Robert W. Conn

Person

Los Angeles, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for coating substrates
- Patent number 5,656,141
- Issue date Aug 12, 1997
- Leybold Aktiengesellschaft
- Hans-Georg Betz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density plasma deposition and etching apparatus
- Patent number 5,429,070
- Issue date Jul 4, 1995
- Plasma & Materials Technologies, Inc.
- Gregor A. Campbell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density plasma deposition and etching apparatus
- Patent number 5,421,891
- Issue date Jun 6, 1995
- Plasma & Materials Technologies, Inc.
- Gregor A. Campbell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High density plasma deposition and etching apparatus
- Patent number 5,122,251
- Issue date Jun 16, 1992
- Plasma & Materials Technologies, Inc.
- Gregor A. Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma deposition and etching apparatus
- Patent number 5,091,049
- Issue date Feb 25, 1992
- Plasma & Materials Technologies, Inc.
- Gregor Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High density plasma deposition and etching apparatus
- Patent number 4,990,229
- Issue date Feb 5, 1991
- Plasma & Materials Technologies, Inc.
- Gregor Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for the application of materials
- Patent number 4,885,070
- Issue date Dec 5, 1989
- Leybold Aktiengesellschaft
- Gregor A. Campbell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Robert W. Conn

Person

Patents Grantslast 30 patents

Apparatus for coating substrates

High density plasma deposition and etching apparatus

High density plasma deposition and etching apparatus

High density plasma deposition and etching apparatus

High density plasma deposition and etching apparatus

High density plasma deposition and etching apparatus

Method and apparatus for the application of materials