Robert Vacassy

Person

Aurora, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
CMP porous pad with particles in a polymeric matrix
- Patent number 9,951,054
- Issue date Apr 24, 2018
- Cabot Microelectronics Corporation
- Shoutian Li
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polishing pad with porous interface and solid core, and related app...
- Patent number 9,463,551
- Issue date Oct 11, 2016
- Cabot Microelectronics Corporation
- Robert Vacassy
- B24 - GRINDING POLISHING
Information Patent Grant
CMP method for metal-containing substrates
- Patent number 9,074,118
- Issue date Jul 7, 2015
- Cabot Microelectronics Corporation
- Robert Vacassy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions and methods for dielectric CMP
- Patent number 7,677,956
- Issue date Mar 16, 2010
- Cabot Microelectronics Corporation
- Phillip Carter
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing composition for a tungsten-containing substrate
- Patent number 7,582,127
- Issue date Sep 1, 2009
- Cabot Microelectronics Corporation
- Robert Vacassy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tunable selectivity slurries in CMP applications
- Patent number 7,294,576
- Issue date Nov 13, 2007
- Cabot Microelectronics Corporation
- Zhan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of polishing a tungsten-containing substrate
- Patent number 7,247,567
- Issue date Jul 24, 2007
- Cabot Microelectronics Corporation
- Robert Vacassy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methanol-containing silica-based CMP compositions
- Patent number 6,682,575
- Issue date Jan 27, 2004
- Cabot Microelectronics Corporation
- Robert Vacassy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
POLISHING PAD WITH POROUS INTERFACE AND SOLID CORE, AND RELATED APP...
- Publication number 20150056892
- Publication date Feb 26, 2015
- Cabot Microelectronics Corporation
- Robert VACASSY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA HIGH VOID VOLUME POLISHING PAD WITH CLOSED PORE STRUCTURE
- Publication number 20150056895
- Publication date Feb 26, 2015
- Cabot Microelectronics Corporation
- George Fotou
- B24 - GRINDING POLISHING
Information Patent Application
CMP POROUS PAD WITH PARTICLES IN A POLYMERIC MATRIX
- Publication number 20100273399
- Publication date Oct 28, 2010
- Cabot Microelectronics Corporation
- Shoutian Li
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE...
- Publication number 20100190339
- Publication date Jul 29, 2010
- Zhan Chen
- B24 - GRINDING POLISHING
Information Patent Application
CMP method for metal-containing substrates
- Publication number 20090314744
- Publication date Dec 24, 2009
- Robert Vacassy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP method for improved oxide removal rate
- Publication number 20090191710
- Publication date Jul 30, 2009
- Cabot Microelectronics Corporation
- Phillip W. CARTER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Silicon oxide polishing method utilizing colloidal silica
- Publication number 20080220610
- Publication date Sep 11, 2008
- Cabot Microelectronics Corporation
- Benjamin Bayer
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Rate-enhanced CMP compositions for dielectric films
- Publication number 20080020680
- Publication date Jan 24, 2008
- Cabot Microelectronics Corporation
- Robert Vacassy
- B24 - GRINDING POLISHING
Information Patent Application
Method of polishing a tungsten-containing substrate
- Publication number 20070266641
- Publication date Nov 22, 2007
- Cabot Microelectronics Corporation
- Robert Vacassy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF POLISHING A TUNGSTEN-CONTAINING SUBSTRATE
- Publication number 20070214728
- Publication date Sep 20, 2007
- Cabot Microelectronics Corporation
- Robert Vacassy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition and method to polish silicon nitride
- Publication number 20070209287
- Publication date Sep 13, 2007
- Cabot Microelectronics Corporation
- Zhan Chen
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP composition for improved oxide removal rate
- Publication number 20050279733
- Publication date Dec 22, 2005
- Cabot Microelectronics Corporation
- Phillip W. Carter
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method of polishing a tungsten-containing substrate
- Publication number 20050282391
- Publication date Dec 22, 2005
- Cabot Microelectronics Corporation
- Robert Vacassy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methanol-containing silica-based cmp compositions
- Publication number 20050150173
- Publication date Jul 14, 2005
- Robert Vacassy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Compositions and methods for dielectric CMP
- Publication number 20030211815
- Publication date Nov 13, 2003
- Cabot Microelectronics Corporation
- Phillip Carter
- B24 - GRINDING POLISHING
Information Patent Application
Methanol-containing silica-based CMP compositions
- Publication number 20030168628
- Publication date Sep 11, 2003
- Cabot Microelectronics Corporation
- Robert Vacassy
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Robert Vacassy

Person

Patents Grantslast 30 patents

CMP porous pad with particles in a polymeric matrix

Polishing pad with porous interface and solid core, and related app...

CMP method for metal-containing substrates

Compositions and methods for dielectric CMP

Polishing composition for a tungsten-containing substrate

Tunable selectivity slurries in CMP applications

Method of polishing a tungsten-containing substrate

Methanol-containing silica-based CMP compositions

Patents Applicationslast 30 patents

POLISHING PAD WITH POROUS INTERFACE AND SOLID CORE, AND RELATED APP...

ULTRA HIGH VOID VOLUME POLISHING PAD WITH CLOSED PORE STRUCTURE

CMP POROUS PAD WITH PARTICLES IN A POLYMERIC MATRIX

COMPOSITIONS AND METHODS FOR CHEMICAL-MECHANICAL POLISHING OF PHASE...

CMP method for metal-containing substrates

CMP method for improved oxide removal rate

Silicon oxide polishing method utilizing colloidal silica

Rate-enhanced CMP compositions for dielectric films

Method of polishing a tungsten-containing substrate

METHOD OF POLISHING A TUNGSTEN-CONTAINING SUBSTRATE

Composition and method to polish silicon nitride

CMP composition for improved oxide removal rate

Method of polishing a tungsten-containing substrate

Methanol-containing silica-based cmp compositions

Compositions and methods for dielectric CMP

Methanol-containing silica-based CMP compositions