCESSING HEAD
- Publication number 20050217137
- Publication date Oct 6, 2005
- Lam Research Corp.
- Michael G.R. Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOBIC BARRIER MENISCUS SEPARATION AND CONTAINMENT
- Publication number 20050217135
- Publication date Oct 6, 2005
- Lam Research Corp.
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for utilizing a meniscus in substrate processing
- Publication number 20050217703
- Publication date Oct 6, 2005
- Lam Research Corp.
- Robert J. O'Donnell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Productivity enhancing thermal sprayed yttria-containing coating fo...
- Publication number 20050150866
- Publication date Jul 14, 2005
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cerium oxide containing ceramic components and coatings in semicond...
- Publication number 20050064248
- Publication date Mar 24, 2005
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low contamination components for semiconductor processing apparatus...
- Publication number 20050003240
- Publication date Jan 6, 2005
- Lam Research Corporation
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BORON NITRIDE/YTTRIA COMPOSITE COMPONENTS OF SEMICONDUCTOR PROCESSI...
- Publication number 20040137147
- Publication date Jul 15, 2004
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Zirconia toughened ceramic components and coatings in semiconductor...
- Publication number 20040023047
- Publication date Feb 5, 2004
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Productivity enhancing thermal sprayed yttria-containing coating fo...
- Publication number 20040002221
- Publication date Jan 1, 2004
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low contamination components for semiconductor processing apparatus...
- Publication number 20030181065
- Publication date Sep 25, 2003
- Robert J. O'Donnell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Robert John O'Donnell

Person

Patents Grantslast 30 patents

Using identifiers to map edge ring part numbers onto slot numbers

Low contamination components for semiconductor processing apparatus...

In-situ reclaim of volatile components

Reduction of entrance and exit marks left by a substrate-processing...

Carrier for reducing entrance and/or exit marks left by a substrate...

Corrosion resistant component of semiconductor processing equipment...

Reduction of entrance and exit marks left by a substrate-processing...

Low contamination components for semiconductor processing apparatus...

System, method and apparatus for maintaining separation of liquids...

In-situ reclaim of volatile components

System, method and apparatus for maintaining separation of liquids...

Carrier for reducing entrance and/or exit marks left by a substrate...

Carrier for reducing entrance and/or exit marks left by a substrate...

Reduction of entrance and exit marks left by a substrate-processing...

Corrosion resistant component of semiconductor processing equipment...

Solidifying layer for wafer cleaning

Method for utilizing a meniscus in substrate processing

Productivity enhancing thermal sprayed yttria-containing coating fo...

Productivity enhancing thermal sprayed yttria-containing coating fo...

Method and apparatus for simulating standard test wafers

Zirconia toughened ceramic components and coatings in semiconductor...

Corrosion resistant component of semiconductor processing equipment...

Apparatus and method for utilizing a meniscus in substrate processing

Phobic barrier meniscus separation and containment

Concentric proximity processing head

Insitu post etch process to remove remaining photoresist and residu...

Cerium oxide containing ceramic components and coatings in semicond...

Fullerene coated component of semiconductor processing equipment an...

Low contamination components for semiconductor processing apparatus...

Boron nitride/yttria composite components of semiconductor processi...

Patents Applicationslast 30 patents

USING IDENTIFIERS TO MAP EDGE RING PART NUMBERS ONTO SLOT NUMBERS

REDUCTION OF ENTRANCE AND EXIT MARKS LEFT BY A SUBSTRATE-PROCESSING...

LOW CONTAMINATION COMPONENTS FOR SEMICONDUCTOR PROCESSSING APPARATU...

In-Situ Reclaim of Volatile Components

SYSTEM, METHOD AND APPARATUS FOR MAINTAINING SEPARATION OF LIQUIDS...

Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate...

Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate...

Modifications to Surface Topography of Proximity Head

Reduction of Entrance and Exit Marks Left by a Substrate-Processing...

CORROSION RESISTANT COMPONENT OF SEMICONDUCTOR PROCESSING EQUIPMENT...

LOW CONTAMINATION COMPONENTS FOR SEMICONDUCTOR PROCESSING APPARATUS...

LOW CONTAMINATION COMPONENTS FOR SEMICONDUCTOR PROCESSING APPARATUS...

Low contamination components for semiconductor processing apparatus...

System, method and apparatus for maintaining separation of liquids...

In-situ reclaim of volatile components

CARRIER FOR REDUCING ENTRANCE AND/OR EXIT MARKS LEFT BY A SUBSTRATE...

REDUCTION OF ENTRANCE AND EXIT MARKS LEFT BY A SUBSTRATE-PROCESSING...

Corrosion resistant component of semiconductor processing equipment...

Apparatus and method for utilizing a meniscus in substrate processing

Method and apparatus for simulating standard test wafers

CONCENTRIC PROXIMITY PROCESSING HEAD

PHOBIC BARRIER MENISCUS SEPARATION AND CONTAINMENT

Apparatus and method for utilizing a meniscus in substrate processing

Productivity enhancing thermal sprayed yttria-containing coating fo...

Cerium oxide containing ceramic components and coatings in semicond...

Low contamination components for semiconductor processing apparatus...

BORON NITRIDE/YTTRIA COMPOSITE COMPONENTS OF SEMICONDUCTOR PROCESSI...

Zirconia toughened ceramic components and coatings in semiconductor...

Productivity enhancing thermal sprayed yttria-containing coating fo...

Low contamination components for semiconductor processing apparatus...