Robert Neal Lang

Person

Pleasant Valley, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Ultrathin polymeric photoacid generator layer and method of fabrica...
- Patent number 7,638,266
- Issue date Dec 29, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High sensitivity resist compositions for electron-based lithography
- Patent number 7,314,700
- Issue date Jan 1, 2008
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,979,518
- Issue date Dec 27, 2005
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation sensitive silicon-containing negative resists and use the...
- Patent number 6,821,718
- Issue date Nov 23, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,730,445
- Issue date May 4, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Attenuated embedded phase shift photomask blanks
- Patent number 6,682,860
- Issue date Jan 27, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radiation sensitive silicon-containing negative resists and use the...
- Patent number 6,653,045
- Issue date Nov 25, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Etch improved resist systems containing acrylate (or methacrylate)...
- Patent number 6,586,156
- Issue date Jul 1, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Mask-making using resist having SIO bond-containing polymer
- Patent number 6,420,084
- Issue date Jul 16, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low TCE polyimides as improved insulator in multilayer interconnect...
- Patent number 5,976,710
- Issue date Nov 2, 1999
- International Business Machines Corporation
- Krishna Gandhi Sachdev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming sub-half micron patterns with optical lithography...
- Patent number 5,399,462
- Issue date Mar 21, 1995
- International Business Machines Corporation
- Krishna G. Sachdev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Top coat for acid catalyzed resists
- Patent number 5,240,812
- Issue date Aug 31, 1993
- International Business Machines Corporation
- Willard E. Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Viscosity stable, essentially gel-free polyamic acid compositions
- Patent number 5,115,090
- Issue date May 19, 1992
- Krishna G. Sachdev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
High sensitivity resist compositions for electron-based lithography
- Publication number 20060127800
- Publication date Jun 15, 2006
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Ultrathin polymeric photoacid generator layer and method of fabrica...
- Publication number 20060035167
- Publication date Feb 16, 2006
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20040170907
- Publication date Sep 2, 2004
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Radiation sensitive silicon-containing negative resists and use the...
- Publication number 20040048204
- Publication date Mar 11, 2004
- International Business Machines
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20030194568
- Publication date Oct 16, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Attenuated embedded phase shift photomask blanks
- Publication number 20030194569
- Publication date Oct 16, 2003
- Marie Angelopoulos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Etch improved resist systems containing acrylate (or methacrylate)...
- Publication number 20030049561
- Publication date Mar 13, 2003
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Radiation sensitive silicon-containing negative resists and use the...
- Publication number 20020115017
- Publication date Aug 22, 2002
- International Business Machines Corporation
- Marie Angelopoulos
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Robert Neal Lang

Person

Patents Grantslast 30 patents

Ultrathin polymeric photoacid generator layer and method of fabrica...

High sensitivity resist compositions for electron-based lithography

Attenuated embedded phase shift photomask blanks

Radiation sensitive silicon-containing negative resists and use the...

Attenuated embedded phase shift photomask blanks

Attenuated embedded phase shift photomask blanks

Radiation sensitive silicon-containing negative resists and use the...

Etch improved resist systems containing acrylate (or methacrylate)...

Mask-making using resist having SIO bond-containing polymer

Low TCE polyimides as improved insulator in multilayer interconnect...

Method of forming sub-half micron patterns with optical lithography...

Top coat for acid catalyzed resists

Viscosity stable, essentially gel-free polyamic acid compositions

Patents Applicationslast 30 patents

High sensitivity resist compositions for electron-based lithography

Ultrathin polymeric photoacid generator layer and method of fabrica...

Attenuated embedded phase shift photomask blanks

Radiation sensitive silicon-containing negative resists and use the...

Attenuated embedded phase shift photomask blanks

Attenuated embedded phase shift photomask blanks

Etch improved resist systems containing acrylate (or methacrylate)...

Radiation sensitive silicon-containing negative resists and use the...