Robert John SOCHA

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,966,166
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,079,684
- Issue date Aug 3, 2021
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Adjustment of a metrology apparatus or a measurement thereby based...
- Patent number 10,996,571
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Robert John Socha
- G01 - MEASURING TESTING
Information Patent Grant
Adjustment of a metrology apparatus or a measurement thereby based...
- Patent number 10,670,975
- Issue date Jun 2, 2020
- ASML Netherlands B.V.
- Robert John Socha
- G01 - MEASURING TESTING
Information Patent Grant
Coloring aware optimization
- Patent number 10,670,973
- Issue date Jun 2, 2020
- ASML Netherlands B.V.
- Yi Zou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Source and mask optimization by changing intensity and shape of the...
- Patent number 10,657,641
- Issue date May 19, 2020
- ASML Netherlands B.V.
- Robert Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology by reconstruction
- Patent number 10,437,158
- Issue date Oct 8, 2019
- ASML Netherlands B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology of lithographic processes using asymmetric sub-re...
- Patent number 10,417,359
- Issue date Sep 17, 2019
- ASML Netherlands B.V.
- Robert John Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection method and apparatus, lithographic system and device man...
- Patent number 10,132,763
- Issue date Nov 20, 2018
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection apparatus, inspection method, lithographic apparatus, pa...
- Patent number 10,054,862
- Issue date Aug 21, 2018
- ASML Netherlands B.V.
- Anton Bernhard Van Oosten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rule optimization in lithographic imaging based on correlation of f...
- Patent number 9,053,280
- Issue date Jun 9, 2015
- ASML Netherlands B.V.
- Robert John Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determining the gradient and Hessian of the image log slope for des...
- Patent number 8,751,979
- Issue date Jun 10, 2014
- ASML Netherlands B.V.
- Robert J. Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source and mask optimization by changing intensity and shape of the...
- Patent number 8,730,452
- Issue date May 20, 2014
- ASML Masktools B.V.
- Robert Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method, program product and apparatus for model based geometry deco...
- Patent number 8,640,058
- Issue date Jan 28, 2014
- ASML Masktools B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rule optimization in lithographic imaging based on correlation of f...
- Patent number 8,612,900
- Issue date Dec 17, 2013
- ASML Netherlands B.V.
- Robert John Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for performing pattern decomposition for a full chip design
- Patent number 8,572,521
- Issue date Oct 29, 2013
- ASML Netherlands B.V.
- Luoqui Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for performing decomposition...
- Patent number 8,495,526
- Issue date Jul 23, 2013
- ASML Masktools B.V.
- Robert J. Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized polarization illumination
- Patent number 8,395,757
- Issue date Mar 12, 2013
- ASML Masktools B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Determining the gradient and hessian of the image log slope for des...
- Patent number 8,356,261
- Issue date Jan 15, 2013
- ASML Netherlands B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for performing a model based...
- Patent number 8,340,394
- Issue date Dec 25, 2012
- ASML Netherlands B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product, and apparatus for performing a model based...
- Patent number 8,224,061
- Issue date Jul 17, 2012
- ASML Netherlands B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for model based geometry deco...
- Patent number 8,060,842
- Issue date Nov 15, 2011
- ASML Masktools B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source and mask optimization by changing intensity and shape of the...
- Patent number 7,864,301
- Issue date Jan 4, 2011
- ASML Masktools B.V.
- Robert Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method, program product and apparatus for performing decomposition...
- Patent number 7,865,865
- Issue date Jan 4, 2011
- ASML Masktools B.V.
- Robert J. Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized polarization illumination
- Patent number 7,710,544
- Issue date May 4, 2010
- ASML Masktools B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for optimizing illumination f...
- Patent number 7,639,864
- Issue date Dec 29, 2009
- ASML Masktools B.V.
- Robert J. Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optical proximity correction design for contact hole mask
- Patent number 7,594,199
- Issue date Sep 22, 2009
- ASML Masktools B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,548,302
- Issue date Jun 16, 2009
- ASML Netherlands B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Feature optimization using interference mapping lithography
- Patent number 7,506,299
- Issue date Mar 17, 2009
- ASML Holding N.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method, program product and apparatus for model based geometry deco...
- Patent number 7,493,589
- Issue date Feb 17, 2009
- ASML Masktools B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK S...
- Publication number 20220350268
