Roel Gronheid

Person

Boutersem, BE

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for mitigating overlay distortion patterns caused...
- Patent number 12,164,277
- Issue date Dec 10, 2024
- KLA Corporation
- Franz Zach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for focus control in extreme ultraviolet lithogra...
- Patent number 12,153,352
- Issue date Nov 26, 2024
- KLA Corporation
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for mitigating overlay distortion patterns caused...
- Patent number 11,782,411
- Issue date Oct 10, 2023
- KLA Corporation
- Franz Zach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for focus control in extreme ultraviolet lithogra...
- Patent number 11,460,783
- Issue date Oct 4, 2022
- KLA Corporation
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection sensitivity improvements for optical and electron beam i...
- Patent number 11,092,893
- Issue date Aug 17, 2021
- KLA Corporation
- Andrew Cross
- G01 - MEASURING TESTING
Information Patent Grant
Determining the impacts of stochastic behavior on overlay metrology...
- Patent number 10,901,325
- Issue date Jan 26, 2021
- KLA-Tencor Corporation
- Evgeni Gurevich
- G01 - MEASURING TESTING
Information Patent Grant
Conformal anti-reflective coating
- Patent number 9,041,164
- Issue date May 26, 2015
- IMEC
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and devices for lithography using electromagnetic radiation...
- Patent number 7,695,877
- Issue date Apr 13, 2010
- IMEC
- Leonardus Leunissen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR MITIGATING OVERLAY DISTORTION PATTERNS CAUSED...
- Publication number 20240053721
- Publication date Feb 15, 2024
- KLA Corporation
- Franz Zach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
3D PROFILOMETRY WITH A LINNIK INTERFEROMETER
- Publication number 20240035810
- Publication date Feb 1, 2024
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20230099105
- Publication date Mar 30, 2023
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR MITIGATING OVERLAY DISTORTION PATTERNS CAUSED...
- Publication number 20230035201
- Publication date Feb 2, 2023
- Franz Zach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR OPTIMIZING THROUGH SILICON VIA OVERLAY
- Publication number 20230030116
- Publication date Feb 2, 2023
- Franz Zach
- G05 - CONTROLLING REGULATING
Information Patent Application
SYSTEM AND METHOD FOR DETECTING PARTICLE CONTAMINATION ON A BONDING...
- Publication number 20230032406
- Publication date Feb 2, 2023
- Franz Zach
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR FOCUS CONTROL IN EXTREME ULTRAVIOLET LITHOGRA...
- Publication number 20230037093
- Publication date Feb 2, 2023
- KLA Corporation
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR FOCUS CONTROL IN EXTREME ULTRAVIOLET LITHOGRA...
- Publication number 20220214625
- Publication date Jul 7, 2022
- KLA Corporation
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20210149296
- Publication date May 20, 2021
- KLA-Tencor Corporation
- Yoel Feler
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SENSITIVITY IMPROVEMENTS FOR OPTICAL AND ELECTRON BEAM I...
- Publication number 20200183283
- Publication date Jun 11, 2020
- KLA Corporation
- Andrew Cross
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...
- Publication number 20190250504
- Publication date Aug 15, 2019
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETERMINING THE IMPACTS OF STOCHASTIC BEHAVIOR ON OVERLAY METROLOGY...
- Publication number 20190049858
- Publication date Feb 14, 2019
- KLA-Tencor Corporation
- Evgeni GUREVICH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Conformal Anti-Reflective Coating
- Publication number 20140231968
- Publication date Aug 21, 2014
- IMEC
- Roel Gronheid
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WATERMARK DEFECT REDUCTION BY RESIST OPTIMIZATION
- Publication number 20080213689
- Publication date Sep 4, 2008
- Interuniversitair Microelektronica Centrum (IMEC) VZW
- Michael Kocsis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and devices for lithography using electromagnetic radiation...
- Publication number 20070154817
- Publication date Jul 5, 2007
- Leonardus Leunissen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of studying interaction between immersion fluid and substrate
- Publication number 20070117232
- Publication date May 24, 2007
- Roel Gronheid
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Roel Gronheid

Person

Patents Grantslast 30 patents

System and method for mitigating overlay distortion patterns caused...

System and method for focus control in extreme ultraviolet lithogra...

Reduction or elimination of pattern placement error in metrology me...

System and method for mitigating overlay distortion patterns caused...

Reduction or elimination of pattern placement error in metrology me...

System and method for focus control in extreme ultraviolet lithogra...

Inspection sensitivity improvements for optical and electron beam i...

Determining the impacts of stochastic behavior on overlay metrology...

Conformal anti-reflective coating

Methods and devices for lithography using electromagnetic radiation...

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR MITIGATING OVERLAY DISTORTION PATTERNS CAUSED...

3D PROFILOMETRY WITH A LINNIK INTERFEROMETER

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

SYSTEM AND METHOD FOR MITIGATING OVERLAY DISTORTION PATTERNS CAUSED...

SYSTEM AND METHOD FOR OPTIMIZING THROUGH SILICON VIA OVERLAY

SYSTEM AND METHOD FOR DETECTING PARTICLE CONTAMINATION ON A BONDING...

SYSTEM AND METHOD FOR FOCUS CONTROL IN EXTREME ULTRAVIOLET LITHOGRA...

SYSTEM AND METHOD FOR FOCUS CONTROL IN EXTREME ULTRAVIOLET LITHOGRA...

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

INSPECTION SENSITIVITY IMPROVEMENTS FOR OPTICAL AND ELECTRON BEAM I...

REDUCTION OR ELIMINATION OF PATTERN PLACEMENT ERROR IN METROLOGY ME...

DETERMINING THE IMPACTS OF STOCHASTIC BEHAVIOR ON OVERLAY METROLOGY...

Conformal Anti-Reflective Coating

WATERMARK DEFECT REDUCTION BY RESIST OPTIMIZATION

Methods and devices for lithography using electromagnetic radiation...

Method of studying interaction between immersion fluid and substrate