Robert REICHARDT

Person

Ludwigshafen am Rhein, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Polymeric additives for reducing the viscosity loss on tinting
- Patent number 11,713,369
- Issue date Aug 1, 2023
- BASF SE
- Robert Reichardt
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 11,286,402
- Issue date Mar 29, 2022
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 11,264,250
- Issue date Mar 1, 2022
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical-mechanical polishing composition comprising benzotriazole...
- Patent number 11,168,239
- Issue date Nov 9, 2021
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,899,945
- Issue date Jan 26, 2021
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,738,219
- Issue date Aug 11, 2020
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical-mechanical polishing composition comprising benzotriazole...
- Patent number 10,647,900
- Issue date May 12, 2020
- BASF SE
- Robert Reichardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing (CMP) composition
- Patent number 10,570,316
- Issue date Feb 25, 2020
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Use of a chemical mechanical polishing (CMP) composition for polish...
- Patent number 10,385,236
- Issue date Aug 20, 2019
- BASF SE
- Robert Reichardt
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing (CMP) composition for high effective...
- Patent number 10,227,506
- Issue date Mar 12, 2019
- BASF SE
- Max Siebert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing (CMP) composition comprising a non-io...
- Patent number 8,980,750
- Issue date Mar 17, 2015
- BASF SE
- Robert Reichardt
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
PROCESS FOR PRODUCING A POLYURETHANE COMPOSITION
- Publication number 20210380750
- Publication date Dec 9, 2021
- BASF SE
- Stephan SALZINGER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20210102093
- Publication date Apr 8, 2021
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20200294813
- Publication date Sep 17, 2020
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMERIC ADDITIVES FOR REDUCING THE VISCOSITY LOSS ON TINTING
- Publication number 20200262965
- Publication date Aug 20, 2020
- BASF SE
- Robert REICHARDT
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE...
- Publication number 20200255713
- Publication date Aug 13, 2020
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20180230333
- Publication date Aug 16, 2018
- BASF SE
- Robert REICHARDT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20180016468
- Publication date Jan 18, 2018
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE...
- Publication number 20170369743
- Publication date Dec 28, 2017
- BASF SE
- Max SIEBERT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20170369741
- Publication date Dec 28, 2017
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...
- Publication number 20170362464
- Publication date Dec 21, 2017
- BASF SE
- Robert REICHARDT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION
- Publication number 20170158913
- Publication date Jun 8, 2017
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE...
- Publication number 20160200943
- Publication date Jul 14, 2016
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA
- Publication number 20160160083
- Publication date Jun 9, 2016
- BASF SE
- Michael LAUTER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IO...
- Publication number 20140011362
- Publication date Jan 9, 2014
- BASF SE
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IO...
- Publication number 20140011361
- Publication date Jan 9, 2014
- Robert REICHARDT
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Robert REICHARDT

Person

Patents Grantslast 30 patents

Polymeric additives for reducing the viscosity loss on tinting

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Chemical-mechanical polishing composition comprising benzotriazole...

Use of a chemical mechanical polishing (CMP) composition for polish...

Use of a chemical mechanical polishing (CMP) composition for polish...

Chemical-mechanical polishing composition comprising benzotriazole...

Chemical mechanical polishing (CMP) composition

Use of a chemical mechanical polishing (CMP) composition for polish...

Chemical mechanical polishing (CMP) composition for high effective...

Chemical mechanical polishing (CMP) composition comprising a non-io...

Patents Applicationslast 30 patents

PROCESS FOR PRODUCING A POLYURETHANE COMPOSITION

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

POLYMERIC ADDITIVES FOR REDUCING THE VISCOSITY LOSS ON TINTING

CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR HIGH EFFECTIVE...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISH...

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION

CHEMICAL-MECHANICAL POLISHING COMPOSITION COMPRISING BENZOTRIAZOLE...

CMP COMPOSITION COMPRISING ABRASIVE PARTICLES CONTAINING CERIA

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IO...

CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A NON-IO...