- Publication date Nov 3, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20210341846
- Publication date Nov 4, 2021
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ADJUSTMENT OF A METROLOGY APPARATUS OR A MEASUREMENT THEREBY BASED...
- Publication number 20200249584
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Robert John SOCHA
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID
- Publication number 20190235391
- Publication date Aug 1, 2019
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ADJUSTMENT OF A METROLOGY APPARATUS OR A MEASUREMENT THEREBY BASED...
- Publication number 20180364591
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Robert John SOCHA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY BY RECONSTRUCTION
- Publication number 20180364588
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...
- Publication number 20180046091
- Publication date Feb 15, 2018
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL METROLOGY OF LITHOGRAPHIC PROCESSES USING ASYMMETRIC SUB-RE...
- Publication number 20170177760
- Publication date Jun 22, 2017
- ASML NETHERLANDS B.V.
- Robert John SOCHA
- G01 - MEASURING TESTING
Information Patent Application
Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...
- Publication number 20160363871
- Publication date Dec 15, 2016
- ASML NETHERLANDS B.V.
- Anton Bernhard VAN OOSTEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection Method and Apparatus, Lithographic System and Device Man...
- Publication number 20150177166
- Publication date Jun 25, 2015
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Application
SOURCE AND MASK OPTIMIZATION BY CHANGING INTENSITY AND SHAPE OF THE...
- Publication number 20140247975
- Publication date Sep 4, 2014
- ASML NETHERLANDS B.V.
- Robert SOCHA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DESIGN RULE OPTIMIZATION IN LITHOGRAPHIC IMAGING BASED ON CORRELATI...
- Publication number 20140101625
- Publication date Apr 10, 2014
- ASML NETHERLANDS B.V.
- Robert John Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method, Program Product and Apparatus for Model Based Geometry Deco...
- Publication number 20120077114
- Publication date Mar 29, 2012
- ASML MASKTOOLS B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design Rule Optimization in Lithographic Imaging Based on Correlati...
- Publication number 20110219342
- Publication date Sep 8, 2011
- ASML NETHERLANDS B.V.
- Robert John Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFOMING DECOMPOSITION O...
- Publication number 20110097653
- Publication date Apr 28, 2011
- ASML MASKTOOLS B.V.
- Robert J. Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Source and Mask Optimization By Changing Intensity and Shape of the...
- Publication number 20110075124
- Publication date Mar 31, 2011
- ASML MASKTOOLS B.V.
- Robert Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZED POLARIZATION ILLUMINATION
- Publication number 20110051114
- Publication date Mar 3, 2011
- Robert SOCHA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, PROGRAM PRODUCT, AND APPARATUS FOR PERFORMING A MODEL BASED...
- Publication number 20100086203
- Publication date Apr 8, 2010
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFORMING A MODEL BASED...
- Publication number 20100021055
- Publication date Jan 28, 2010
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, PROGRAM PRODUCT AND APPARATUS FOR MODEL BASED GEOMETRY DECO...
- Publication number 20090148783
- Publication date Jun 11, 2009
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Source and Mask Optimization by Changing Intensity and Shape of the...
- Publication number 20090053621
- Publication date Feb 26, 2009
- ASML MASKTOOLS B.V.
- Robert Socha
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method, program product and apparatus for performing decomposition...
- Publication number 20080184191
- Publication date Jul 31, 2008
- Robert J. Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized polarization illumination
- Publication number 20080043215
- Publication date Feb 21, 2008
- ASML MASKTOOLS B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20070273853
- Publication date Nov 29, 2007
- ASML NETHERLANDS B.V.
- Arno Jan Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, program product and apparatus for model based geometry deco...
- Publication number 20070157154
- Publication date Jul 5, 2007
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Variable illumination source
- Publication number 20070013888
- Publication date Jan 18, 2007
- ASML NETHERLANDS B.V.
- Donis George Flagello
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method, program product and apparatus for optimizing illumination f...
- Publication number 20060204090
- Publication date Sep 14, 2006
- Robert J. Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Eigen decomposition based OPC model
- Publication number 20050149902
- Publication date Jul 7, 2005
- Xuelong Shi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Feature optimization using interference mapping lithography
- Publication number 20050142470
- Publication date Jun 30, 2005
- ASML MASKTOOLS B.V.
- Robert John Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized polarization illumination
- Publication number 20050134822
- Publication date Jun 23, 2005
- ASML MASKTOOLS B.V.
- Robert Socha
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Robert John SOCHA

Person

Patents Grantslast 30 patents

Measurement apparatus and a method for determining a substrate grid

Measurement apparatus and a method for determining a substrate grid

Adjustment of a metrology apparatus or a measurement thereby based...

Adjustment of a metrology apparatus or a measurement thereby based...

Coloring aware optimization

Source and mask optimization by changing intensity and shape of the...

Metrology by reconstruction

Optical metrology of lithographic processes using asymmetric sub-re...

Inspection method and apparatus, lithographic system and device man...

Inspection apparatus, inspection method, lithographic apparatus, pa...

Rule optimization in lithographic imaging based on correlation of f...

Determining the gradient and Hessian of the image log slope for des...

Source and mask optimization by changing intensity and shape of the...

Method, program product and apparatus for model based geometry deco...

Rule optimization in lithographic imaging based on correlation of f...

Method for performing pattern decomposition for a full chip design

Method, program product and apparatus for performing decomposition...

Optimized polarization illumination

Determining the gradient and hessian of the image log slope for des...

Method, program product and apparatus for performing a model based...

Method, program product, and apparatus for performing a model based...

Method, program product and apparatus for model based geometry deco...

Source and mask optimization by changing intensity and shape of the...

Method, program product and apparatus for performing decomposition...

Optimized polarization illumination

Method, program product and apparatus for optimizing illumination f...

Method of optical proximity correction design for contact hole mask

Lithographic apparatus and device manufacturing method

Feature optimization using interference mapping lithography

Method, program product and apparatus for model based geometry deco...

Patents Applicationslast 30 patents

METROLOGY MARK STRUCTURE AND METHOD OF DETERMINING METROLOGY MARK S...

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

ADJUSTMENT OF A METROLOGY APPARATUS OR A MEASUREMENT THEREBY BASED...

MEASUREMENT APPARATUS AND A METHOD FOR DETERMINING A SUBSTRATE GRID

ADJUSTMENT OF A METROLOGY APPARATUS OR A MEASUREMENT THEREBY BASED...

METROLOGY BY RECONSTRUCTION

Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...

OPTICAL METROLOGY OF LITHOGRAPHIC PROCESSES USING ASYMMETRIC SUB-RE...

Inspection Apparatus, Inspection Method, Lithographic Apparatus, Pa...

Inspection Method and Apparatus, Lithographic System and Device Man...

SOURCE AND MASK OPTIMIZATION BY CHANGING INTENSITY AND SHAPE OF THE...

DESIGN RULE OPTIMIZATION IN LITHOGRAPHIC IMAGING BASED ON CORRELATI...

Method, Program Product and Apparatus for Model Based Geometry Deco...

Design Rule Optimization in Lithographic Imaging Based on Correlati...

METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFOMING DECOMPOSITION O...

Source and Mask Optimization By Changing Intensity and Shape of the...

OPTIMIZED POLARIZATION ILLUMINATION

METHOD, PROGRAM PRODUCT, AND APPARATUS FOR PERFORMING A MODEL BASED...

METHOD, PROGRAM PRODUCT AND APPARATUS FOR PERFORMING A MODEL BASED...

METHOD, PROGRAM PRODUCT AND APPARATUS FOR MODEL BASED GEOMETRY DECO...

Source and Mask Optimization by Changing Intensity and Shape of the...

Method, program product and apparatus for performing decomposition...

Optimized polarization illumination

Lithographic apparatus and device manufacturing method

Method, program product and apparatus for model based geometry deco...

Variable illumination source

Method, program product and apparatus for optimizing illumination f...

Eigen decomposition based OPC model

Feature optimization using interference mapping lithography

Optimized polarization illumination